JPS5696075A - Production of porous film - Google Patents
Production of porous filmInfo
- Publication number
- JPS5696075A JPS5696075A JP17188279A JP17188279A JPS5696075A JP S5696075 A JPS5696075 A JP S5696075A JP 17188279 A JP17188279 A JP 17188279A JP 17188279 A JP17188279 A JP 17188279A JP S5696075 A JPS5696075 A JP S5696075A
- Authority
- JP
- Japan
- Prior art keywords
- porous
- film
- low
- porous material
- porous film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 abstract 5
- 239000011148 porous material Substances 0.000 abstract 4
- 239000010931 gold Substances 0.000 abstract 3
- 238000000034 method Methods 0.000 abstract 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract 2
- 229910052737 gold Inorganic materials 0.000 abstract 2
- 238000004544 sputter deposition Methods 0.000 abstract 2
- 238000001771 vacuum deposition Methods 0.000 abstract 2
- 239000003054 catalyst Substances 0.000 abstract 1
- 239000010419 fine particle Substances 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Catalysts (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To produce a porous film of extremely large surface area in a low-temp. dry state by forming a porous film material on the porous surface of porous material thoroughly until the fine parts of the porous surface by sputtering or low vacuum deposition. CONSTITUTION:For example, Au, is vacuum-deposited in a low degree of vacuum of about several millimeters on a glass substrate 1, and a so-colled gold black film 2 is formed. This film 2 is a porous material consisting of gold fine particles. For example, Pt, is deposited on this porous material by a sputtering or low vacuum deposition method, in an Ar gas of about 100mm. torr, to about 100Angstrom thickness. By this method, Pt goes into the fine parts on the porous surface of the porous material, thereby forming a porous film 3 of Pt. This film 3 has extremely large surface areas like platinum black formed by other method, and this is suitable for using Pt as a catalyst.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54171882A JPS6035993B2 (en) | 1979-12-29 | 1979-12-29 | Method for manufacturing porous fine particle layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54171882A JPS6035993B2 (en) | 1979-12-29 | 1979-12-29 | Method for manufacturing porous fine particle layer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5696075A true JPS5696075A (en) | 1981-08-03 |
JPS6035993B2 JPS6035993B2 (en) | 1985-08-17 |
Family
ID=15931537
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP54171882A Expired JPS6035993B2 (en) | 1979-12-29 | 1979-12-29 | Method for manufacturing porous fine particle layer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6035993B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62272475A (en) * | 1986-05-20 | 1987-11-26 | Sanyo Electric Co Ltd | Alkaline zinc storage battery |
EP0587237A1 (en) * | 1992-09-08 | 1994-03-16 | Koninklijke Philips Electronics N.V. | Display device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0318718Y2 (en) * | 1985-11-27 | 1991-04-19 |
-
1979
- 1979-12-29 JP JP54171882A patent/JPS6035993B2/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62272475A (en) * | 1986-05-20 | 1987-11-26 | Sanyo Electric Co Ltd | Alkaline zinc storage battery |
EP0587237A1 (en) * | 1992-09-08 | 1994-03-16 | Koninklijke Philips Electronics N.V. | Display device |
Also Published As
Publication number | Publication date |
---|---|
JPS6035993B2 (en) | 1985-08-17 |
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