JPS57115544A - Photomask - Google Patents

Photomask

Info

Publication number
JPS57115544A
JPS57115544A JP124181A JP124181A JPS57115544A JP S57115544 A JPS57115544 A JP S57115544A JP 124181 A JP124181 A JP 124181A JP 124181 A JP124181 A JP 124181A JP S57115544 A JPS57115544 A JP S57115544A
Authority
JP
Japan
Prior art keywords
pattern
patterns
film
resist
air gap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP124181A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6212504B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Umezaki
Norikazu Tsumita
Naoki Koyama
Ken Sugita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP124181A priority Critical patent/JPS57115544A/ja
Publication of JPS57115544A publication Critical patent/JPS57115544A/ja
Publication of JPS6212504B2 publication Critical patent/JPS6212504B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP124181A 1981-01-09 1981-01-09 Photomask Granted JPS57115544A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP124181A JPS57115544A (en) 1981-01-09 1981-01-09 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP124181A JPS57115544A (en) 1981-01-09 1981-01-09 Photomask

Publications (2)

Publication Number Publication Date
JPS57115544A true JPS57115544A (en) 1982-07-19
JPS6212504B2 JPS6212504B2 (enrdf_load_stackoverflow) 1987-03-19

Family

ID=11495955

Family Applications (1)

Application Number Title Priority Date Filing Date
JP124181A Granted JPS57115544A (en) 1981-01-09 1981-01-09 Photomask

Country Status (1)

Country Link
JP (1) JPS57115544A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0253066A3 (de) * 1986-07-12 1989-11-08 Kernforschungszentrum Karlsruhe Gmbh Verfahren zur Herstellung von Mikrostrukturen unterschiedlicher Strukturhöhe mittels Röntgentiefenlithographie

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0253066A3 (de) * 1986-07-12 1989-11-08 Kernforschungszentrum Karlsruhe Gmbh Verfahren zur Herstellung von Mikrostrukturen unterschiedlicher Strukturhöhe mittels Röntgentiefenlithographie

Also Published As

Publication number Publication date
JPS6212504B2 (enrdf_load_stackoverflow) 1987-03-19

Similar Documents

Publication Publication Date Title
JPS57190912A (en) Production of color filter
JPS5630129A (en) Manufacture of photomask
JPS57115544A (en) Photomask
EP0472210A3 (en) Production of color filter
JPS55157737A (en) Resist pattern forming method for photofabrication
JPS6421450A (en) Production of mask
JPS56137633A (en) Pattern forming
US5976732A (en) Photomask for reconfiguring a circuit by exposure at two different wavelengths
JPS57138638A (en) Photoetching mask
JPS5637629A (en) Formation of thin film pattern
JPS5685751A (en) Photomask
JPS57112753A (en) Exposure method
JPS58102233A (ja) フオトマスク
JPS5689741A (en) Dryplate for photomasking
JPS5596952A (en) Production of photomask
ATE53682T1 (de) Verfahren zur herstellung von grossflaechigen integrierten schaltungen.
JPS54121150A (en) Optical production of blaze grating
JPS5616140A (en) Production of photomask for contraction
JPS57212445A (en) Production of photomask
JPS56130750A (en) Manufacture of mask
JPS60231331A (ja) リフトオフ・パタ−ンの形成方法
JPS56130751A (en) Manufacture of mask
JPS5743425A (en) Forming method for fine pattern
JPH01245258A (ja) フォトマスク
JPS5612736A (en) Formation of fine chromium pattern