JPS57155375A - Vacuum evaporation apparatus - Google Patents

Vacuum evaporation apparatus

Info

Publication number
JPS57155375A
JPS57155375A JP4095981A JP4095981A JPS57155375A JP S57155375 A JPS57155375 A JP S57155375A JP 4095981 A JP4095981 A JP 4095981A JP 4095981 A JP4095981 A JP 4095981A JP S57155375 A JPS57155375 A JP S57155375A
Authority
JP
Japan
Prior art keywords
gas
evaporated
supersonic
skimmer
collimator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4095981A
Other languages
Japanese (ja)
Inventor
Masatoshi Takao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP4095981A priority Critical patent/JPS57155375A/en
Publication of JPS57155375A publication Critical patent/JPS57155375A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/85—Coating a support with a magnetic layer by vapour deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/20—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To form magnetic thin film having desired properties readily, by reacting the enough amount of gas molecules supplied at supersonic velocity with atoms to be evaporated locally in high vacuum. CONSTITUTION:The unidirectional, high speed and high density gas molecular stream is obtained by making the supersonic molecular stream by ejecting the gas for the reaction from a nozzle 1 via a valve 4 to a high vacuum container under the back pressure from ca. 0.05 atm to several atm, excluding the impulse wave generating in the supersonic flow by a skimmer 2, further controlling the direction by a collimator 3. The gas molecules which does not pass the skimmer 2 or the collimator 3 are discharged from the discharging pipes 5, 6. The flow of atom to be evaporated generating from an evaporation source 7 reacts with said gas molecular beam at the local position restricted by a masking plate 8 and forms the evaporated film on the substrate film 12 on a roll 11.
JP4095981A 1981-03-20 1981-03-20 Vacuum evaporation apparatus Pending JPS57155375A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4095981A JPS57155375A (en) 1981-03-20 1981-03-20 Vacuum evaporation apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4095981A JPS57155375A (en) 1981-03-20 1981-03-20 Vacuum evaporation apparatus

Publications (1)

Publication Number Publication Date
JPS57155375A true JPS57155375A (en) 1982-09-25

Family

ID=12595017

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4095981A Pending JPS57155375A (en) 1981-03-20 1981-03-20 Vacuum evaporation apparatus

Country Status (1)

Country Link
JP (1) JPS57155375A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59144048A (en) * 1983-02-07 1984-08-17 Sony Corp Production of magnetic recording medium
JPS6320483A (en) * 1986-07-15 1988-01-28 Canon Inc Fine particle spraying device
EP1678341A2 (en) * 2003-09-11 2006-07-12 EDISON S.p.A. A method and equipment for deposition of films of coating materials, in particular superconductive oxides
CN112442664A (en) * 2019-08-30 2021-03-05 泽瓦薄膜技术股份有限公司 Device, method and system for coating a substrate and superconducting strip conductor
US11810698B2 (en) 2015-07-06 2023-11-07 Dyson Technology Limited Magnet

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59144048A (en) * 1983-02-07 1984-08-17 Sony Corp Production of magnetic recording medium
JPH057766B2 (en) * 1983-02-07 1993-01-29 Sony Corp
JPS6320483A (en) * 1986-07-15 1988-01-28 Canon Inc Fine particle spraying device
EP1678341A2 (en) * 2003-09-11 2006-07-12 EDISON S.p.A. A method and equipment for deposition of films of coating materials, in particular superconductive oxides
US11810698B2 (en) 2015-07-06 2023-11-07 Dyson Technology Limited Magnet
CN112442664A (en) * 2019-08-30 2021-03-05 泽瓦薄膜技术股份有限公司 Device, method and system for coating a substrate and superconducting strip conductor

Similar Documents

Publication Publication Date Title
US4991541A (en) Device and process for treating fine particles
CA2107242A1 (en) An Evaporation System for Gas Jet Deposition on Thin Film Materials
ES459671A1 (en) Method and apparatus for reactive sputtering
JPS5531436A (en) Production of fiber or globular particle having specific size from fused material and rotator therefor
JPS57155375A (en) Vacuum evaporation apparatus
US4875810A (en) Apparatus for controlling fine particle flow
AU7321396A (en) Agricultural and other spraying systems
EP0165695A1 (en) Spray coating moving tapes
JPS62253772A (en) Film forming apparatus
US825364A (en) Steam-turbine.
JPS57156031A (en) Formation of thin film and vacuum deposition device
JPS6316043A (en) Collection of fine particle
GB1119514A (en) Production of solids from solutions or slurries by evaporation
JPS5699148A (en) Apparatus for supporting strip material
JPS6241409A (en) Corpuscular stream controller
JPS5452242A (en) Nozzle of heated water turbine
JPS62120477A (en) Film forming device
JPS62131510A (en) Fine particle spraying device
JPS62250945A (en) Gaseous phase treatment apparatus
JPS6242412A (en) Vapor-phase exciting device
JPS62116771A (en) Film forming device
JPS5544870A (en) Discharging method of liquid raw material and nozzle for use in the same purpose
JPS62115699A (en) Vapor phase exciter
JPS62115825A (en) Fine particle flow controller
JPS6335779A (en) Film forming device