JPS6486534A - Alignment device - Google Patents

Abstract

PURPOSE:To improve operating efficiency by positioning a target into an optical visual field while reducing the quantity of positional displacement of the target when the target in a sample is conformed and operated. CONSTITUTION:The second mask alignment of a wafer is inspected itself. Two- time movement is changed into a mean value because of second mask alignment at that time, and the corrected origin of an XY stage 4 is acquired by a moving average value. A mask is aligned while being observed by a microscope. Consequently, movement correction is predicted before mask alignment with reference to the first and second movement correction of the XY stage, and the XY stage 4 is returned automatically to the corrected origin. As a result, a target 21 in the wafer 1 is kept within a narrow microscope visual field 22 approximately positively, and the accuracy of the target is also improved. Accordingly, the correction time of mask alignment is shortened, and workhours are reduced.