JPS57169241A - Dry etching method - Google Patents

Dry etching method

Info

Publication number
JPS57169241A
JPS57169241A JP5427381A JP5427381A JPS57169241A JP S57169241 A JPS57169241 A JP S57169241A JP 5427381 A JP5427381 A JP 5427381A JP 5427381 A JP5427381 A JP 5427381A JP S57169241 A JPS57169241 A JP S57169241A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
etching
gas
means
dry
exhaust
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5427381A
Inventor
Norio Hirashita
Jun Kanamori
Original Assignee
Oki Electric Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/32917Plasma diagnostics
    • H01J37/32935Monitoring and controlling tubes by information coming from the object and/or discharge

Abstract

PURPOSE:To grasp the progress and completion of etching by etching a film containing P in the high-frequency glow discharge plasma of a Freon group gas, analyzing exhaust gas discharged at that time by means of a mass spectrograph and detecting the secular change of the composition of the exhaust gas. CONSTITUTION:A dry etching device 13 is operated by means of a relay switch 19, the film containing P is etched in the high-frequency glow discharge plasma of the Freon group gas, and a small amount of the exhaust gas from an etching chamber is detected in ionic form by means of the mass spectrograph 15 through an orifice 14. The detecting signals are amplified by means of an amplifier 17, and transmitted to a signal processing system 18, the secular change of the amount of ions formed is processed by the system 18, the completion of etching is decided, and the dry etching device is stopped through the relay switch 19.
JP5427381A 1981-04-13 1981-04-13 Dry etching method Pending JPS57169241A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5427381A JPS57169241A (en) 1981-04-13 1981-04-13 Dry etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5427381A JPS57169241A (en) 1981-04-13 1981-04-13 Dry etching method

Publications (1)

Publication Number Publication Date
JPS57169241A true true JPS57169241A (en) 1982-10-18

Family

ID=12965964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5427381A Pending JPS57169241A (en) 1981-04-13 1981-04-13 Dry etching method

Country Status (1)

Country Link
JP (1) JPS57169241A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4615761A (en) * 1985-03-15 1986-10-07 Hitachi, Ltd. Method of and apparatus for detecting an end point of plasma treatment
US4812416A (en) * 1985-11-28 1989-03-14 Gerd Hewig Method for executing a reproducible glow discharge
US5118378A (en) * 1989-10-10 1992-06-02 Hitachi, Ltd. Apparatus for detecting an end point of etching

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5364636A (en) * 1976-11-22 1978-06-09 Nippon Telegraph & Telephone Dry etching device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5364636A (en) * 1976-11-22 1978-06-09 Nippon Telegraph & Telephone Dry etching device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4615761A (en) * 1985-03-15 1986-10-07 Hitachi, Ltd. Method of and apparatus for detecting an end point of plasma treatment
US4812416A (en) * 1985-11-28 1989-03-14 Gerd Hewig Method for executing a reproducible glow discharge
US5118378A (en) * 1989-10-10 1992-06-02 Hitachi, Ltd. Apparatus for detecting an end point of etching

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