JPS57100735A - Treating method for surface of semiconductor - Google Patents
Treating method for surface of semiconductorInfo
- Publication number
- JPS57100735A JPS57100735A JP17667780A JP17667780A JPS57100735A JP S57100735 A JPS57100735 A JP S57100735A JP 17667780 A JP17667780 A JP 17667780A JP 17667780 A JP17667780 A JP 17667780A JP S57100735 A JPS57100735 A JP S57100735A
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- adhered
- silicon nitride
- impurity particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17667780A JPS57100735A (en) | 1980-12-15 | 1980-12-15 | Treating method for surface of semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17667780A JPS57100735A (en) | 1980-12-15 | 1980-12-15 | Treating method for surface of semiconductor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57100735A true JPS57100735A (en) | 1982-06-23 |
JPH033385B2 JPH033385B2 (enrdf_load_stackoverflow) | 1991-01-18 |
Family
ID=16017784
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17667780A Granted JPS57100735A (en) | 1980-12-15 | 1980-12-15 | Treating method for surface of semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57100735A (enrdf_load_stackoverflow) |
-
1980
- 1980-12-15 JP JP17667780A patent/JPS57100735A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH033385B2 (enrdf_load_stackoverflow) | 1991-01-18 |
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