JPS5549136A - Continuous working apparatus during pressure reduction - Google Patents

Continuous working apparatus during pressure reduction

Info

Publication number
JPS5549136A
JPS5549136A JP12345778A JP12345778A JPS5549136A JP S5549136 A JPS5549136 A JP S5549136A JP 12345778 A JP12345778 A JP 12345778A JP 12345778 A JP12345778 A JP 12345778A JP S5549136 A JPS5549136 A JP S5549136A
Authority
JP
Japan
Prior art keywords
container
vacuum
comes
works
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12345778A
Other languages
Japanese (ja)
Inventor
Shigeru Obiyama
Toru Kuzumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP12345778A priority Critical patent/JPS5549136A/en
Publication of JPS5549136A publication Critical patent/JPS5549136A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006Processes utilising sub-atmospheric pressure; Apparatus therefor
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/18Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H01J37/185Means for transferring objects between different enclosures of different pressure or atmosphere

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:The apparatus which is capable of automatically performing various processes to be accomplished under reduced pressure or in the special atmosphere by applying working continuously to the works in a reduced pressure atmosphere. CONSTITUTION:When a container 11 loaded with the works is pushed in from the beginning end of a conveying path 12 by a power cylinder 17, all the containers in the conveying path advances by 1 pitch. When the container comes to the position of a pre-exchausting pipe 31, the inside of the container receives the radiation of charge beams while it is being evacuated to the specified degree of vacuum. Next, when it comes to the position of an opening 34, it undergoes testing while being subjected to vacuum evacuation and when it comes to the position of a leak valve 37, the leak valve 37 operates to flow air into the container owing to the difference between the atomspheric pressure and the pressure in the case. Hence, this simply necessitates exhausting the inside of the limited containers alone and therefore the vacuum arrival time is short and the vacuum device may be made smaller in size.
JP12345778A 1978-10-05 1978-10-05 Continuous working apparatus during pressure reduction Pending JPS5549136A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12345778A JPS5549136A (en) 1978-10-05 1978-10-05 Continuous working apparatus during pressure reduction

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12345778A JPS5549136A (en) 1978-10-05 1978-10-05 Continuous working apparatus during pressure reduction

Publications (1)

Publication Number Publication Date
JPS5549136A true JPS5549136A (en) 1980-04-09

Family

ID=14861085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12345778A Pending JPS5549136A (en) 1978-10-05 1978-10-05 Continuous working apparatus during pressure reduction

Country Status (1)

Country Link
JP (1) JPS5549136A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57154380A (en) * 1981-03-19 1982-09-24 Nippon Kokan Kk <Nkk> Electron beam welding device
JPS59206036A (en) * 1983-03-16 1984-11-21 Hachiyou Eng Kk Continuous pressure adjusting apparatus
JPS61148646A (en) * 1984-11-30 1986-07-07 Toshiba Ii M I Kk Square circulatory base machine
WO1996015542A1 (en) * 1994-11-09 1996-05-23 Pixel International Method for assembling a flat display
EP2441857A3 (en) * 2008-10-23 2012-07-18 P2i Ltd Vacuum processing apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57154380A (en) * 1981-03-19 1982-09-24 Nippon Kokan Kk <Nkk> Electron beam welding device
JPS59206036A (en) * 1983-03-16 1984-11-21 Hachiyou Eng Kk Continuous pressure adjusting apparatus
JPS61148646A (en) * 1984-11-30 1986-07-07 Toshiba Ii M I Kk Square circulatory base machine
WO1996015542A1 (en) * 1994-11-09 1996-05-23 Pixel International Method for assembling a flat display
EP2441857A3 (en) * 2008-10-23 2012-07-18 P2i Ltd Vacuum processing apparatus

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