JPS57155730A - Alignment device - Google Patents

Alignment device

Info

Publication number
JPS57155730A
JPS57155730A JP56040312A JP4031281A JPS57155730A JP S57155730 A JPS57155730 A JP S57155730A JP 56040312 A JP56040312 A JP 56040312A JP 4031281 A JP4031281 A JP 4031281A JP S57155730 A JPS57155730 A JP S57155730A
Authority
JP
Japan
Prior art keywords
stage
alignment
wafer
target
mean value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56040312A
Other languages
Japanese (ja)
Other versions
JPH0128503B2 (en
Inventor
Yoshihiko Kiyokuni
Haruo Nagai
Masaki Tsukagoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56040312A priority Critical patent/JPS57155730A/en
Publication of JPS57155730A publication Critical patent/JPS57155730A/en
Publication of JPH0128503B2 publication Critical patent/JPH0128503B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To improve a working efficiency by shifting automatically X-Y stage in alignment by a shift mean value quantity in a predetermined number of time to reduce deviation in alignment. CONSTITUTION:Alignment for wafer 1 is performed by a peralignment table 3 to transfer it to X-Y stage 4. Since the accuracy of the alignment is lower than that in the prealignment, a target is adjusted to a position of the target for a mask to store the movement quantity thereof. Subsequently, if the wafer 1 on the X-Y stage 4 is transfered, a new wafer is brought to the stage 4 to store the corrected movement quantity thereof and establish the accummulated addition processing and calculate the shift mean value and a corrected original point on the X-Y stage 4 is sought. At the subsequent mask alignment, the X-Y stage 4 is transfered in accordance with the shifted mean value and consequently the target 21 for the wafer 1 can be substantially observed within the range of a field 22 of vision on a microscope (optical field of vision).
JP56040312A 1981-03-23 1981-03-23 Alignment device Granted JPS57155730A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56040312A JPS57155730A (en) 1981-03-23 1981-03-23 Alignment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56040312A JPS57155730A (en) 1981-03-23 1981-03-23 Alignment device

Publications (2)

Publication Number Publication Date
JPS57155730A true JPS57155730A (en) 1982-09-25
JPH0128503B2 JPH0128503B2 (en) 1989-06-02

Family

ID=12577092

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56040312A Granted JPS57155730A (en) 1981-03-23 1981-03-23 Alignment device

Country Status (1)

Country Link
JP (1) JPS57155730A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61201440A (en) * 1985-03-04 1986-09-06 Hitachi Electronics Eng Co Ltd Apparatus for wafer alignment

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5160410A (en) * 1974-11-25 1976-05-26 Hitachi Ltd KOTONARUICHINISONZAISURUFUKUSUNO ZAHYONO GENTENITSUCHIHO

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5160410A (en) * 1974-11-25 1976-05-26 Hitachi Ltd KOTONARUICHINISONZAISURUFUKUSUNO ZAHYONO GENTENITSUCHIHO

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61201440A (en) * 1985-03-04 1986-09-06 Hitachi Electronics Eng Co Ltd Apparatus for wafer alignment

Also Published As

Publication number Publication date
JPH0128503B2 (en) 1989-06-02

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