JPS57149788A - Injection semiconductor laser element - Google Patents
Injection semiconductor laser elementInfo
- Publication number
- JPS57149788A JPS57149788A JP2274282A JP2274282A JPS57149788A JP S57149788 A JPS57149788 A JP S57149788A JP 2274282 A JP2274282 A JP 2274282A JP 2274282 A JP2274282 A JP 2274282A JP S57149788 A JPS57149788 A JP S57149788A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- thickness
- 2mum
- liquidus
- growth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2231—Buried stripe structure with inner confining structure only between the active layer and the upper electrode
Abstract
PURPOSE:To increase reliability without inducing a crystal defect by a method wherein the third semiconductor layer is provided with a region discontinuously changing the lateral refractive index and laser oscillation is limited to basic lateral mode in injecting current to an active region. CONSTITUTION:After continuously applying liquidus growth to an n-Ga0.66Al0.35 AS layer 2 with a thickness of 2mum, n-Ga0.95Al0.05AS active region 3 with a thickness of 0.15mum, p-Ga0.65Al0.35S layer 4 with a thickness of 2mum on a GaAS substrate 1. The layer 4 is etched in belt shape with a width of 6mum. And liquidus growth is applied to an nGa0.6Al0.4AS layer 5 on the layer 4 up to the same height as that of the layer 4. After finishing a process. Zn6 is diffused to the upper surface of the layer 4 to provide an ohmic electrode 7 and an electrode 8 is also installed at the lower surface of the substrate 1. Parallel resonance reflection surfaces are mutually made to the surfaces 10, 11 of elements by clevage. In this way a crystal defect will not be induced and high reliability can be obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2274282A JPS57149788A (en) | 1982-02-17 | 1982-02-17 | Injection semiconductor laser element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2274282A JPS57149788A (en) | 1982-02-17 | 1982-02-17 | Injection semiconductor laser element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57149788A true JPS57149788A (en) | 1982-09-16 |
Family
ID=12091157
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2274282A Pending JPS57149788A (en) | 1982-02-17 | 1982-02-17 | Injection semiconductor laser element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57149788A (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5228281A (en) * | 1975-08-28 | 1977-03-03 | Fujitsu Ltd | Light emitting semiconductor device |
JPS5228887A (en) * | 1975-08-30 | 1977-03-04 | Fujitsu Ltd | Semiconductive emitter device |
JPS5245296A (en) * | 1975-10-07 | 1977-04-09 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductive phototransmission pass and semiconductor emission devic e used it |
JPS52143787A (en) * | 1976-05-26 | 1977-11-30 | Hitachi Ltd | Semiconductor laser |
-
1982
- 1982-02-17 JP JP2274282A patent/JPS57149788A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5228281A (en) * | 1975-08-28 | 1977-03-03 | Fujitsu Ltd | Light emitting semiconductor device |
JPS5228887A (en) * | 1975-08-30 | 1977-03-04 | Fujitsu Ltd | Semiconductive emitter device |
JPS5245296A (en) * | 1975-10-07 | 1977-04-09 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductive phototransmission pass and semiconductor emission devic e used it |
JPS52143787A (en) * | 1976-05-26 | 1977-11-30 | Hitachi Ltd | Semiconductor laser |
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