JPS57135950A - Preparation of photomask - Google Patents

Preparation of photomask

Info

Publication number
JPS57135950A
JPS57135950A JP1958481A JP1958481A JPS57135950A JP S57135950 A JPS57135950 A JP S57135950A JP 1958481 A JP1958481 A JP 1958481A JP 1958481 A JP1958481 A JP 1958481A JP S57135950 A JPS57135950 A JP S57135950A
Authority
JP
Japan
Prior art keywords
layer
photomask
plasma
metallic
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1958481A
Other languages
English (en)
Japanese (ja)
Other versions
JPS629895B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Masanobu Shibuya
Masaki Shintani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Victor Company of Japan Ltd
Nippon Victor KK
Original Assignee
Victor Company of Japan Ltd
Nippon Victor KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Victor Company of Japan Ltd, Nippon Victor KK filed Critical Victor Company of Japan Ltd
Priority to JP1958481A priority Critical patent/JPS57135950A/ja
Publication of JPS57135950A publication Critical patent/JPS57135950A/ja
Publication of JPS629895B2 publication Critical patent/JPS629895B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP1958481A 1981-02-14 1981-02-14 Preparation of photomask Granted JPS57135950A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1958481A JPS57135950A (en) 1981-02-14 1981-02-14 Preparation of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1958481A JPS57135950A (en) 1981-02-14 1981-02-14 Preparation of photomask

Publications (2)

Publication Number Publication Date
JPS57135950A true JPS57135950A (en) 1982-08-21
JPS629895B2 JPS629895B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-03-03

Family

ID=12003301

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1958481A Granted JPS57135950A (en) 1981-02-14 1981-02-14 Preparation of photomask

Country Status (1)

Country Link
JP (1) JPS57135950A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6286364A (ja) * 1985-10-11 1987-04-20 Nec Corp 選択金属酸化膜堆積方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6286364A (ja) * 1985-10-11 1987-04-20 Nec Corp 選択金属酸化膜堆積方法

Also Published As

Publication number Publication date
JPS629895B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-03-03

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