JPS5679241A - Observation method by scanning electron microscope - Google Patents

Observation method by scanning electron microscope

Info

Publication number
JPS5679241A
JPS5679241A JP15529579A JP15529579A JPS5679241A JP S5679241 A JPS5679241 A JP S5679241A JP 15529579 A JP15529579 A JP 15529579A JP 15529579 A JP15529579 A JP 15529579A JP S5679241 A JPS5679241 A JP S5679241A
Authority
JP
Japan
Prior art keywords
electron beams
electron
scanning electron
perform
reflected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15529579A
Other languages
Japanese (ja)
Inventor
Katsukage Uehara
Yusaku Takano
Kazuo Hiromatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP15529579A priority Critical patent/JPS5679241A/en
Publication of JPS5679241A publication Critical patent/JPS5679241A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To permit a scanning electron microscope to perform the surface observation of a large-sized structure and the like by directly applying electron beams to the surface of an object being inspected in a vacuum atmosphere to perform the surface observation. CONSTITUTION:An open end 15 formed on one side of a frame 1 of a scanning electron microscope is placed on an object 17 to be inspected through a vacuum sealing means 16, and then the microscope body is evacuated from an evacuating port 12 so that electron beams 3 can be emitted. After a given degree of vacuum has been reached, the electron beams 3 are emitted from an electron gun 2 to the surface of the object 17. A signal 10 of secondary electron beams, reflected electron beams or characteristic X-rays which are reflected from the surface is detected by a secondary electron beam detector, a reflected electron beam detector or a characteristic X-ray detector 11 to perform the defect inspection or the surface observation of the object 17.
JP15529579A 1979-11-30 1979-11-30 Observation method by scanning electron microscope Pending JPS5679241A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15529579A JPS5679241A (en) 1979-11-30 1979-11-30 Observation method by scanning electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15529579A JPS5679241A (en) 1979-11-30 1979-11-30 Observation method by scanning electron microscope

Publications (1)

Publication Number Publication Date
JPS5679241A true JPS5679241A (en) 1981-06-29

Family

ID=15602764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15529579A Pending JPS5679241A (en) 1979-11-30 1979-11-30 Observation method by scanning electron microscope

Country Status (1)

Country Link
JP (1) JPS5679241A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103323474A (en) * 2012-03-21 2013-09-25 同济大学 Characterization method of multilayer film structure based on film marking layer

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5056283A (en) * 1973-09-14 1975-05-16

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5056283A (en) * 1973-09-14 1975-05-16

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103323474A (en) * 2012-03-21 2013-09-25 同济大学 Characterization method of multilayer film structure based on film marking layer

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