JPS57152180A - Manufacture of semiconductor laser device - Google Patents
Manufacture of semiconductor laser deviceInfo
- Publication number
- JPS57152180A JPS57152180A JP3756981A JP3756981A JPS57152180A JP S57152180 A JPS57152180 A JP S57152180A JP 3756981 A JP3756981 A JP 3756981A JP 3756981 A JP3756981 A JP 3756981A JP S57152180 A JPS57152180 A JP S57152180A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- light guiding
- type
- laser device
- type inp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2231—Buried stripe structure with inner confining structure only between the active layer and the upper electrode
Abstract
PURPOSE:To manufacture with ease a semiconductor laser device with excellent temperature properties by a method wherein a clad layer, active layer, light guiding layer, and clad layer are successively grown on a semiconductor substrate and then the lamination is etched into a ridge shaped light guiding layer. CONSTITUTION:Grown successively on an N type InP semiconductor substrate 10 are an N type InP clad layer 11, InGaAsP active layer 12, P type InGaAsP light guiding layer 13, and P type InP clad layer 14 by the liquid phase epitaxial method. An SiO2 film 20 is added which, next, serves as a mask in etching the semiconductor layers into a ridge. The etching depth is to be controlled so that the light guiding layer is 0.2-0.3mum thick. Then, by the liquid phase epitaxial method, a P type InP layer 15 is grown on both sides of the ridge. Lastly, an N type InGaAsP electrode layer 16 is formed and covers the entire surface, resulting in the completion of a Buried Rib Waveguide (BRW) type semiconductor laser device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3756981A JPS57152180A (en) | 1981-03-16 | 1981-03-16 | Manufacture of semiconductor laser device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3756981A JPS57152180A (en) | 1981-03-16 | 1981-03-16 | Manufacture of semiconductor laser device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57152180A true JPS57152180A (en) | 1982-09-20 |
JPS6342871B2 JPS6342871B2 (en) | 1988-08-25 |
Family
ID=12501152
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3756981A Granted JPS57152180A (en) | 1981-03-16 | 1981-03-16 | Manufacture of semiconductor laser device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57152180A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60258987A (en) * | 1984-06-06 | 1985-12-20 | Matsushita Electric Ind Co Ltd | Semiconductor laser device and manufacture thereof |
JPS6254987A (en) * | 1985-09-04 | 1987-03-10 | Hitachi Ltd | Semiconductor laser |
JPH02394A (en) * | 1987-12-28 | 1990-01-05 | Canon Inc | Semiconductor laser |
JPH08307010A (en) * | 1996-04-22 | 1996-11-22 | Hitachi Ltd | Semiconductor laser |
-
1981
- 1981-03-16 JP JP3756981A patent/JPS57152180A/en active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60258987A (en) * | 1984-06-06 | 1985-12-20 | Matsushita Electric Ind Co Ltd | Semiconductor laser device and manufacture thereof |
JPS6254987A (en) * | 1985-09-04 | 1987-03-10 | Hitachi Ltd | Semiconductor laser |
JPH02394A (en) * | 1987-12-28 | 1990-01-05 | Canon Inc | Semiconductor laser |
JPH08307010A (en) * | 1996-04-22 | 1996-11-22 | Hitachi Ltd | Semiconductor laser |
Also Published As
Publication number | Publication date |
---|---|
JPS6342871B2 (en) | 1988-08-25 |
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