JPS57169241A - Dry etching method - Google Patents
Dry etching methodInfo
- Publication number
- JPS57169241A JPS57169241A JP5427381A JP5427381A JPS57169241A JP S57169241 A JPS57169241 A JP S57169241A JP 5427381 A JP5427381 A JP 5427381A JP 5427381 A JP5427381 A JP 5427381A JP S57169241 A JPS57169241 A JP S57169241A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- exhaust gas
- dry etching
- completion
- film containing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE:To grasp the progress and completion of etching by etching a film containing P in the high-frequency glow discharge plasma of a Freon group gas, analyzing exhaust gas discharged at that time by means of a mass spectrograph and detecting the secular change of the composition of the exhaust gas. CONSTITUTION:A dry etching device 13 is operated by means of a relay switch 19, the film containing P is etched in the high-frequency glow discharge plasma of the Freon group gas, and a small amount of the exhaust gas from an etching chamber is detected in ionic form by means of the mass spectrograph 15 through an orifice 14. The detecting signals are amplified by means of an amplifier 17, and transmitted to a signal processing system 18, the secular change of the amount of ions formed is processed by the system 18, the completion of etching is decided, and the dry etching device is stopped through the relay switch 19.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5427381A JPS57169241A (en) | 1981-04-13 | 1981-04-13 | Dry etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5427381A JPS57169241A (en) | 1981-04-13 | 1981-04-13 | Dry etching method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57169241A true JPS57169241A (en) | 1982-10-18 |
Family
ID=12965964
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5427381A Pending JPS57169241A (en) | 1981-04-13 | 1981-04-13 | Dry etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57169241A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4615761A (en) * | 1985-03-15 | 1986-10-07 | Hitachi, Ltd. | Method of and apparatus for detecting an end point of plasma treatment |
US4812416A (en) * | 1985-11-28 | 1989-03-14 | Gerd Hewig | Method for executing a reproducible glow discharge |
US5118378A (en) * | 1989-10-10 | 1992-06-02 | Hitachi, Ltd. | Apparatus for detecting an end point of etching |
CN102282339A (en) * | 2009-01-15 | 2011-12-14 | 丰田自动车株式会社 | Turbocharger and manufacturing method for turbocharger |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5364636A (en) * | 1976-11-22 | 1978-06-09 | Nippon Telegraph & Telephone | Dry etching device |
-
1981
- 1981-04-13 JP JP5427381A patent/JPS57169241A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5364636A (en) * | 1976-11-22 | 1978-06-09 | Nippon Telegraph & Telephone | Dry etching device |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4615761A (en) * | 1985-03-15 | 1986-10-07 | Hitachi, Ltd. | Method of and apparatus for detecting an end point of plasma treatment |
US4812416A (en) * | 1985-11-28 | 1989-03-14 | Gerd Hewig | Method for executing a reproducible glow discharge |
US5118378A (en) * | 1989-10-10 | 1992-06-02 | Hitachi, Ltd. | Apparatus for detecting an end point of etching |
CN102282339A (en) * | 2009-01-15 | 2011-12-14 | 丰田自动车株式会社 | Turbocharger and manufacturing method for turbocharger |
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