JPS57133645A - Semiconductor integrated circuit device and manufacture thereof - Google Patents
Semiconductor integrated circuit device and manufacture thereofInfo
- Publication number
- JPS57133645A JPS57133645A JP56019462A JP1946281A JPS57133645A JP S57133645 A JPS57133645 A JP S57133645A JP 56019462 A JP56019462 A JP 56019462A JP 1946281 A JP1946281 A JP 1946281A JP S57133645 A JPS57133645 A JP S57133645A
- Authority
- JP
- Japan
- Prior art keywords
- film
- layer
- groove
- coated
- polycrystalline
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
- 
        - H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/763—Polycrystalline semiconductor regions
 
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Element Separation (AREA)
- Local Oxidation Of Silicon (AREA)
- Bipolar Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP56019462A JPS57133645A (en) | 1981-02-12 | 1981-02-12 | Semiconductor integrated circuit device and manufacture thereof | 
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP56019462A JPS57133645A (en) | 1981-02-12 | 1981-02-12 | Semiconductor integrated circuit device and manufacture thereof | 
Publications (2)
| Publication Number | Publication Date | 
|---|---|
| JPS57133645A true JPS57133645A (en) | 1982-08-18 | 
| JPH0217937B2 JPH0217937B2 (OSRAM) | 1990-04-24 | 
Family
ID=11999986
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| JP56019462A Granted JPS57133645A (en) | 1981-02-12 | 1981-02-12 | Semiconductor integrated circuit device and manufacture thereof | 
Country Status (1)
| Country | Link | 
|---|---|
| JP (1) | JPS57133645A (OSRAM) | 
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPH02156552A (ja) * | 1988-12-08 | 1990-06-15 | Nec Corp | 半導体装置およびその製造方法 | 
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS4869485A (OSRAM) * | 1971-12-22 | 1973-09-20 | ||
| JPS5379473A (en) * | 1976-12-24 | 1978-07-13 | Fujitsu Ltd | Manufacture of semiconductor device | 
- 
        1981
        - 1981-02-12 JP JP56019462A patent/JPS57133645A/ja active Granted
 
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS4869485A (OSRAM) * | 1971-12-22 | 1973-09-20 | ||
| JPS5379473A (en) * | 1976-12-24 | 1978-07-13 | Fujitsu Ltd | Manufacture of semiconductor device | 
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPH02156552A (ja) * | 1988-12-08 | 1990-06-15 | Nec Corp | 半導体装置およびその製造方法 | 
Also Published As
| Publication number | Publication date | 
|---|---|
| JPH0217937B2 (OSRAM) | 1990-04-24 | 
Similar Documents
| Publication | Publication Date | Title | 
|---|---|---|
| JPS54161268A (en) | Method of manufacturing semiconductor device growing silicon layer on sapphire substrate | |
| SE8300040D0 (sv) | Odling av monokristallin kisel | |
| JPS54154272A (en) | Contact forming method for semiconductor device | |
| JPS57133645A (en) | Semiconductor integrated circuit device and manufacture thereof | |
| JPS57133646A (en) | Semiconductor integrated circuit device and manufacture thereof | |
| JPS5434756A (en) | Vapor-phase growth method for semiconductor | |
| JPS6430245A (en) | Manufacture of semiconductor device | |
| JPS56108264A (en) | Manufacture of semiconductor device | |
| JPS5735368A (en) | Manufacture of semiconductor device | |
| JPS53148988A (en) | Manufacture of semiconductor substrate | |
| JPS6430244A (en) | Manufacture of semiconductor device | |
| JPS52130575A (en) | Semiconductor device and its preparation | |
| JPS54162982A (en) | Manufacture of semiconductor device | |
| JPS5575235A (en) | Method of fabricating semiconductor device | |
| Corboy et al. | Method for Growing Monocrystalline Silicon on a Masking Layer | |
| JPS57199231A (en) | Manufacture of semiconductor device | |
| JPS5754342A (ja) | Handotaisochinoseizohoho | |
| JPS551150A (en) | Method of fabricating semiconductor device | |
| JPS57128942A (en) | Manufacture of insulation isolating substrate | |
| JPS57204150A (en) | Manufacture of semiconductor device | |
| JPS5379473A (en) | Manufacture of semiconductor device | |
| JPS6445139A (en) | Manufacture of semiconductor device | |
| JPS54139486A (en) | Manufacture of semiconductor device | |
| JPS54162983A (en) | Manufacture of semiconductor device | |
| JPS56146251A (en) | Semiconductor device and manufacture therefor |