JPS57123639A - Method for monitoring ion current for ion implantation apparatus - Google Patents

Method for monitoring ion current for ion implantation apparatus

Info

Publication number
JPS57123639A
JPS57123639A JP56008027A JP802781A JPS57123639A JP S57123639 A JPS57123639 A JP S57123639A JP 56008027 A JP56008027 A JP 56008027A JP 802781 A JP802781 A JP 802781A JP S57123639 A JPS57123639 A JP S57123639A
Authority
JP
Japan
Prior art keywords
ion
ion implantation
shielding plate
ion beam
passageway
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56008027A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6329786B2 (enrdf_load_stackoverflow
Inventor
Mitsunori Ketsusako
Norio Kanai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP56008027A priority Critical patent/JPS57123639A/ja
Publication of JPS57123639A publication Critical patent/JPS57123639A/ja
Publication of JPS6329786B2 publication Critical patent/JPS6329786B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP56008027A 1981-01-23 1981-01-23 Method for monitoring ion current for ion implantation apparatus Granted JPS57123639A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56008027A JPS57123639A (en) 1981-01-23 1981-01-23 Method for monitoring ion current for ion implantation apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56008027A JPS57123639A (en) 1981-01-23 1981-01-23 Method for monitoring ion current for ion implantation apparatus

Publications (2)

Publication Number Publication Date
JPS57123639A true JPS57123639A (en) 1982-08-02
JPS6329786B2 JPS6329786B2 (enrdf_load_stackoverflow) 1988-06-15

Family

ID=11681849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56008027A Granted JPS57123639A (en) 1981-01-23 1981-01-23 Method for monitoring ion current for ion implantation apparatus

Country Status (1)

Country Link
JP (1) JPS57123639A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6068542A (ja) * 1983-09-22 1985-04-19 Tokyo Erekutoron Kk イオン注入装置
JPS6386340A (ja) * 1986-09-30 1988-04-16 Fujitsu Ltd 一次粒子線照射装置
US4804852A (en) * 1987-01-29 1989-02-14 Eaton Corporation Treating work pieces with electro-magnetically scanned ion beams
JPH0628141B2 (ja) * 1986-05-16 1994-04-13 バリアン・アソシエイツ・インコーポレイテッド イオン注入のための注入量の測定及び均一性のモニタリング装置
JP2001185072A (ja) * 1999-10-12 2001-07-06 Applied Materials Inc イオン注入装置およびそれに用いるビームストップ

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0233384U (enrdf_load_stackoverflow) * 1988-08-26 1990-03-02
JPH0344684U (enrdf_load_stackoverflow) * 1989-09-06 1991-04-25

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4934190A (enrdf_load_stackoverflow) * 1972-08-01 1974-03-29
JPS4999158A (enrdf_load_stackoverflow) * 1972-12-14 1974-09-19
JPS531185A (en) * 1976-06-24 1978-01-07 Daicel Chem Ind Ltd Adsorbent for oily substances
JPS553643U (enrdf_load_stackoverflow) * 1978-06-21 1980-01-11
JPS5549417A (en) * 1978-10-06 1980-04-09 Nippon Kokan Kk <Nkk> Ice crusher for structure in freeze-up waters

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4934190A (enrdf_load_stackoverflow) * 1972-08-01 1974-03-29
JPS4999158A (enrdf_load_stackoverflow) * 1972-12-14 1974-09-19
JPS531185A (en) * 1976-06-24 1978-01-07 Daicel Chem Ind Ltd Adsorbent for oily substances
JPS553643U (enrdf_load_stackoverflow) * 1978-06-21 1980-01-11
JPS5549417A (en) * 1978-10-06 1980-04-09 Nippon Kokan Kk <Nkk> Ice crusher for structure in freeze-up waters

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6068542A (ja) * 1983-09-22 1985-04-19 Tokyo Erekutoron Kk イオン注入装置
JPH0628141B2 (ja) * 1986-05-16 1994-04-13 バリアン・アソシエイツ・インコーポレイテッド イオン注入のための注入量の測定及び均一性のモニタリング装置
JPS6386340A (ja) * 1986-09-30 1988-04-16 Fujitsu Ltd 一次粒子線照射装置
US4804852A (en) * 1987-01-29 1989-02-14 Eaton Corporation Treating work pieces with electro-magnetically scanned ion beams
JP2001185072A (ja) * 1999-10-12 2001-07-06 Applied Materials Inc イオン注入装置およびそれに用いるビームストップ

Also Published As

Publication number Publication date
JPS6329786B2 (enrdf_load_stackoverflow) 1988-06-15

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