JPS5690541A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5690541A
JPS5690541A JP16717279A JP16717279A JPS5690541A JP S5690541 A JPS5690541 A JP S5690541A JP 16717279 A JP16717279 A JP 16717279A JP 16717279 A JP16717279 A JP 16717279A JP S5690541 A JPS5690541 A JP S5690541A
Authority
JP
Japan
Prior art keywords
film
layer
concave section
heat treatment
oxide film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16717279A
Other languages
English (en)
Inventor
Tsutomu Akashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP16717279A priority Critical patent/JPS5690541A/ja
Publication of JPS5690541A publication Critical patent/JPS5690541A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
    • H01L21/76205—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO in a region being recessed from the surface, e.g. in a recess, groove, tub or trench region

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Element Separation (AREA)
JP16717279A 1979-12-21 1979-12-21 Production of semiconductor device Pending JPS5690541A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16717279A JPS5690541A (en) 1979-12-21 1979-12-21 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16717279A JPS5690541A (en) 1979-12-21 1979-12-21 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5690541A true JPS5690541A (en) 1981-07-22

Family

ID=15844746

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16717279A Pending JPS5690541A (en) 1979-12-21 1979-12-21 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5690541A (ja)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5421173A (en) * 1977-07-18 1979-02-17 Nippon Telegr & Teleph Corp <Ntt> Manufacture for semiconductor having oxide film

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5421173A (en) * 1977-07-18 1979-02-17 Nippon Telegr & Teleph Corp <Ntt> Manufacture for semiconductor having oxide film

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