JPS57111024A - Electron ray exposure method - Google Patents

Electron ray exposure method

Info

Publication number
JPS57111024A
JPS57111024A JP18765980A JP18765980A JPS57111024A JP S57111024 A JPS57111024 A JP S57111024A JP 18765980 A JP18765980 A JP 18765980A JP 18765980 A JP18765980 A JP 18765980A JP S57111024 A JPS57111024 A JP S57111024A
Authority
JP
Japan
Prior art keywords
dry plate
mark
marks
electron
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18765980A
Other languages
Japanese (ja)
Inventor
Teruaki Okino
Nobuo Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP18765980A priority Critical patent/JPS57111024A/en
Publication of JPS57111024A publication Critical patent/JPS57111024A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To correct the displacement of the position of a dry plate due to the expansion and contraction of a stage by mounting a member to which a mark is formed to the dry plate, scanning the mark by electron beams and detecting the position and revolution of the dry plate in an electron ray exposure device. CONSTITUTION:The dry plate 7 is inserted to a dry plate holder 13 from the arrow K direction, the quartz glass members 14, 15 to which the marks M1, M2, M3 and M'1, M'2, M'3 are carved are inserted, and the members are held down by control plates 16, 17, 18. The dry plate 7 is pushed toward the member 14 by using leaf springs 19, 20, a sliding plate 21 with springs 24, 25 is mounted, and the dry plate 7 is pushed toward the member 15. Accordingly, the dry plate 7 is fixed, electron rays are deflected by means of a deflection instrument and the dry plate is exposed, but the marks such as the mark M1 and the mark M2 are scanned at every fixed time during an exposure period, and an electron beam deflection system is fed back in response to the quantity of variation with the positions of the marks M'1, M'2 detected at the last time, thus correcting the displacement of the position of the dry plate 7.
JP18765980A 1980-12-27 1980-12-27 Electron ray exposure method Pending JPS57111024A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18765980A JPS57111024A (en) 1980-12-27 1980-12-27 Electron ray exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18765980A JPS57111024A (en) 1980-12-27 1980-12-27 Electron ray exposure method

Publications (1)

Publication Number Publication Date
JPS57111024A true JPS57111024A (en) 1982-07-10

Family

ID=16209937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18765980A Pending JPS57111024A (en) 1980-12-27 1980-12-27 Electron ray exposure method

Country Status (1)

Country Link
JP (1) JPS57111024A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59197726A (en) * 1983-04-25 1984-11-09 Hitachi Zosen Corp Supplying device of heterogeneous fuel in combustion furnace
JPH0630100U (en) * 1992-09-24 1994-04-19 有限会社東田鉄工 Fluid extractor for tank truck

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5361281A (en) * 1976-11-15 1978-06-01 Jeol Ltd Electron beam detector

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5361281A (en) * 1976-11-15 1978-06-01 Jeol Ltd Electron beam detector

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59197726A (en) * 1983-04-25 1984-11-09 Hitachi Zosen Corp Supplying device of heterogeneous fuel in combustion furnace
JPS635646B2 (en) * 1983-04-25 1988-02-04 Hitachi Shipbuilding Eng Co
JPH0630100U (en) * 1992-09-24 1994-04-19 有限会社東田鉄工 Fluid extractor for tank truck

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