JPS57136320A - Exchanger for sample in electron-ray drawing device - Google Patents
Exchanger for sample in electron-ray drawing deviceInfo
- Publication number
- JPS57136320A JPS57136320A JP2088781A JP2088781A JPS57136320A JP S57136320 A JPS57136320 A JP S57136320A JP 2088781 A JP2088781 A JP 2088781A JP 2088781 A JP2088781 A JP 2088781A JP S57136320 A JPS57136320 A JP S57136320A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- sample
- preparatory
- electron
- time
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To shorten turn-around time required for drawing per one sample by mounting the three sample exchanging chambers of the first chamber, a preparatory chamber and the third chamber apart from a sample chamber for conducting the drawing of the electron-ray drawing device and taking in and out a sample cassette independently of the action of drawing. CONSTITUTION:A sample 10 is admitted into the first chamber 8 under atmospheric pressure. The first chamber 8 and the third chamber 13 are evacuated in the same extent as the sample chamber 1, and the sample 10 is moved into the preparatory chamber 2. A sample 10a in the preparatory chamber 2 previously drawn is shifted to the third chamber 13 at the same time. The sample 10 in the preparatory chamber 2 is introduced into the sample chamber 1, and drawn. Another sample is entered into the first chamber during that time, and the first chamber is evacuated together with the third chamber. The sample 10 is returned into the preparatory chamber 2 from the inside of the sample chamber 1, and another sample in the first chamber 8 is transferred into the preparartory chamber 2 while the sample 10 is moved into the third chamber 13. The sample is shifted into the sample chamber 1 from the preparatory chamber 2 at once. The first and third chambers are returned to atmospheric pressure, a new sample is admitted into the first chamber 8, and the sample is taken out of the third chamber 13. New drawing is conducted during that time.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2088781A JPS57136320A (en) | 1981-02-17 | 1981-02-17 | Exchanger for sample in electron-ray drawing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2088781A JPS57136320A (en) | 1981-02-17 | 1981-02-17 | Exchanger for sample in electron-ray drawing device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57136320A true JPS57136320A (en) | 1982-08-23 |
JPH0324773B2 JPH0324773B2 (en) | 1991-04-04 |
Family
ID=12039712
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2088781A Granted JPS57136320A (en) | 1981-02-17 | 1981-02-17 | Exchanger for sample in electron-ray drawing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57136320A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5853831A (en) * | 1981-09-26 | 1983-03-30 | Fujitsu Ltd | Electron beam exposing device |
JPH02250253A (en) * | 1989-03-23 | 1990-10-08 | Nec Corp | Charged particle drawing device for thin film specimen and thin film specimen fixing jig |
JPH06244178A (en) * | 1993-11-15 | 1994-09-02 | Hitachi Ltd | Ic processing device |
JPH08153721A (en) * | 1995-04-26 | 1996-06-11 | Hitachi Ltd | Method and device for correcting ic element |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5428371U (en) * | 1977-07-28 | 1979-02-24 | ||
JPS55146930A (en) * | 1979-05-04 | 1980-11-15 | Hitachi Ltd | Specimen-exchanging device in electronic beam depicting device |
-
1981
- 1981-02-17 JP JP2088781A patent/JPS57136320A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5428371U (en) * | 1977-07-28 | 1979-02-24 | ||
JPS55146930A (en) * | 1979-05-04 | 1980-11-15 | Hitachi Ltd | Specimen-exchanging device in electronic beam depicting device |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5853831A (en) * | 1981-09-26 | 1983-03-30 | Fujitsu Ltd | Electron beam exposing device |
JPH02250253A (en) * | 1989-03-23 | 1990-10-08 | Nec Corp | Charged particle drawing device for thin film specimen and thin film specimen fixing jig |
JPH06244178A (en) * | 1993-11-15 | 1994-09-02 | Hitachi Ltd | Ic processing device |
JP2829232B2 (en) * | 1993-11-15 | 1998-11-25 | 株式会社日立製作所 | IC device processing equipment |
JPH08153721A (en) * | 1995-04-26 | 1996-06-11 | Hitachi Ltd | Method and device for correcting ic element |
JP2829254B2 (en) * | 1995-04-26 | 1998-11-25 | 株式会社日立製作所 | IC element repair method and device |
Also Published As
Publication number | Publication date |
---|---|
JPH0324773B2 (en) | 1991-04-04 |
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