JPS57147857A - Sample observation through scanning electron microscope - Google Patents

Sample observation through scanning electron microscope

Info

Publication number
JPS57147857A
JPS57147857A JP56031332A JP3133281A JPS57147857A JP S57147857 A JPS57147857 A JP S57147857A JP 56031332 A JP56031332 A JP 56031332A JP 3133281 A JP3133281 A JP 3133281A JP S57147857 A JPS57147857 A JP S57147857A
Authority
JP
Japan
Prior art keywords
sample
room
charging
observation
positively
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56031332A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6148210B2 (enExample
Inventor
Koichi Kanetani
Kiichi Hojo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP56031332A priority Critical patent/JPS57147857A/ja
Publication of JPS57147857A publication Critical patent/JPS57147857A/ja
Publication of JPS6148210B2 publication Critical patent/JPS6148210B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
JP56031332A 1981-03-06 1981-03-06 Sample observation through scanning electron microscope Granted JPS57147857A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56031332A JPS57147857A (en) 1981-03-06 1981-03-06 Sample observation through scanning electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56031332A JPS57147857A (en) 1981-03-06 1981-03-06 Sample observation through scanning electron microscope

Publications (2)

Publication Number Publication Date
JPS57147857A true JPS57147857A (en) 1982-09-11
JPS6148210B2 JPS6148210B2 (enExample) 1986-10-23

Family

ID=12328297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56031332A Granted JPS57147857A (en) 1981-03-06 1981-03-06 Sample observation through scanning electron microscope

Country Status (1)

Country Link
JP (1) JPS57147857A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002131887A (ja) * 2000-10-20 2002-05-09 Horon:Kk マスク検査装置
WO2002075772A3 (en) * 2001-03-19 2003-03-06 Kla Tencor Corp Simultaneous flooding and inspection for charge control in an electron beam inspection machine
EP1296352A4 (en) * 2000-06-27 2007-04-18 Ebara Corp INVESTIGATION DEVICE FOR LOADED PARTICLE RAYS AND METHOD FOR PRODUCING A COMPONENT ELEVATED WITH THIS INSPECTION DEVICE
WO2007083756A1 (ja) * 2006-01-20 2007-07-26 Juridical Foundation Osaka Industrial Promotion Organization 電子顕微鏡用チャージアップ防止液状媒体、及びそれを用いた試料観察方法
US7417444B2 (en) 1996-03-05 2008-08-26 Hitachi, Ltd. Method and apparatus for inspecting integrated circuit pattern
WO2013035866A1 (ja) * 2011-09-09 2013-03-14 独立行政法人科学技術振興機構 生物試料をそのままの姿で観察するための電子顕微鏡による観察方法とそれに用いられる真空下での蒸発抑制用組成物、走査型電子顕微鏡および透過型電子顕微鏡

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5127981A (ja) * 1974-09-02 1976-03-09 Mitsui Shipbuilding Eng Jikubarikikei

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5127981A (ja) * 1974-09-02 1976-03-09 Mitsui Shipbuilding Eng Jikubarikikei

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7417444B2 (en) 1996-03-05 2008-08-26 Hitachi, Ltd. Method and apparatus for inspecting integrated circuit pattern
US7952074B2 (en) 1996-03-05 2011-05-31 Hitachi, Ltd. Method and apparatus for inspecting integrated circuit pattern
US8053726B2 (en) 2000-06-27 2011-11-08 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
EP1296352A4 (en) * 2000-06-27 2007-04-18 Ebara Corp INVESTIGATION DEVICE FOR LOADED PARTICLE RAYS AND METHOD FOR PRODUCING A COMPONENT ELEVATED WITH THIS INSPECTION DEVICE
US7241993B2 (en) 2000-06-27 2007-07-10 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US9368314B2 (en) 2000-06-27 2016-06-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7411191B2 (en) 2000-06-27 2008-08-12 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8803103B2 (en) 2000-06-27 2014-08-12 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8368031B2 (en) 2000-06-27 2013-02-05 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
JP2002131887A (ja) * 2000-10-20 2002-05-09 Horon:Kk マスク検査装置
WO2002075772A3 (en) * 2001-03-19 2003-03-06 Kla Tencor Corp Simultaneous flooding and inspection for charge control in an electron beam inspection machine
US6627884B2 (en) 2001-03-19 2003-09-30 Kla-Tencor Technologies Corporation Simultaneous flooding and inspection for charge control in an electron beam inspection machine
US7880144B2 (en) 2006-01-20 2011-02-01 Juridical Foundation Osaka Industrial Promotion Organization c/o Mydome Osaka Liquid medium for preventing charge-up in electron microscope and method of observing sample using the same
JP4581100B2 (ja) * 2006-01-20 2010-11-17 財団法人大阪産業振興機構 電子顕微鏡用の標体の作製方法およびそれを用いた試料観察方法、ならびに試料観察装置
JPWO2007083756A1 (ja) * 2006-01-20 2009-06-11 財団法人大阪産業振興機構 電子顕微鏡用チャージアップ防止液状媒体、及びそれを用いた試料観察方法
WO2007083756A1 (ja) * 2006-01-20 2007-07-26 Juridical Foundation Osaka Industrial Promotion Organization 電子顕微鏡用チャージアップ防止液状媒体、及びそれを用いた試料観察方法
WO2013035866A1 (ja) * 2011-09-09 2013-03-14 独立行政法人科学技術振興機構 生物試料をそのままの姿で観察するための電子顕微鏡による観察方法とそれに用いられる真空下での蒸発抑制用組成物、走査型電子顕微鏡および透過型電子顕微鏡
JPWO2013035866A1 (ja) * 2011-09-09 2015-03-23 独立行政法人科学技術振興機構 生物試料をそのままの姿で観察するための電子顕微鏡による観察方法とそれに用いられる真空下での蒸発抑制用組成物、走査型電子顕微鏡および透過型電子顕微鏡

Also Published As

Publication number Publication date
JPS6148210B2 (enExample) 1986-10-23

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