JPS53117459A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS53117459A
JPS53117459A JP3238877A JP3238877A JPS53117459A JP S53117459 A JPS53117459 A JP S53117459A JP 3238877 A JP3238877 A JP 3238877A JP 3238877 A JP3238877 A JP 3238877A JP S53117459 A JPS53117459 A JP S53117459A
Authority
JP
Japan
Prior art keywords
electron beam
exposure apparatus
beam exposure
expansion
obviate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3238877A
Other languages
Japanese (ja)
Inventor
Kiyoshi Kamiya
Sachiosa Moriwaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP3238877A priority Critical patent/JPS53117459A/en
Publication of JPS53117459A publication Critical patent/JPS53117459A/en
Pending legal-status Critical Current

Links

Landscapes

  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To obviate the production of errors in exposure accuracy despite expansion or contraction of a specimen chamber owing to changes in ambient temperature by installing a fixed interferometer to an electro-optical system by means of a support made of a material of a small coefficient of thermal expansion.
COPYRIGHT: (C)1978,JPO&Japio
JP3238877A 1977-03-24 1977-03-24 Electron beam exposure apparatus Pending JPS53117459A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3238877A JPS53117459A (en) 1977-03-24 1977-03-24 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3238877A JPS53117459A (en) 1977-03-24 1977-03-24 Electron beam exposure apparatus

Publications (1)

Publication Number Publication Date
JPS53117459A true JPS53117459A (en) 1978-10-13

Family

ID=12357559

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3238877A Pending JPS53117459A (en) 1977-03-24 1977-03-24 Electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS53117459A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63117201A (en) * 1986-10-29 1988-05-21 インタ−ナショナル・ビジネス・マシ−ンズ・コ−ポレ−ション Body supporter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63117201A (en) * 1986-10-29 1988-05-21 インタ−ナショナル・ビジネス・マシ−ンズ・コ−ポレ−ション Body supporter

Similar Documents

Publication Publication Date Title
JPS5419757A (en) Lens prevented from being out of focus due to temperature change
DK373276A (en) THERMOGRAPHIC PLATE FOR PAINTING TEMPERATURE DISTRIBUTIONS
JPS5242785A (en) Thermoluminescence dosimeter
JPS52104256A (en) Thickness measuring device
JPS53117459A (en) Electron beam exposure apparatus
MX148144A (en) IMPROVEMENTS IN APPARATUS FOR THE MANUFACTURE OF AN EXPANSION BELLOWS FOR HYDROFORMATION PIPES
DK245677A (en) APPARATUS FOR THE MANUFACTURE OF COMPOSED BEAMS
JPS5398782A (en) Positioning method for exposure unit
JPS5280859A (en) Measuring method using interferometer
JPS5394872A (en) Fixing supporter for molecule beam evaporation source cell
JPS5216253A (en) Thickness measuring device
JPS53132371A (en) Distance measuring device
JPS5426665A (en) Carrier for test piece for electron beam exposure unit
JPS53106162A (en) Electron beam meter
JPS53136885A (en) Measuring apparatus for thermal deformations of large size wafers
JPS5220007A (en) Locating method
JPS5397818A (en) Measuring system for projecting magnification
JPS5250233A (en) Electrostatic deformation element
JPS5280878A (en) Pressure measuring apparatus
JPS5376668A (en) X-ray exposure method
JPS57111024A (en) Electron ray exposure method
JPS5298474A (en) Vapor phase growth under reduced pressure
JPS51139359A (en) Device of correcting the expansion or contraction of the hairspring of timekeeping devices
JPS5434683A (en) Sample fine-shifting device for electron beam exposure device or the like
JPS5411680A (en) Exposure unit of electron beam