JPS57124441A - Control of semiconductor surface reaction - Google Patents

Control of semiconductor surface reaction

Info

Publication number
JPS57124441A
JPS57124441A JP56009084A JP908481A JPS57124441A JP S57124441 A JPS57124441 A JP S57124441A JP 56009084 A JP56009084 A JP 56009084A JP 908481 A JP908481 A JP 908481A JP S57124441 A JPS57124441 A JP S57124441A
Authority
JP
Japan
Prior art keywords
chemical
semiconductor
semiconductor surface
wafer
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56009084A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0136248B2 (enExample
Inventor
Hisashi Muraoka
Hachiro Hiratsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP56009084A priority Critical patent/JPS57124441A/ja
Publication of JPS57124441A publication Critical patent/JPS57124441A/ja
Publication of JPH0136248B2 publication Critical patent/JPH0136248B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P52/00—

Landscapes

  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP56009084A 1981-01-26 1981-01-26 Control of semiconductor surface reaction Granted JPS57124441A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56009084A JPS57124441A (en) 1981-01-26 1981-01-26 Control of semiconductor surface reaction

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56009084A JPS57124441A (en) 1981-01-26 1981-01-26 Control of semiconductor surface reaction

Publications (2)

Publication Number Publication Date
JPS57124441A true JPS57124441A (en) 1982-08-03
JPH0136248B2 JPH0136248B2 (enExample) 1989-07-31

Family

ID=11710746

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56009084A Granted JPS57124441A (en) 1981-01-26 1981-01-26 Control of semiconductor surface reaction

Country Status (1)

Country Link
JP (1) JPS57124441A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59127838A (ja) * 1983-01-11 1984-07-23 Sumitomo Electric Ind Ltd ミラ−ウエハの連続エツチング装置
JPS60121777A (ja) * 1983-12-06 1985-06-29 Toshiba Corp シリコン結晶体の接合方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5184371U (enExample) * 1974-12-26 1976-07-06
JPS54145980A (en) * 1978-05-09 1979-11-14 Omron Tateisi Electronics Co Twoowire contactless microswitch

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5184371U (enExample) * 1974-12-26 1976-07-06
JPS54145980A (en) * 1978-05-09 1979-11-14 Omron Tateisi Electronics Co Twoowire contactless microswitch

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59127838A (ja) * 1983-01-11 1984-07-23 Sumitomo Electric Ind Ltd ミラ−ウエハの連続エツチング装置
JPS60121777A (ja) * 1983-12-06 1985-06-29 Toshiba Corp シリコン結晶体の接合方法

Also Published As

Publication number Publication date
JPH0136248B2 (enExample) 1989-07-31

Similar Documents

Publication Publication Date Title
JPS52139378A (en) Integrated treatment apparatus for semiconductor wafers
SE7605943L (sv) Forfarande och anordning for lutning av forvedat gres
JPS5271871A (en) Washing apparatus
JPS57128071A (en) Field-effect type semiconductor device and manufacture thereof
DE58908255D1 (de) Verfahren zur nasschemischen Oberflächenbehandlung von Halbleiterscheiben.
YU204477A (en) Process for rinsing articles after a chemical and electrochemical treatment of the surface
JPS5271386A (en) Method of removing membrane contaminants
JPS57124441A (en) Control of semiconductor surface reaction
JPS5790941A (en) Swing type vertical washer
GB1375402A (enExample)
JPS5322826A (en) Method of cleaning material after plating and*or* chemical surface treatment
JPS55127016A (en) Manufacturing of semiconductor device
JPS51140574A (en) Method of cleaning silicon substrate plate
JPS5428067A (en) Apparatus for treating sludge-like material
JPS5494274A (en) Liquid terating device of semiconductor wafers
JPS5362476A (en) Processing method of semiconductor surface
JPS55145343A (en) Method for surface treatment of semiconducter alloy
ATE13391T1 (de) Verfahren und vorrichtung zum reinigen, desinfizieren, spuelen und trocknen von gegenstaenden oder instrumenten.
FR2382523A1 (fr) Procede d'elimination selective d'un materiau semiconducteur par rapport a un autre materiau semiconducteur, et produit en resultant
JPS54105396A (en) Electric method for treating metal surface
JPS52150974A (en) Semiconductor wafer treatment apparatus
JPS52156176A (en) Surface washing method of liquid treating membrane
JPS56134739A (en) Manufacture of semiconductor device
JPS522273A (en) Method of treating semiconductor substrate
JPS52105651A (en) Process for treating drain water