JPS571229A - Device for automatically positioning wafer - Google Patents
Device for automatically positioning waferInfo
- Publication number
- JPS571229A JPS571229A JP6529681A JP6529681A JPS571229A JP S571229 A JPS571229 A JP S571229A JP 6529681 A JP6529681 A JP 6529681A JP 6529681 A JP6529681 A JP 6529681A JP S571229 A JPS571229 A JP S571229A
- Authority
- JP
- Japan
- Prior art keywords
- automatically positioning
- positioning wafer
- wafer
- automatically
- positioning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/146,532 US4344160A (en) | 1980-05-02 | 1980-05-02 | Automatic wafer focusing and flattening system |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS571229A true JPS571229A (en) | 1982-01-06 |
JPH0370365B2 JPH0370365B2 (ja) | 1991-11-07 |
Family
ID=22517814
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6529681A Granted JPS571229A (en) | 1980-05-02 | 1981-05-01 | Device for automatically positioning wafer |
Country Status (5)
Country | Link |
---|---|
US (1) | US4344160A (ja) |
EP (1) | EP0039407B1 (ja) |
JP (1) | JPS571229A (ja) |
CA (1) | CA1157128A (ja) |
DE (1) | DE3173046D1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58156937A (ja) * | 1982-03-12 | 1983-09-19 | Hitachi Ltd | 露光装置 |
JPS5975625A (ja) * | 1982-10-22 | 1984-04-28 | Fujitsu Ltd | 基板支持方法 |
JPH01292206A (ja) * | 1988-05-19 | 1989-11-24 | Nikon Corp | 物体の表面状態測定装置及び表面の高さ測定装置 |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4504144A (en) * | 1982-07-06 | 1985-03-12 | The Perkin-Elmer Corporation | Simple electromechanical tilt and focus device |
JPS6022319A (ja) * | 1983-07-18 | 1985-02-04 | Canon Inc | 半導体露光装置 |
US4560880A (en) * | 1983-09-19 | 1985-12-24 | Varian Associates, Inc. | Apparatus for positioning a workpiece in a localized vacuum processing system |
US4600282A (en) * | 1983-11-14 | 1986-07-15 | Canon Kabushiki Kaisha | Alignment apparatus |
US4682159A (en) * | 1984-06-20 | 1987-07-21 | Personics Corporation | Apparatus and method for controlling a cursor on a computer display |
JPS61259170A (ja) * | 1985-05-14 | 1986-11-17 | Olympus Optical Co Ltd | 超音波顕微鏡における試料の傾き調整装置 |
EP0214453B1 (de) * | 1985-08-13 | 1992-03-25 | Edelhoff M.S.T.S. Gmbh | System zur Bestimming der Lage eines Objekts relativ zu einer Handhabungseinrichtung |
US4669069A (en) * | 1985-10-18 | 1987-05-26 | Cathodochromic Partners, Ltd. | Dual reflected energy beam alignment system |
AT391772B (de) * | 1986-05-16 | 1990-11-26 | Ims Ionen Mikrofab Syst | Anordnung zum positionieren der abbildung der struktur einer maske auf ein substrat |
AT393925B (de) * | 1987-06-02 | 1992-01-10 | Ims Ionen Mikrofab Syst | Anordnung zur durchfuehrung eines verfahrens zum positionieren der abbildung der auf einer maske befindlichen struktur auf ein substrat, und verfahren zum ausrichten von auf einer maske angeordneten markierungen auf markierungen, die auf einem traeger angeordnet sind |
AT391773B (de) * | 1987-10-12 | 1990-11-26 | Thallner Erich | Vorrichtung zum exponieren eines halbleitersubstrates gegen ein strahlungsmuster |
DE3822598C2 (de) * | 1988-07-04 | 1997-09-04 | Siemens Ag | Justieranordnung und Verfahren zum Justieren einer Greifvorrichtung eines Roboterarms zum Handhaben einer Halbleiterscheibe |
US5908530A (en) * | 1995-05-18 | 1999-06-01 | Obsidian, Inc. | Apparatus for chemical mechanical polishing |
AT404523B (de) * | 1997-02-03 | 1998-12-28 | Thallner Erich | Verfahren zum ausrichten von insbesondere scheibenförmigen halbleitersubstraten und vorrichtung zur durchführung des verfahrens |
US6205870B1 (en) | 1997-10-10 | 2001-03-27 | Applied Komatsu Technology, Inc. | Automated substrate processing systems and methods |
US5948986A (en) * | 1997-12-26 | 1999-09-07 | Applied Materials, Inc. | Monitoring of wafer presence and position in semiconductor processing operations |
US6247368B1 (en) * | 1999-01-04 | 2001-06-19 | International Business Machines Corporation | CMP wet application wafer sensor |
US6488565B1 (en) | 2000-08-29 | 2002-12-03 | Applied Materials, Inc. | Apparatus for chemical mechanical planarization having nested load cups |
US7596425B2 (en) * | 2003-06-13 | 2009-09-29 | Dainippon Screen Mfg. Co., Ltd. | Substrate detecting apparatus and method, substrate transporting apparatus and method, and substrate processing apparatus and method |
US7391676B2 (en) * | 2004-12-22 | 2008-06-24 | Asml Netherlands B.V. | Ultrasonic distance sensors |
DE102007049103B4 (de) * | 2007-10-11 | 2011-03-31 | Vistec Semiconductor Systems Gmbh | System zum Bestimmen der lagerichtigen Position einer Maske in einer Ablage einer Koordinaten-Messmaschine |
WO2011111327A1 (ja) * | 2010-03-12 | 2011-09-15 | パナソニック株式会社 | アライメント方法およびフラットパネルディスプレイの製造方法 |
CN105785724B (zh) * | 2016-05-20 | 2017-06-30 | 中国科学院微电子研究所 | 一种掩膜图形的优化方法、最佳焦平面位置测量方法及系统 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4888871A (ja) * | 1972-02-02 | 1973-11-21 | ||
JPS5255472A (en) * | 1975-10-31 | 1977-05-06 | Thomson Csf | Mask photo repeater |
JPS52108776A (en) * | 1976-03-09 | 1977-09-12 | Nippon Telegr & Teleph Corp <Ntt> | Pattern sticking device |
JPS52119927A (en) * | 1976-04-02 | 1977-10-07 | Hitachi Ltd | Device for automatic focus control |
US4093378A (en) * | 1976-11-01 | 1978-06-06 | International Business Machines Corporation | Alignment apparatus |
JPS5555529A (en) * | 1978-10-20 | 1980-04-23 | Hitachi Ltd | Method of positioning wafer |
JPS56130738A (en) * | 1980-03-19 | 1981-10-13 | Hitachi Ltd | Method and device for exposure |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3557773A (en) * | 1969-09-05 | 1971-01-26 | Rheem Mfg Co | Combustion chamber locating and securing attachment |
US4280354A (en) * | 1980-02-12 | 1981-07-28 | Tencor Instruments | Acoustic method and apparatus for measuring surfaces of wafers and similar articles |
-
1980
- 1980-05-02 US US06/146,532 patent/US4344160A/en not_active Expired - Lifetime
-
1981
- 1981-03-24 CA CA000373754A patent/CA1157128A/en not_active Expired
- 1981-03-26 DE DE8181102301T patent/DE3173046D1/de not_active Expired
- 1981-03-26 EP EP81102301A patent/EP0039407B1/en not_active Expired
- 1981-05-01 JP JP6529681A patent/JPS571229A/ja active Granted
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4888871A (ja) * | 1972-02-02 | 1973-11-21 | ||
JPS5255472A (en) * | 1975-10-31 | 1977-05-06 | Thomson Csf | Mask photo repeater |
JPS52108776A (en) * | 1976-03-09 | 1977-09-12 | Nippon Telegr & Teleph Corp <Ntt> | Pattern sticking device |
JPS52119927A (en) * | 1976-04-02 | 1977-10-07 | Hitachi Ltd | Device for automatic focus control |
US4093378A (en) * | 1976-11-01 | 1978-06-06 | International Business Machines Corporation | Alignment apparatus |
JPS5555529A (en) * | 1978-10-20 | 1980-04-23 | Hitachi Ltd | Method of positioning wafer |
JPS56130738A (en) * | 1980-03-19 | 1981-10-13 | Hitachi Ltd | Method and device for exposure |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58156937A (ja) * | 1982-03-12 | 1983-09-19 | Hitachi Ltd | 露光装置 |
JPS5975625A (ja) * | 1982-10-22 | 1984-04-28 | Fujitsu Ltd | 基板支持方法 |
JPH01292206A (ja) * | 1988-05-19 | 1989-11-24 | Nikon Corp | 物体の表面状態測定装置及び表面の高さ測定装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0370365B2 (ja) | 1991-11-07 |
EP0039407B1 (en) | 1985-11-27 |
DE3173046D1 (en) | 1986-01-09 |
US4344160A (en) | 1982-08-10 |
EP0039407A3 (en) | 1982-02-03 |
CA1157128A (en) | 1983-11-15 |
EP0039407A2 (en) | 1981-11-11 |
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