JPS57100427A - Making of relief copy - Google Patents
Making of relief copyInfo
- Publication number
- JPS57100427A JPS57100427A JP56161079A JP16107981A JPS57100427A JP S57100427 A JPS57100427 A JP S57100427A JP 56161079 A JP56161079 A JP 56161079A JP 16107981 A JP16107981 A JP 16107981A JP S57100427 A JPS57100427 A JP S57100427A
- Authority
- JP
- Japan
- Prior art keywords
- radiation
- layer
- acid
- sensitive
- making
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/167—X-ray
- Y10S430/168—X-ray exposure process
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19803038605 DE3038605A1 (de) | 1980-10-13 | 1980-10-13 | Verfahren zur herstellung von reliefkopien |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57100427A true JPS57100427A (en) | 1982-06-22 |
JPH0531133B2 JPH0531133B2 (ja) | 1993-05-11 |
Family
ID=6114255
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56161079A Granted JPS57100427A (en) | 1980-10-13 | 1981-10-12 | Making of relief copy |
Country Status (6)
Country | Link |
---|---|
US (1) | US4421844A (ja) |
EP (1) | EP0049840B1 (ja) |
JP (1) | JPS57100427A (ja) |
AT (1) | ATE11186T1 (ja) |
CA (1) | CA1164712A (ja) |
DE (2) | DE3038605A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6238454A (ja) * | 1985-08-13 | 1987-02-19 | アグファーゲーヴェルト アクチエンゲゼルシャフト | 放射線感応性混合物、放射線感応性記録材料及びレリーフ像の製法 |
JPS6291938A (ja) * | 1985-10-18 | 1987-04-27 | Fuji Photo Film Co Ltd | 製版方法 |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5890636A (ja) * | 1981-11-24 | 1983-05-30 | Fuji Photo Film Co Ltd | 光重合性組成物を用いた感光材料による画像形成方法および現像ユニツト |
DE3151078A1 (de) * | 1981-12-23 | 1983-07-28 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung von reliefbildern |
KR860002082B1 (ko) * | 1983-01-19 | 1986-11-24 | 가부시기가이샤 도시바 | 레지스트 패턴의 형성 방법 및 장치 |
US4897337A (en) * | 1983-01-19 | 1990-01-30 | Tokyo Shibaura Denki Kabushiki Kaisha | Method and apparatus for forming resist pattern |
DE3406927A1 (de) * | 1984-02-25 | 1985-08-29 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen |
DE3409888A1 (de) * | 1984-03-17 | 1985-09-19 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches aufzeichnungsmaterial und dessen verwendung in einem verfahren zum herstellen einer druckform oder einer gedruckten schaltung |
US4670372A (en) * | 1984-10-15 | 1987-06-02 | Petrarch Systems, Inc. | Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant |
CA1308596C (en) * | 1986-01-13 | 1992-10-13 | Rohm And Haas Company | Microplastic structures and method of manufacture |
JPS6381820A (ja) * | 1986-09-25 | 1988-04-12 | Toshiba Corp | レジストパタ−ン形成方法 |
DE3716848A1 (de) * | 1987-05-20 | 1988-12-01 | Hoechst Ag | Verfahren zur bebilderung lichtempfindlichen materials |
DE3730787A1 (de) * | 1987-09-13 | 1989-03-23 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE3730785A1 (de) * | 1987-09-13 | 1989-03-23 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
US5308744A (en) * | 1993-03-05 | 1994-05-03 | Morton International, Inc. | Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives |
JPH1026834A (ja) * | 1996-07-09 | 1998-01-27 | Tokyo Ohka Kogyo Co Ltd | 画像形成方法 |
US6060222A (en) * | 1996-11-19 | 2000-05-09 | Kodak Polcyhrome Graphics Llc | 1Postitve-working imaging composition and element and method of forming positive image with a laser |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3726679A (en) * | 1971-06-30 | 1973-04-10 | Ibm | Light sensitive epoxy formulation |
US3915706A (en) * | 1974-03-11 | 1975-10-28 | Xerox Corp | Imaging system based on photodegradable polyaldehydes |
DE2829512A1 (de) * | 1978-07-05 | 1980-01-17 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1447913C3 (de) * | 1964-10-15 | 1979-08-09 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung von Druckformen |
DE1522495C3 (de) * | 1966-01-10 | 1978-10-05 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung von Druckformen |
DE1671626C3 (de) | 1967-03-31 | 1978-12-21 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Kopiermaterial für die Herstellung von Offsetdruckplatten |
BE791212A (fr) * | 1972-02-03 | 1973-03-01 | Buckbee Mears Co | Procede pour le durcissement des reserves |
US3779778A (en) * | 1972-02-09 | 1973-12-18 | Minnesota Mining & Mfg | Photosolubilizable compositions and elements |
CH621416A5 (ja) * | 1975-03-27 | 1981-01-30 | Hoechst Ag | |
DE2718254C3 (de) * | 1977-04-25 | 1980-04-10 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliche Kopiermasse |
-
1980
- 1980-10-13 DE DE19803038605 patent/DE3038605A1/de not_active Withdrawn
-
1981
- 1981-10-03 AT AT81107889T patent/ATE11186T1/de active
- 1981-10-03 DE DE8181107889T patent/DE3168177D1/de not_active Expired
- 1981-10-03 EP EP81107889A patent/EP0049840B1/de not_active Expired
- 1981-10-08 CA CA000387598A patent/CA1164712A/en not_active Expired
- 1981-10-09 US US06/310,276 patent/US4421844A/en not_active Expired - Fee Related
- 1981-10-12 JP JP56161079A patent/JPS57100427A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3726679A (en) * | 1971-06-30 | 1973-04-10 | Ibm | Light sensitive epoxy formulation |
US3915706A (en) * | 1974-03-11 | 1975-10-28 | Xerox Corp | Imaging system based on photodegradable polyaldehydes |
DE2829512A1 (de) * | 1978-07-05 | 1980-01-17 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6238454A (ja) * | 1985-08-13 | 1987-02-19 | アグファーゲーヴェルト アクチエンゲゼルシャフト | 放射線感応性混合物、放射線感応性記録材料及びレリーフ像の製法 |
JPS6291938A (ja) * | 1985-10-18 | 1987-04-27 | Fuji Photo Film Co Ltd | 製版方法 |
JPH0515257B2 (ja) * | 1985-10-18 | 1993-03-01 | Fuji Photo Film Co Ltd |
Also Published As
Publication number | Publication date |
---|---|
EP0049840B1 (de) | 1985-01-09 |
DE3038605A1 (de) | 1982-06-03 |
JPH0531133B2 (ja) | 1993-05-11 |
CA1164712A (en) | 1984-04-03 |
EP0049840A2 (de) | 1982-04-21 |
EP0049840A3 (en) | 1982-05-19 |
DE3168177D1 (en) | 1985-02-21 |
ATE11186T1 (de) | 1985-01-15 |
US4421844A (en) | 1983-12-20 |
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