JPS57113221A - Apparatus for electron beam exposure - Google Patents

Apparatus for electron beam exposure

Info

Publication number
JPS57113221A
JPS57113221A JP18795880A JP18795880A JPS57113221A JP S57113221 A JPS57113221 A JP S57113221A JP 18795880 A JP18795880 A JP 18795880A JP 18795880 A JP18795880 A JP 18795880A JP S57113221 A JPS57113221 A JP S57113221A
Authority
JP
Japan
Prior art keywords
output
register
pattern
case
size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18795880A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6234137B2 (OSRAM
Inventor
Haruo Tsuchikawa
Mamoru Yoneda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP18795880A priority Critical patent/JPS57113221A/ja
Publication of JPS57113221A publication Critical patent/JPS57113221A/ja
Publication of JPS6234137B2 publication Critical patent/JPS6234137B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
JP18795880A 1980-12-29 1980-12-29 Apparatus for electron beam exposure Granted JPS57113221A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18795880A JPS57113221A (en) 1980-12-29 1980-12-29 Apparatus for electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18795880A JPS57113221A (en) 1980-12-29 1980-12-29 Apparatus for electron beam exposure

Publications (2)

Publication Number Publication Date
JPS57113221A true JPS57113221A (en) 1982-07-14
JPS6234137B2 JPS6234137B2 (OSRAM) 1987-07-24

Family

ID=16215135

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18795880A Granted JPS57113221A (en) 1980-12-29 1980-12-29 Apparatus for electron beam exposure

Country Status (1)

Country Link
JP (1) JPS57113221A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57122525A (en) * 1981-01-23 1982-07-30 Nippon Telegr & Teleph Corp <Ntt> Dividing method for drawing figure in electron beam exposure apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57122525A (en) * 1981-01-23 1982-07-30 Nippon Telegr & Teleph Corp <Ntt> Dividing method for drawing figure in electron beam exposure apparatus

Also Published As

Publication number Publication date
JPS6234137B2 (OSRAM) 1987-07-24

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