JPS6482440A - Illuminating angle setting method for focusing ion beam device - Google Patents

Illuminating angle setting method for focusing ion beam device

Info

Publication number
JPS6482440A
JPS6482440A JP24046687A JP24046687A JPS6482440A JP S6482440 A JPS6482440 A JP S6482440A JP 24046687 A JP24046687 A JP 24046687A JP 24046687 A JP24046687 A JP 24046687A JP S6482440 A JPS6482440 A JP S6482440A
Authority
JP
Japan
Prior art keywords
ion beam
mark
illuminating angle
stage
moved
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24046687A
Other languages
Japanese (ja)
Inventor
Haruo Kasahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP24046687A priority Critical patent/JPS6482440A/en
Publication of JPS6482440A publication Critical patent/JPS6482440A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE:To correctly set the illuminating angle by moving a stage to largely move a mark, detecting the mark positions before and after the shift, and determining the illuminating angle of an ion beam based on the result. CONSTITUTION:A stage 26 is moved so that the center of a mark M and the optical axis of an ion beam coincide while the ion beam is not deflected, then the stage 26 is x-moved in the direction X. The mark position is x-moved in the direction X from a point A to a point A' by the shift of the stage 26. When the ion beam is deflected so as to be illuminated to the center of the mark M at the point A', the illuminating angle at that time is determined, when the desired illuminating angle is determined, the shift distance (x) of the stage can be obtained by calculation. When a deflector 25 is adjusted so that the ion beam is illuminated to the center of the mark after the mark position is correctly moved, the ion beam can be correctly set at the desired angle.
JP24046687A 1987-09-24 1987-09-24 Illuminating angle setting method for focusing ion beam device Pending JPS6482440A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24046687A JPS6482440A (en) 1987-09-24 1987-09-24 Illuminating angle setting method for focusing ion beam device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24046687A JPS6482440A (en) 1987-09-24 1987-09-24 Illuminating angle setting method for focusing ion beam device

Publications (1)

Publication Number Publication Date
JPS6482440A true JPS6482440A (en) 1989-03-28

Family

ID=17059928

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24046687A Pending JPS6482440A (en) 1987-09-24 1987-09-24 Illuminating angle setting method for focusing ion beam device

Country Status (1)

Country Link
JP (1) JPS6482440A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008298797A (en) * 2008-09-01 2008-12-11 Hitachi Ltd Sample preparing device
JP2009031339A (en) * 2007-07-24 2009-02-12 Nissin Ion Equipment Co Ltd Alignment processing apparatus
US8796651B2 (en) 2000-11-06 2014-08-05 Hitachi, Ltd. Method and apparatus for specimen fabrication

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8796651B2 (en) 2000-11-06 2014-08-05 Hitachi, Ltd. Method and apparatus for specimen fabrication
JP2009031339A (en) * 2007-07-24 2009-02-12 Nissin Ion Equipment Co Ltd Alignment processing apparatus
JP2008298797A (en) * 2008-09-01 2008-12-11 Hitachi Ltd Sample preparing device

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