JPS57120663A - Electroless plating method - Google Patents
Electroless plating methodInfo
- Publication number
- JPS57120663A JPS57120663A JP487081A JP487081A JPS57120663A JP S57120663 A JPS57120663 A JP S57120663A JP 487081 A JP487081 A JP 487081A JP 487081 A JP487081 A JP 487081A JP S57120663 A JPS57120663 A JP S57120663A
- Authority
- JP
- Japan
- Prior art keywords
- soln
- substrate
- dipped
- electroless plating
- inorg
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007772 electroless plating Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 2
- 229910002666 PdCl2 Inorganic materials 0.000 abstract 2
- 229910021626 Tin(II) chloride Inorganic materials 0.000 abstract 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 2
- 239000012212 insulator Substances 0.000 abstract 2
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 abstract 2
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 abstract 1
- 239000000919 ceramic Substances 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 abstract 1
Landscapes
- Electrodes Of Semiconductors (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Surface Treatment Of Glass (AREA)
- Chemically Coating (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP487081A JPS57120663A (en) | 1981-01-16 | 1981-01-16 | Electroless plating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP487081A JPS57120663A (en) | 1981-01-16 | 1981-01-16 | Electroless plating method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57120663A true JPS57120663A (en) | 1982-07-27 |
JPS6133905B2 JPS6133905B2 (enrdf_load_stackoverflow) | 1986-08-05 |
Family
ID=11595703
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP487081A Granted JPS57120663A (en) | 1981-01-16 | 1981-01-16 | Electroless plating method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57120663A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005227618A (ja) * | 2004-02-13 | 2005-08-25 | Semiconductor Energy Lab Co Ltd | 発光装置及び発光装置の作製方法 |
JP2005536628A (ja) * | 2002-04-03 | 2005-12-02 | アプライド マテリアルズ インコーポレイテッド | 無電解堆積法 |
-
1981
- 1981-01-16 JP JP487081A patent/JPS57120663A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005536628A (ja) * | 2002-04-03 | 2005-12-02 | アプライド マテリアルズ インコーポレイテッド | 無電解堆積法 |
JP2005227618A (ja) * | 2004-02-13 | 2005-08-25 | Semiconductor Energy Lab Co Ltd | 発光装置及び発光装置の作製方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6133905B2 (enrdf_load_stackoverflow) | 1986-08-05 |
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