JPS5680813A - Production of thin-film magnetic head - Google Patents

Production of thin-film magnetic head

Info

Publication number
JPS5680813A
JPS5680813A JP15532879A JP15532879A JPS5680813A JP S5680813 A JPS5680813 A JP S5680813A JP 15532879 A JP15532879 A JP 15532879A JP 15532879 A JP15532879 A JP 15532879A JP S5680813 A JPS5680813 A JP S5680813A
Authority
JP
Japan
Prior art keywords
layer
sio2
thin
lift
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15532879A
Other languages
Japanese (ja)
Inventor
Kazumasa Hosono
Yoshimasa Miura
Junzo Toda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15532879A priority Critical patent/JPS5680813A/en
Publication of JPS5680813A publication Critical patent/JPS5680813A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To ensure a quick and high-accuracy formation of a through-hole for a thin-film magnetic head, by forming a conductor coil layer after providing a lift- off layer for formation of through-hole on the substrate. CONSTITUTION:The insulated layer 2 is formed on the substrate 1 by the SiO2, and then a conductor layer is formed by the Al-Cu or the like. This Al-Cu conductor layer is etched to form the terminal pattern 3. Then the lift-off layer 4 of Cr or the like having the selective etching properties is formed, and then the SiO2 insulated layer 5 is formed as the protective film of the pattern 3. After this, the lower magnetic layer 6 is formed by the mask vapor deposition method, and then the insulated layer 7 of SiO2 and then the adhesion layer 8 of Al2O3 or the like are formed. Finally the lift-off layer 4 is removed to obtain the through-hole 9 of a desired size.
JP15532879A 1979-11-30 1979-11-30 Production of thin-film magnetic head Pending JPS5680813A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15532879A JPS5680813A (en) 1979-11-30 1979-11-30 Production of thin-film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15532879A JPS5680813A (en) 1979-11-30 1979-11-30 Production of thin-film magnetic head

Publications (1)

Publication Number Publication Date
JPS5680813A true JPS5680813A (en) 1981-07-02

Family

ID=15603480

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15532879A Pending JPS5680813A (en) 1979-11-30 1979-11-30 Production of thin-film magnetic head

Country Status (1)

Country Link
JP (1) JPS5680813A (en)

Similar Documents

Publication Publication Date Title
JPS55110009A (en) Inductance element
GB1513851A (en) Method of depositing a thin film of magnetic iron-silicon upon a substrate and product thereof
JPS5267760A (en) Method of forming accurate pattern on thin metallic layer on insulator
JPS5680813A (en) Production of thin-film magnetic head
JPS5542375A (en) Manufacture of magnetic head
JPS56124191A (en) Magnetic bubble element
JPS5750483A (en) Thin film reluctance effective element
JPS5784876A (en) Manufacture of thermal head
JPS5674911A (en) Manufacture of multilayer thin film coil
JPS5577023A (en) Production of thin film magnetic head
JPS5219297A (en) Method of manufacturing a metal film resistor
JPS5498222A (en) Thin film magnetic head
JPS54118214A (en) Production of thin film magnetic head
JPS5766521A (en) Thin-film magnetic head and its manufacture
JPS57208618A (en) Production of thin film magnetic head
JPS5646582A (en) Formation of pattern of filmlike article
JPS5527639A (en) Photo-resist pattern forming method
GB1512029A (en) Formation of thin layer patterns on a substrate
JPS5495132A (en) Production of magnetic bubble memory unit
JPS5593520A (en) Production of core of magnetic head
JPS5638825A (en) Formation of insulating film
JPS5793526A (en) Forming method for thin film pattern
JPS5734985A (en) Preparation of thermal head
GB1218211A (en) Improvements in or relating to the production of a plurality of coatings on an insulating carrier
JPS5637817A (en) Thin-film magnetic head and its manufacture