JPS57118643A - Positioning equipment - Google Patents

Positioning equipment

Info

Publication number
JPS57118643A
JPS57118643A JP56182284A JP18228481A JPS57118643A JP S57118643 A JPS57118643 A JP S57118643A JP 56182284 A JP56182284 A JP 56182284A JP 18228481 A JP18228481 A JP 18228481A JP S57118643 A JPS57118643 A JP S57118643A
Authority
JP
Japan
Prior art keywords
light
reflected
target pattern
image
semitransparent mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56182284A
Other languages
Japanese (ja)
Other versions
JPS5943820B2 (en
Inventor
Mitsuyoshi Koizumi
Yasuhiko Hara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56182284A priority Critical patent/JPS5943820B2/en
Publication of JPS57118643A publication Critical patent/JPS57118643A/en
Publication of JPS5943820B2 publication Critical patent/JPS5943820B2/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To align a position with high reliability without being affected by disturbance such as lighting uneveness by a method wherein an image which is obtained by applyig the light to a semiconductor wafer and a mask which overlap each other is converted into image signal to each axial direction by a solid state image pickup tube and is processed. CONSTITUTION:The light irradiated from a source 17 is converted into the parallel beam by a condensor lens 16 and is reflected by a semitransparent mirror 15 and is applied to the target pattern 3 and 5 through an object lens 14. The light reflected by the target pattern 3 and 5 passes through the object lens 14 and the semitransparent mirror 15. The image of the light which is reflected by a semitransparent mirror 18 and that of the light which passes through the mirror 18 are compressed to X- and Y-axis direction by cylindrical lenses 20 and 21 respectively and are focused on photodiode alleys 22 and 23. The position of the target pattern can be positioned by processing these outputs to produce signals.
JP56182284A 1981-11-16 1981-11-16 position alignment device Expired JPS5943820B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56182284A JPS5943820B2 (en) 1981-11-16 1981-11-16 position alignment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56182284A JPS5943820B2 (en) 1981-11-16 1981-11-16 position alignment device

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP14864074A Division JPS5176979A (en) 1974-12-27 1974-12-27 ICHISEIGOSOCHI

Publications (2)

Publication Number Publication Date
JPS57118643A true JPS57118643A (en) 1982-07-23
JPS5943820B2 JPS5943820B2 (en) 1984-10-24

Family

ID=16115578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56182284A Expired JPS5943820B2 (en) 1981-11-16 1981-11-16 position alignment device

Country Status (1)

Country Link
JP (1) JPS5943820B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59109805A (en) * 1982-12-16 1984-06-25 Matsushita Electric Ind Co Ltd Position detector

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59109805A (en) * 1982-12-16 1984-06-25 Matsushita Electric Ind Co Ltd Position detector
JPH0146002B2 (en) * 1982-12-16 1989-10-05 Matsushita Electric Ind Co Ltd

Also Published As

Publication number Publication date
JPS5943820B2 (en) 1984-10-24

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