JPS57128989A - Manufacture of semiconductor light emitting element - Google Patents
Manufacture of semiconductor light emitting elementInfo
- Publication number
- JPS57128989A JPS57128989A JP1414581A JP1414581A JPS57128989A JP S57128989 A JPS57128989 A JP S57128989A JP 1414581 A JP1414581 A JP 1414581A JP 1414581 A JP1414581 A JP 1414581A JP S57128989 A JPS57128989 A JP S57128989A
- Authority
- JP
- Japan
- Prior art keywords
- type
- inp layer
- type inp
- layer
- manufacture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2054—Methods of obtaining the confinement
- H01S5/2059—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
Landscapes
- Led Devices (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To manufacture the internal narrow type element easily by selectively diffusing or ion-implanting an impurity having the second condution type from the surface of the second semicondutor layer in an epitaxial wafer. CONSTITUTION:A P type InP layer 22, an N type or P type InGaAsP layer 23, an N type InP layer 24 and an N type InP layer 25 having high concentration are formed successively onto a P type InP substrate 21. One part of the surface of the N type InP layer 25 is masked in a striped shape with an insulating film of SiO2, etc., and the surface of the N type InP layer 25 is etched. The P type impurity such as Cd or Zn or the like is diffused, and P type regions 26 through diffusion are shaped to one parts of the N type InP layer 24. The diffusion mask is removed, and an N type ohmic electrode metallic film 27 is formed to the surface of the N type InP layer 25. Lastly, a P type ohmic electrode metallic film 28 is shaped.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1414581A JPS57128989A (en) | 1981-02-02 | 1981-02-02 | Manufacture of semiconductor light emitting element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1414581A JPS57128989A (en) | 1981-02-02 | 1981-02-02 | Manufacture of semiconductor light emitting element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57128989A true JPS57128989A (en) | 1982-08-10 |
Family
ID=11852978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1414581A Pending JPS57128989A (en) | 1981-02-02 | 1981-02-02 | Manufacture of semiconductor light emitting element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57128989A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006030746A1 (en) * | 2004-09-13 | 2006-03-23 | The University Of Tokyo | Semiconductor light-emitting element |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5099285A (en) * | 1973-12-28 | 1975-08-06 |
-
1981
- 1981-02-02 JP JP1414581A patent/JPS57128989A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5099285A (en) * | 1973-12-28 | 1975-08-06 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006030746A1 (en) * | 2004-09-13 | 2006-03-23 | The University Of Tokyo | Semiconductor light-emitting element |
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