JPS5689744A - X-ray transfer device - Google Patents

X-ray transfer device

Info

Publication number
JPS5689744A
JPS5689744A JP16799879A JP16799879A JPS5689744A JP S5689744 A JPS5689744 A JP S5689744A JP 16799879 A JP16799879 A JP 16799879A JP 16799879 A JP16799879 A JP 16799879A JP S5689744 A JPS5689744 A JP S5689744A
Authority
JP
Japan
Prior art keywords
wafer
camber
adsorption
occurrence
adsorption hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16799879A
Other languages
Japanese (ja)
Inventor
Masahiro Okabe
Yoshitaka Kitamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16799879A priority Critical patent/JPS5689744A/en
Publication of JPS5689744A publication Critical patent/JPS5689744A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To prevent the occurrence of camber of the wafer, by providing a vacuum adsorption hole to fix the wafer on the material stand and by exhausting air of the adsorption hole with two or more different pressures when the wafer is fixed. CONSTITUTION:For suction of wafer 5 to materials stand 7, when the same suction force is given to adsorption holes A, B and C, wafer 5 is not sucked in respective positions by the same force because one adsorption hole exists in the center and plural ring-form adsorption holes exist around the center. Therefore, wafer 5 is concaved partially to have a complicated pressure distribution. A pressure regulator is provided and pressure of adsorption holes A, B and C is controlled to C<B<A to adsorb wafer 5 for the purpose of preventing this complicated pressure distribution, and therefore, the occurrence of camber and sag of wafer 5 is reduced. In the actual measurement, the camber quantity is reduced to the 1/5 of the conventional quantity approximately.
JP16799879A 1979-12-24 1979-12-24 X-ray transfer device Pending JPS5689744A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16799879A JPS5689744A (en) 1979-12-24 1979-12-24 X-ray transfer device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16799879A JPS5689744A (en) 1979-12-24 1979-12-24 X-ray transfer device

Publications (1)

Publication Number Publication Date
JPS5689744A true JPS5689744A (en) 1981-07-21

Family

ID=15859898

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16799879A Pending JPS5689744A (en) 1979-12-24 1979-12-24 X-ray transfer device

Country Status (1)

Country Link
JP (1) JPS5689744A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01129438A (en) * 1987-11-16 1989-05-22 Hitachi Ltd Vacuum suction anchor block
JPH03282472A (en) * 1990-03-30 1991-12-12 Ushio Inc Projection aligner of substrate
US5692873A (en) * 1995-03-31 1997-12-02 Motorola, Inc. Apparatus for holding a piece of semiconductor

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5412674A (en) * 1977-06-30 1979-01-30 Toshiba Corp Mask pattern formation method for semiconductor device
JPS5480086A (en) * 1977-12-09 1979-06-26 Hitachi Ltd Mask aligner
JPS5537298B2 (en) * 1975-01-20 1980-09-26
JPS55160439A (en) * 1979-05-31 1980-12-13 Chiyou Lsi Gijutsu Kenkyu Kumiai Device for fixing thin plate

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5537298B2 (en) * 1975-01-20 1980-09-26
JPS5412674A (en) * 1977-06-30 1979-01-30 Toshiba Corp Mask pattern formation method for semiconductor device
JPS5480086A (en) * 1977-12-09 1979-06-26 Hitachi Ltd Mask aligner
JPS55160439A (en) * 1979-05-31 1980-12-13 Chiyou Lsi Gijutsu Kenkyu Kumiai Device for fixing thin plate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01129438A (en) * 1987-11-16 1989-05-22 Hitachi Ltd Vacuum suction anchor block
JPH03282472A (en) * 1990-03-30 1991-12-12 Ushio Inc Projection aligner of substrate
US5692873A (en) * 1995-03-31 1997-12-02 Motorola, Inc. Apparatus for holding a piece of semiconductor

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