JPS6419665A - Ion beam device - Google Patents

Ion beam device

Info

Publication number
JPS6419665A
JPS6419665A JP17563587A JP17563587A JPS6419665A JP S6419665 A JPS6419665 A JP S6419665A JP 17563587 A JP17563587 A JP 17563587A JP 17563587 A JP17563587 A JP 17563587A JP S6419665 A JPS6419665 A JP S6419665A
Authority
JP
Japan
Prior art keywords
target
plate
generated
potential
secondary ions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17563587A
Other languages
Japanese (ja)
Inventor
Haruo Kasahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP17563587A priority Critical patent/JPS6419665A/en
Publication of JPS6419665A publication Critical patent/JPS6419665A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To enable secondary ions to be detected efficiently without deteriorating a detector by detecting secondary ions generated from a conversion plane after injecting the secondary ions generated from a target into the secondary electron conversion plane kept equal in potential to the objective lens side. CONSTITUTION:Secondary electrons generated with the irradiation of ion beams to a target 10 are drawn back to the target 10 since the potential of the target 10 is higher than the potential on the objective lens side. However, the secondary ion generated from the target is accelerated with 27kV and enters an electric field softening electrode 16 and a plate 14 in the earth potential. Secondary electrons are generated from the plate with the injection of the secondary ions to the plate 14. This secondary electrons are invited to a microchannel plate 17 by the potential difference between the plate 14 and the microchannel plate 17 and detected there. Hereby, the secondary ions from the target can be defected without causing deterioration in the detector.
JP17563587A 1987-07-14 1987-07-14 Ion beam device Pending JPS6419665A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17563587A JPS6419665A (en) 1987-07-14 1987-07-14 Ion beam device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17563587A JPS6419665A (en) 1987-07-14 1987-07-14 Ion beam device

Publications (1)

Publication Number Publication Date
JPS6419665A true JPS6419665A (en) 1989-01-23

Family

ID=15999532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17563587A Pending JPS6419665A (en) 1987-07-14 1987-07-14 Ion beam device

Country Status (1)

Country Link
JP (1) JPS6419665A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5240688A (en) * 1990-08-01 1993-08-31 Fuel Tech Gmbh Process for the in-line hydrolysis of urea
JP2017135048A (en) * 2016-01-29 2017-08-03 株式会社ホロン Electron detecting device and electron detecting method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5240688A (en) * 1990-08-01 1993-08-31 Fuel Tech Gmbh Process for the in-line hydrolysis of urea
JP2017135048A (en) * 2016-01-29 2017-08-03 株式会社ホロン Electron detecting device and electron detecting method

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