JPS57136320A - Exchanger for sample in electron-ray drawing device - Google Patents

Exchanger for sample in electron-ray drawing device

Info

Publication number
JPS57136320A
JPS57136320A JP2088781A JP2088781A JPS57136320A JP S57136320 A JPS57136320 A JP S57136320A JP 2088781 A JP2088781 A JP 2088781A JP 2088781 A JP2088781 A JP 2088781A JP S57136320 A JPS57136320 A JP S57136320A
Authority
JP
Japan
Prior art keywords
chamber
sample
preparatory
electron
time
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2088781A
Other languages
Japanese (ja)
Other versions
JPH0324773B2 (en
Inventor
Tsutomu Ito
Toru Tojo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP2088781A priority Critical patent/JPS57136320A/en
Publication of JPS57136320A publication Critical patent/JPS57136320A/en
Publication of JPH0324773B2 publication Critical patent/JPH0324773B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/18Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To shorten turn-around time required for drawing per one sample by mounting the three sample exchanging chambers of the first chamber, a preparatory chamber and the third chamber apart from a sample chamber for conducting the drawing of the electron-ray drawing device and taking in and out a sample cassette independently of the action of drawing. CONSTITUTION:A sample 10 is admitted into the first chamber 8 under atmospheric pressure. The first chamber 8 and the third chamber 13 are evacuated in the same extent as the sample chamber 1, and the sample 10 is moved into the preparatory chamber 2. A sample 10a in the preparatory chamber 2 previously drawn is shifted to the third chamber 13 at the same time. The sample 10 in the preparatory chamber 2 is introduced into the sample chamber 1, and drawn. Another sample is entered into the first chamber during that time, and the first chamber is evacuated together with the third chamber. The sample 10 is returned into the preparatory chamber 2 from the inside of the sample chamber 1, and another sample in the first chamber 8 is transferred into the preparartory chamber 2 while the sample 10 is moved into the third chamber 13. The sample is shifted into the sample chamber 1 from the preparatory chamber 2 at once. The first and third chambers are returned to atmospheric pressure, a new sample is admitted into the first chamber 8, and the sample is taken out of the third chamber 13. New drawing is conducted during that time.
JP2088781A 1981-02-17 1981-02-17 Exchanger for sample in electron-ray drawing device Granted JPS57136320A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2088781A JPS57136320A (en) 1981-02-17 1981-02-17 Exchanger for sample in electron-ray drawing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2088781A JPS57136320A (en) 1981-02-17 1981-02-17 Exchanger for sample in electron-ray drawing device

Publications (2)

Publication Number Publication Date
JPS57136320A true JPS57136320A (en) 1982-08-23
JPH0324773B2 JPH0324773B2 (en) 1991-04-04

Family

ID=12039712

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2088781A Granted JPS57136320A (en) 1981-02-17 1981-02-17 Exchanger for sample in electron-ray drawing device

Country Status (1)

Country Link
JP (1) JPS57136320A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5853831A (en) * 1981-09-26 1983-03-30 Fujitsu Ltd Electron beam exposing device
JPH02250253A (en) * 1989-03-23 1990-10-08 Nec Corp Charged particle drawing device for thin film specimen and thin film specimen fixing jig
JPH06244178A (en) * 1993-11-15 1994-09-02 Hitachi Ltd Ic processing device
JPH08153721A (en) * 1995-04-26 1996-06-11 Hitachi Ltd Method and device for correcting ic element

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5428371U (en) * 1977-07-28 1979-02-24
JPS55146930A (en) * 1979-05-04 1980-11-15 Hitachi Ltd Specimen-exchanging device in electronic beam depicting device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5428371U (en) * 1977-07-28 1979-02-24
JPS55146930A (en) * 1979-05-04 1980-11-15 Hitachi Ltd Specimen-exchanging device in electronic beam depicting device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5853831A (en) * 1981-09-26 1983-03-30 Fujitsu Ltd Electron beam exposing device
JPH02250253A (en) * 1989-03-23 1990-10-08 Nec Corp Charged particle drawing device for thin film specimen and thin film specimen fixing jig
JPH06244178A (en) * 1993-11-15 1994-09-02 Hitachi Ltd Ic processing device
JP2829232B2 (en) * 1993-11-15 1998-11-25 株式会社日立製作所 IC device processing equipment
JPH08153721A (en) * 1995-04-26 1996-06-11 Hitachi Ltd Method and device for correcting ic element
JP2829254B2 (en) * 1995-04-26 1998-11-25 株式会社日立製作所 IC element repair method and device

Also Published As

Publication number Publication date
JPH0324773B2 (en) 1991-04-04

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