JPS57100735A - Treating method for surface of semiconductor - Google Patents

Treating method for surface of semiconductor

Info

Publication number
JPS57100735A
JPS57100735A JP17667780A JP17667780A JPS57100735A JP S57100735 A JPS57100735 A JP S57100735A JP 17667780 A JP17667780 A JP 17667780A JP 17667780 A JP17667780 A JP 17667780A JP S57100735 A JPS57100735 A JP S57100735A
Authority
JP
Japan
Prior art keywords
film
substrate
adhered
silicon nitride
impurity particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17667780A
Other languages
English (en)
Japanese (ja)
Other versions
JPH033385B2 (enrdf_load_stackoverflow
Inventor
Takashi Ito
Ichiro Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17667780A priority Critical patent/JPS57100735A/ja
Publication of JPS57100735A publication Critical patent/JPS57100735A/ja
Publication of JPH033385B2 publication Critical patent/JPH033385B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
JP17667780A 1980-12-15 1980-12-15 Treating method for surface of semiconductor Granted JPS57100735A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17667780A JPS57100735A (en) 1980-12-15 1980-12-15 Treating method for surface of semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17667780A JPS57100735A (en) 1980-12-15 1980-12-15 Treating method for surface of semiconductor

Publications (2)

Publication Number Publication Date
JPS57100735A true JPS57100735A (en) 1982-06-23
JPH033385B2 JPH033385B2 (enrdf_load_stackoverflow) 1991-01-18

Family

ID=16017784

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17667780A Granted JPS57100735A (en) 1980-12-15 1980-12-15 Treating method for surface of semiconductor

Country Status (1)

Country Link
JP (1) JPS57100735A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH033385B2 (enrdf_load_stackoverflow) 1991-01-18

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