JPS61148646A - Square circulatory base machine - Google Patents

Abstract

PURPOSE:To miniaturize the titled machine in comparison with a turret type one and to save space by working the machine of square circulatory type. CONSTITUTION:Of the square circulatory base machine 3, a guide groove part 30 of square form in top view is formed by guide plates 28 and 29 on a frame base 27. The machine 3 is also provided with a pallet transferring device 31 and a pallet positioning mechanism 32. The machine can be miniaturized more than a turret type base machine, with less space, and is suitable for use in a clean room. In transferring the pallet 4, a guide roller 34 supports the pallet 4, and the pallet transferring device 31 that comprises a cylinder 36 is used. Therefore, the speed of transfer can be made faster than that of the free-flow conveyer type (cycle can be shortened), the pallet 4 does not vibrate when stopping, and in result, the work of high accuracy is enabled. Additionally, the driving part never protrudes from the pallet 4 in comparison with the chain driving type, this machine is miniaturized while requiring less floor area for installing.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention is applied to a compact disk (hereinafter abbreviated as CD) vapor deposition process in which a vapor-deposited CD is removed from a mask unit of a vapor deposition holder and stocked on a stand, while the vapor-deposited CD is This invention relates to a square circulation base machine that is installed in a manufacturing system that automates the process of taking out a previous CD from a stand and assembling it into a mask unit to save labor and improve the deposition yield.

[Conventional technology]

In a CD manufacturing system, a plastic disc (information-recorded disc) with bits on the surface is usually formed in a plastic molding process, and then an aluminum reflective film is formed on the surface of the disc in a vapor deposition process. After this, a transparent plastic protective film is formed on the aluminum reflective film in a protective film coating step.

In the above-mentioned vapor deposition process, a mask unit (consisting of an outer mask, a center mask, and a disk base, and also has the function of a vapor deposition holder) is used to cover the center and outer circumference of the disk 1, as shown in FIG. The aluminum reflective film (hereinafter abbreviated as reflective film) 2 is prevented from being formed on the portion. As a result, the reflective film 2 will be sealed with a plastic protective film in the next protective film coating process. This is because if the reflective film 2 is exposed on the outer peripheral end face of the disk 1 or the inner peripheral end face of the center hole, the reflective film 2 will be eroded and peeled off from the exposed portions.

In the conventional vapor deposition process, the process involves removing the center mask and outer mask from the mask unit and taking out the vapor-deposited disk, and attaching the disk before vapor deposition to the disk base and attaching the center mask and outer mask. It was done manually. This is because robots cannot be used for these tasks because the operations are complicated and positioning and the like must be done accurately and visually by humans.

For this reason, there is a limit to processing capacity, and when attaching the center mask and outer circumferential mask to the disk before vapor deposition, it is impossible to avoid dust etc. from adhering to the disk. This caused problems such as damage to the disc.

Therefore, the inventors of the present invention have conducted extensive research to automate the work of attaching and removing the mask unit and disc, and have developed a CD manufacturing system that can be performed by a simple combination of operations by dividing these tasks into multiple steps. developed.

According to this manufacturing system, the disk supply section, mask unit attachment/detachment section, and
Equipped with a pallet that circulates through the disk removal section, the mask unit is removed from the deposition holder of the deposition cart in the mask unit removal work section and transferred onto the pallet (deposited disks are placed on the disk base using the center mask and outer mask). While the fixed mask (fixed mask) is transferred by the pallet to the disk take-out part, the outer peripheral mask and center mask are removed from the disk base by the mask removal device, these masks are placed on the pallet, and the evaporation is carried out at the disk take-out part. The finished disk is transferred to the take-out stand by the disk take-out hand, while the disk with information recorded before vapor deposition is transferred from the supply stand to the disk base on the pallet in the disk supply unit, and the mask unit is loaded by the pallet. A loading process in which the center mask and the outer mask placed on the pallet are attached to the disk base by a mask attaching device while being transferred to the attachment/desorption work section to assemble a mask unit in which the disk before vapor deposition is fixed; Two evaporation carts are provided, and the mask unit is removed from the evaporation holder of one of the evaporation carts pulled out of the evaporation chamber and transferred to the pallet of the mask unit attachment/detachment work section, while the mask unit transferred by the pallet is taken out. After completing this work, a vapor deposition process is performed in which the cart is replaced with the other vapor deposition cart in the vapor deposition chamber, and a supply stand loaded with disks with information recorded before vapor deposition is moved to a position facing the disk supply unit. The method is characterized by comprising a supply transfer step in which a predetermined number of vapor-deposited disks are loaded and a take-out transfer step in which a take-out stand loaded with a predetermined number of vapor-deposited disks is transferred to a stock section.

[Problem that the invention seeks to solve]

The present invention has been made in view of the above circumstances, and its object is to provide a square circulation base machine that can be used in the above-mentioned manufacturing system.

[Means for solving problems]

In order to achieve the above object, the present invention forms a rectangular frame-shaped guide groove for circulating rectangular pallets on a pedestal base, divides the guide groove into a plurality of work stages, and provides pallets on the pedestal base. The present invention is characterized by being provided with a pallet moving device that moves the pallet intermittently to each work stage, and a pallet positioning mechanism that positions and fixes the pallet to a required work stage.

〔Example〕

An embodiment of the present invention will be described below with reference to the drawings.

FIG. 1 is an explanatory diagram showing a CD manufacturing system equipped with a square circulating type base machine of the present invention, and FIG. 2 is a perspective view showing an apparatus for implementing the system.

This system consists of a loading process (I) and a vapor deposition process (I).
n), the supply transfer process (I [[), and the take-out transfer process (I
V).

In the loading process (1), the square circulation base machine 3 includes a disk supply section A, an idle section B, a mask mounting section C1, an electrostatic blower section D1, a mask unit transfer section E,
Mask unit attachment/detachment work part F+, F outer periphery mask removal part G, electrostatic blower part H, center mask removal part■
, using the pallet 4 that circulates through the idle section J and the disk ejecting section K, the mask unit attachment/detachment section F or F2
The mask unit 6 is removed from the evaporation holder 5 and transferred to one of the mounting portions 4a of the pallet 4 (as shown in FIG. (Here, the deposited disk 1 is fixed.) is the pallet 4.
When the outer mask 9 is transferred to the outer mask removing section G, the outer mask 9 is removed by the outer mask removing device 10 (see FIGS. 18 and 19).

The removed outer peripheral mask 9 is transferred to the other mounting section 4b of the same pallet 4.

Next, it is transferred to the electrostatic blower part H by the pallet 4,
Here, the electrostatic blowing device 11 (see FIGS. 20 and 21)
The aluminum powder during vapor deposition is removed.

When the electrostatic blowing is finished, it is transferred to the center mask removal section
4), the center mask 8 is removed.

The removed center mask 8 is transferred to the other mounting section 4b of the same pallet 4.

Then, it is transferred to the disk ejecting section K via the idle section J, where it is transferred to the disk ejecting hand 13 (Figs. 25 and 26).
The disk is transferred from the disk base 7 to the stand 14 (see FIG. 3) located opposite the disk ejecting section.

One loading section 4a of the pallet 4 from which the disc 1 has been taken out
A disk base 7 is mounted on the other mounting portion 4b, and a center mask 8 and an outer peripheral mask 9 are mounted on the other mounting portion 4b. This pallet 4 is transferred to the disk supply section A, where a stand 14 located opposite the disk supply section A is moved by a disk supply hand 15 (see FIGS. 25 and 27).
The information-recorded disc 1 before vapor deposition is transferred onto the disc base 7 from there.

Next, they are transferred to the mask mounting section C via the idle section B, where the center mask 8 and the outer mask placed on the other mounting section 4b are transferred by the mask mounting device t16 (see FIGS. 28 to 30). 9 is mounted, and the disk l is fixed on the disk base 7. Thereby, the mask unit 6 is assembled.

Next, it is transferred to an electrostatic blower, where dust and the like are removed by an electrostatic blower 17 (see FIGS. 31 and 32).

When the electrostatic blowing is completed, the mask unit is transferred to the transfer section E, where it is transferred from one mounting section 4a to the other mounting section 4b by the transfer device 18 (see Figs. 33 and 34). mask unit attachment/detachment work section F, or Fz
will be transferred to.

In the vapor deposition process (If), the mask unit removal work section F+
, Fz, and the drawer portions 19a, 19 arranged to face the
A vapor deposition chamber 20 is provided between the two drawer portions 19a, and a vapor deposition device 22 is used which deposits aluminum by alternately inserting rotating and revolving vapor deposition carts 21 equipped with vapor deposition holders 5 into the vapor deposition chamber 20. Pulled out cart 21
A worker manually removes the mask unit 6 from the vapor deposition holder 5.
is removed and transferred to the pallet 4 of the mask unit attachment/detachment work section F1 or F3, while the mask unit 6 transferred by the pallet 4 is taken out and set in the vapor deposition holder 5, and after this work is completed. , replace the cart 21 with the other cart 21 in the vapor deposition chamber 20, pull out the other cart 21 to the drawer portion 19b, and repeat the same operation.

In the supply transfer step (1), the CD stand supply and take-out device 2
3 (see FIGS. 35 to 40), the stand 14 on which a plurality of information-recorded disks 1 before vapor deposition are stacked is transferred from the supply stocker section 24 at one end to a position facing the disk supply section A. When the stand 14 becomes empty, it is transferred to a position facing the disk take-out section, while a new stand 14 loaded with disks 1 before vapor deposition from the supply stock 7 force section 24 is moved to a position opposite the disk supply section A. transport to the desired position.

In the take-out transfer step (IV), when a predetermined number of vapor-deposited disks 1 are loaded on the empty stand 14 that has been transferred from the supply transfer step (III) to a position opposite to the disk take-out section, this is transferred to the CD stand supply take-out device. 23 and transferred to the hook 25.

When the supply hand 15 transfers the disks 1 one by one onto the pallet 4 from the stand 14 in the supply transfer step (II), the spacers 26 remaining on the stand 14 are transferred to the stand 14 in the takeout transfer step (IV). . In this case, the disc 1 before vapor deposition is transferred to the pallet 4 → the spacer 26 is transferred to the stand 14 in the removal step (IV) → the disc 1 after vapor deposition is transferred to the stand 14 in this order.

According to the above-described manufacturing system, the worker only has to move alternately to the mask unit attachment/detachment work sections F+ and F2 to attach and detach the mask unit 6.
The attachment and detachment of the disk 1, center mask 8, and outer circumference mask 9 is automatically performed in the loading step (1), which eliminates the need to manually attach and detach the outer circumference mask 9.

Therefore, it is possible to greatly improve the vapor deposition processing capacity, and the number of workers required is only one culm.

Further, the worker only touches the mask unit 6 without touching the disk 1 directly, and there is no risk of dust or the like attaching to the disk 1 or damaging the disk 1. Therefore, pinholes and the like caused by vapor deposition with dust and the like attached can be minimized, and the vapor deposition yield can be improved.

Next, the square circulation base machine of the present invention used in the above system will be explained in detail.

5 to 11 show a square circulating base machine 3 and a pallet 4. FIG. Square circulation base machine 3
As shown in FIG. 5, the pallet moving device 31 and the pallet positioning mechanism 32 are provided, as well as forming a guide groove 30 having a rectangular shape in plan view with guide plates 28 and 29 on the pedestal base 27. ing.

The guide groove section 30 includes a disk supply section A, an idle section B,
Mask attachment part C1 Electrostatic blower part D1 Mask unit transfer part E, Mask unit attachment/detachment work part F, , F, , Outer mask removal part G, Electrostatic blower part H, Center mask removal part ■, Idle part There is a play part in the J1 disc ejection part, M
The stage is divided into 14 stages, and 12 pallets 4 are guided by guide plates 28 and 29 and circulated.

As shown in FIG. 6, a roller support plate 33 is provided at the bottom of the guide groove 20 along the guide plates 28 and 29, and supports the bottom surface of the pallet 4 on the roller support plate 22. Guide rollers 34 for smooth movement are arranged at appropriate intervals. A free bearing 35 is arranged at the bottom of each corner of the guide groove 30 to facilitate direction change of the pallet 4.

The pallet moving device 31 is composed of a cylinder 36 and a pallet pushing arm 39 provided with a hook 38 at the tip of a cylinder loft 37 of the cylinder 36, which is arranged at the bottom of each side of the guide groove 30. It is set up.

By operating the cylinder 36 and retracting the cylinder rod 37 into the cylinder 36, the hook piece 38 pushes the side surface of the pallet 4 and moves the pallet 4 by one stage. After moving pallet 4 (at this time, the stage where pallet 4 is heated is empty), cylinder rod 3
7 to move forward and prepare for the next movement operation. At this time, the hook piece 38 is placed in a notch 28a formed in the corner of the outer guide plate 28 so that it does not get in the way when the next valentine 4 moves to the empty stage. .

The pallet 4 is intermittently moved one stage at a time by the above-mentioned pallet moving device 31 and circulates through the guide groove portion 30 .

The pallet positioning mechanism 32 includes a cylinder 40, a pin 42 that is moved forward and backward by the cylinder 40 and engages and disengages from a stopper/positioning piece 41 provided on the top surface of the pallet 4, and a guide base 43 that guides the pin 42. , and each stage that requires positioning of the pallet 4 (disk supply section A, mask attachment section C, mask unit transfer section E, outer periphery mask removal section G1, center mask removal section ■, disk ejection section, etc.) It is located.

When the pallet 4 moves to the stage that requires positioning, the cylinder 40 operates and the cylinder rod 4
4 moves forward, which causes the cylinder rod 44 and pin 42 to move forward.
The arm 45 connecting the two rotates to advance the pin 42, and the tip of the pin 42 engages with the engagement recess 41a of the stopper/positioning piece 41. The pallet 4 is thereby accurately positioned on the predetermined stage.

Note that a damper mechanism 46 is provided at each corner portion of the guide groove portion 30. This damper mechanism 4G is fixed to the outer guide plate 28, and its buffer piston 47
protrudes into the guide groove 30 to reduce the impact when the pallet 4 is moved.

In the above manufacturing system, since the rectangular pallet 4 is used, the square circulation base machine 3 of the present invention is employed. The reason for this is that although a base machine can be used to transport the pallet 4, it would result in wasted space and increase in size. The square circulation base machine 3 does not have wasted space unlike the turret type base machine, can be made smaller than the turret type base machine, takes up less space, and is suitable as a device in a clean room.

In addition, since the pallet 4 is supported by guide rollers 34 and the pallet moving device 31 consisting of a cylinder 36 is used to move the pallet 4, the moving speed can be increased compared to the free flow conveyor system (cycle reduction is possible). Can)
, the pallet 4 at rest does not vibrate, allowing highly accurate work. Furthermore, compared to the chain drive system, there is no drive part that protrudes outside the pallet 4, making it more compact and requiring less floor space for installation.

Next, the pallet 4 will be described. As shown in FIGS. 7 to 9, the aforementioned stopper/positioning pieces 41 are provided at two locations on the side edges of the pallet 4, and the mounting portion 4a,
A peripheral mask stand 48 is provided at each corner of the mask 4b. Further, a space 49 and a guide pin 50 are provided at both ends in the length direction of the placing parts 4a and 4b, and a center mask stand 51 is provided along the length direction between the spacers 49 of the other placing part 4b. Three pieces are arranged at predetermined intervals.

The outer mask stand 48 positions the outer mask 9,
Further, the guide pin 50 positions the disc base 7,
The spacer 49 also positions the mask unit 6 in height.

FIG. 10 shows a state in which mask units are placed on the placing parts 4a and 4b. Further, FIG. 11 shows a state in which the center mask 8 removed by the center mask removal device 12 is set on the center mask stand 51.

Note that the pallet 4 is provided with a safety guide 52 so that it is possible to check whether the outer peripheral mask 9 is misplaced on the left or right side.

FIG. 12 shows the mask unit 6. The disk base 7 constituting the base of the mask unit 6 has a U-shaped cross section, and has a width W that can stably support the disk 1 and the outer peripheral mask 9, and a width W that allows multiple (three) disks 1 to be attached. It has the necessary length and has a lightweight structure with rigidity that allows sufficient accuracy of the thickness T with respect to the width W and length.

Positioning holes 53 are provided at both lengthwise ends of the disc base 7.
, 53, 54, and 54, one positioning hole 53.53 is fitted with a guide pin 50 installed upright on the pallet 4, and the other positioning hole 54.54 is provided with a guide pin 50 installed on the outer peripheral mask 9. The guide pin 55 is inserted.

A plurality (three) of center pieces 56 for supporting the disk 1 are arranged on the upper surface of the disk base 7, and magnets 57 for fixing the outer peripheral mask 9 are arranged between the center pieces 56. There is.

The center piece 56 includes a cylindrical guide portion 58 that accurately guides the inner diameter of the disk 1, and a flange portion 5 that holds the disk 1.
9, and a holding portion 60 formed in a banana chip shape for positioning and holding the center mask 8 (see FIG. 14).

As shown in detail in FIG. 14, the center mask 8 includes a protrusion 63 erected in the center of a mask portion 61 and having a hollow portion 62 into which the holding portion 60 is fitted. This protrusion 6
A neck 64 is formed at the upper part of the mask 3, and the center mask 8 can be removed by hooking onto the neck 64.

Mask holes 9a are formed in the outer peripheral mask 9 at a pitch equal to that of the center piece 56, and folded portions 65 are formed on both side edges to maintain overall rigidity. Outer mask 9
The aforementioned guide pins 55 are provided at both ends in the length direction, and positioning grooves 66 are also formed.

13 to 17 show the vapor deposition holder 5 to which the above-mentioned mask unit 6 is attached. The vapor deposition holder 5 has triangular upper and lower plates 68.6 at both longitudinal ends of the shaft 67.
8 is fixed, and has three mounting surfaces on which the mask unit 6 is attached.

The shaft 67 is provided with a claw member 69 to which rotational force is applied by the autorotating and revolving vapor deposition cart 21 . Further, on the upper and lower plates 68, 68, there are a guide pin 70 that engages with the above-mentioned positioning groove 66, and a magnet 71 that fixes the outer peripheral mask 9 or the disk base 7 (see FIG. 15).
is provided.

The mask unit 6 is attached to the vapor deposition holder 5 by engaging the guide pin 70 with the positioning groove 66 of the outer circumferential mask 9 and fixing the outer circumferential mask 9 to the magnet 71.

In order to prevent the vapor deposition material (aluminum) from entering through the gap between the outer peripheral masks 9, a shielding rib 72 (see FIGS. 16 and 17) is provided between the upper and lower plates 68, 68.

Although not shown in detail, the vapor deposition cart 21 has a structure in which a support frame 73 supporting a plurality of the above-mentioned vapor deposition holders 5 itself is revolved by a sun gear 74, and each vapor deposition holder 5 is rotated by a planetary gear. (See Figure 2).

FIGS. 18 and 19 show the outer mask removing device 10 installed in the outer mask removing section G of the guide groove 30. As shown in FIG. The outer mask removal device 10 includes a locking mechanism 75 that locks the disk base 7, a lifting mechanism 77 that lifts and lowers a hand frame 76 that holds and fixes the outer mask and the disk J.
The hand frame 76 is equipped with a clamping mechanism 79 having a pair of chucks 78 and 78 for clamping the outer peripheral mask 9, and the hand frame 76 is mounted on one mounting section 4a and the other mounting section 4b of the pallet 4. It is composed of a slide mechanism 80 that reciprocates between the upper and lower sides.

When the pallet 4 is transferred to the external mask removal section G and positioned and locked by the pallet positioning mechanism 32, the cylinder 81 of the locking mechanism 75 operates and the clamp 82
holds down the disc base 7, while the hand frame 76 is lowered by the cylinder 83 of the elevating mechanism 77, and the presser pin 84 provided on the hand frame 76 is pressed against the spring 84.
The outer peripheral mask 9 is pressed by the elastic force of a. Next, the cylinder 85 of the clamp mechanism 79 operates to clamp the chuck portion 78.7.
8 clamps the outer peripheral mask 9. At this time, the pedestal 78a of the chuck 78 enters the lower part of the outer peripheral mask 9, and the side portions 78b enter the grooves formed at both ends of the outer peripheral mask 9, so that the outer peripheral mask 9 is prevented from shifting. After that, the cylinder 83 moves the outer peripheral mask 9 onto the hand frame 7.
6 and moves away from the disk base 7.

When the outer peripheral mask 9 is separated, the lock mechanism 75 is released. At the same time, the cylinder 86 of the slide mechanism 80
As a result, the outer mask 9 is moved together with the hand frame 76 onto the other mounting portion 4b of the pallet 4. Next, the outer circumferential mask 9 is lowered together with the hand frame 76 by the cylinder 83, and is housed in the outer circumferential mask stand 48 of the other mounting section 4b. Thereafter, the cylinder 85 operates to separate the chuck portions 78, 7B from the outer peripheral mask 9, and the clamp is released.

When the clamp of the outer peripheral mask 9 is released, the cylinder 83
The hand frame 76 rises, and then the cylinder 8
6 returns to the original position. Thereafter, the pallet positioning mechanism 32 is unlocked and the pallet 4 is transferred to the next electrostatic blower part H.

20 and 21 show an electrostatic blow device 11 installed in the electrostatic blow part H. FIG. The electrostatic blow device 11 is an electrostatic blow device that combines an electrostatic blow nozzle 87 that blows ionized air onto the disk 1, etc., and an exhaust duct 88 that sucks and removes the air etc. blown from the electrostatic blow nozzle 87. It consists of a unit 89, a rotation drive mechanism 90 that rotates the electrostatic blow unit 89 on the disk 1, etc., and a box-shaped shutter 91 that covers the pallet 4 and the electrostatic blow unit 89.

The shutter 91 is partitioned into a room 91a that covers the mounting section 4a and a room 91b that covers the mounting section 4b.
Three sets of electrostatic blow units 89 are arranged in each of a and 91b.

The electrostatic blow unit 89 is connected to the rotation shaft 9 of the rotation drive mechanism 90.
2 via an adjuster 93, and the height and angle from the disk 1 etc. can be adjusted by the adjuster 93.

Pallet 4 moves from the outer mask removal part G to the electrostatic blower part H
When the cylinder 94 moves the shutter 91
is lowered, the chamber 91a covers the disk 1, center mask 8, and disk base 7 on one mounting part 4a, and the chamber 91b covers the outer peripheral mask 9 on the other mounting part 4b. The motor 95 of the mechanism 90 operates, and the rotation shaft 92 is rotated by the transmission mechanism 96. As a result, each electrostatic blower unit 89 performs electrostatic blowing while rotating on the disk 1 etc. At this time, the electrostatic blow nozzle 87
Since the air blown onto the disk 1 and the dust such as aluminum powder blown up by the air are immediately suctioned and removed by the exhaust duct 88, there is no risk of dust scattering during electrostatic blowing and adversely affecting the surrounding area. .

When the electrostatic blowing is finished, the cylinder 94 raises the shutter 911jL and the electrostatic blowing unit 89, and the pallet 4 is transferred to the center mask removal section I.

22 to 24 show the center mask removal device 12 installed in the center mask removal section (2). The center mask removal device 12 is equipped with a locking mechanism 97 that locks the disk base 7, a lifting mechanism 99 that lifts and lowers a hand frame 98 that holds and fixes the center mask 8, and the hand frame 98 so as to be movable up and down. A chuck mechanism 101 having a pair of chuck parts 100, 100 for clamping the center mask 8, and a slide mechanism 102 for reciprocating the hand frame 98 between the top of one mounting part 4a and the other mounting part 4b. It consists of

When the pallet 4 is transferred to the center mask removal section I and positioned and locked by the pallet positioning mechanism 32,
The cylinder 103 of the locking mechanism 97 operates and the clamp 1
04 presses down the disk base 7 on one of the placement parts 4a of the pallet 4, while the hand frame 98 is lowered by the cylinder 105 of the elevating mechanism 99 and the hand frame 9
The presser pin 106 provided at 8 presses the head of the center mask 8 by the elastic force of the spring 106a. 6 Next, the cylinder 107 of the chuck mechanism 101 operates to release the chuck part 10.
0,100 chucks the neck 64 of the center mask 8. Thereafter, the hand frame 98 is raised by the cylinder 105, and the center mask 8 is separated from the disk base 7.

When the center mask 8 is removed, the lock mechanism 97 is released. At the same time, the hand frame 98 is slid by the cylinder 108 of the slide mechanism 102, and the center mask 8 is moved onto the other mounting portion 4b.Then, the hand frame 98 is lowered by the cylinder 105.degree. 98, the chuck mechanism 101 is lowered and the center mask 8 is pushed into the center mask stand 51. Thereafter, the cylinder 107 is operated, the chuck parts 100, 100 are separated from the center mask 8, and the chuck is released.

When the center mask 8 is unzipped, the cylinder 1
05, the hand frame 98 is raised, and then returned to its original position by the cylinder 108.

Thereafter, the pallet positioning mechanism 32 is unlocked, and the pallet 4 is transferred to the disk ejecting section K via the idle section J.

25 to 27 show the disc ejecting hand 13 installed in the disc ejecting section K and the disc supplying hand 15 installed in the disc supplying section A.

The disc ejecting hand 13 is provided on one side of the support frame 109, and the disc supplying hand 15 is provided on the other side.

First, the disc ejecting hand 13 will be explained. As shown in FIGS. 25 and 26, the suction hand 1 is equipped with a suction cup 110 that suctions the disc 1 using vacuum suction force.
11, a slide mechanism 112 for reciprocating the suction hand 111 between the pallet 4 and an empty stand 14 located opposite the disk ejecting section, and a lifting mechanism 113 for raising and lowering the suction hand 111. .

When the pallet 4 is transferred to the disk take-out part K and positioned and locked by the pallet positioning mechanism 32, the suction hand 111 is lowered by the cylinder 114 of the elevating mechanism 113 and the suction cup 110 is pressed against the disk 1. At this time, a vacuum solenoid valve (not shown) is activated and the suction cup 1
A suction force is generated at 10.

When the disk 1 is attracted and a certain degree of vacuum is reached, the suction hand 111 is raised by the cylinder 114, and the disk 1 is attracted to the suction cup 110 and separated from the disk base 7. Next, the suction hand 111 is moved by the loftless cylinder 115 of the slide mechanism 112 to the empty stand 14 at a position facing the disc ejecting part, that is, to the ejecting stand positioning part 156 of the CD disc supplying and ejecting device 23 (see FIG. 35). At this position, the suction hand 111 is lowered by the cylinder 114, and the disk 1 is inserted into the upper tapered portion 14a of the stand 14 (see FIG. 3).

After the suction hand 111 is lowered, the vacuum electromagnetic valve stops operating, and the suction force of the suction cup 110 disappears. At this time,
Clean air is flowed into the vacuum piping (not shown) and blown from the suction cup 110, and the disk 1 and the suction cup 110 are
I often leave my home.

When the disc 1 separates from the suction cup 110, it falls while being guided by the stand 14. When the disc 1 is transferred to the stand 14, the suction hand 111 is moved by the cylinder 114.
is raised, and then returned to its original position by the rodless cylinder 115.

When the suction hand 111 returns, the pallet positioning mechanism 32 is unlocked and the pallet 4 is transferred to the disk supply section A.

Next, the disk supply hand 15 will be explained with reference to FIGS. 25 and 27. It includes a slide mechanism 117 that slides the slide hand 116, a hand frame l18 that is installed on the slide hand 116 so as to be able to move up and down, and a disk supply hand 15. The suction hand 120 is provided with a suction cup 119 for suctioning l by vacuum suction force and is mounted on the hand frame 118 so as to be movable up and down.

The pallet 4 is transferred to the disk supply section A with the disk 1 before vapor deposition sucked by the suction cup 119 from the stand 14 located at the supply stand positioning section 155 (see FIG. 35) of the CD stand supply/takeout device 23. Wait for. When the pallet 4 is positioned and locked in the disk supply section A by the pallet positioning mechanism 32, the hand frame 118 is lowered by the cylinder 121, and at the same time the suction hand 120 is lowered by the cylinder 122, and the disk 1 is moved to the center on the disk base 7. It is inserted into the piece 56.

After the hand frame 118 and the suction hand 120 are lowered, the vacuum solenoid valve (not shown) stops operating, and the suction cup 11
9's suction power disappears. At this time, clean air is caused to flow through a vacuum pipe (not shown) to blow from the suction cup 119, thereby improving the distance between the disk 1 and the suction cup 119.

When the disk 1 is mounted on the disk base 7 in this manner, the hand frame 118 is raised by the cylinder 121, and the suction hand 120 is also raised by the cylinder 122. Next, the hand frame 118 and the suction hand 1 are moved by the rodless cylinder 123 of the slide mechanism 117.
20 is slid together with the slide hand 116,
It is located on a stand 14 waiting at a position facing the disk supply section A. After that, the hand frame 118 is lowered by the cylinder 121, and the suction cup 119 is moved to the stand 1.
4 is pressed against the disk l loaded on top.

When the hand frame 118 is lowered, a vacuum electromagnetic valve (not shown) is activated and a suction force is generated on the suction cup 119.

When the disc 1 is attracted and reaches a certain degree of vacuum, the hand frame 118 is raised by the cylinder 121, and the disc 1 is taken out from the stand 14.Then, the rodless cylinder 123 returns to the original standby position. ,
Waiting for the pallet 4 to be transferred.

28 to 30 show the mask attachment device 16 installed in the mask attachment section C. The mask attachment device 16 is
Slide mechanism 1 for sliding the hand frame 124
25, a lifting mechanism 126 for lifting and lowering the hand frame 124, a clamping mechanism 127 that is installed on the hand frame 124 and clamps the outer peripheral mask 9, and a clamp mechanism 127 that is installed on the hand frame 124 so as to be movable up and down and chucks the center mask 8. It is composed of a chuck mechanism 128.

The pallet 4 is transferred from the disk supply section A to the mask attachment section C via the idle section B, and is moved to the pallet positioning mechanism 32.
When the position is locked by the hand frame 124
is lowered onto the other mounting portion 4b of the pallet 4 by the cylinder 129 of the lifting mechanism 126. This other mounting section 4b
A center mask 8 and an outer circumferential mask 9 are placed thereon.

Simultaneously with the lowering of the hand frame 124, the chuck mechanism 128 is lowered by the cylinder 130. hand frame 1
24, the holding pin 131 provided on the hand frame 124 presses down the outer peripheral mask 9 due to the elastic force of the spring 131a.

Next, the cylinder 132 (the 30th cylinder) of the chuck mechanism 128
(see figure), the chuck section 133 chucks the neck 64 of the center mask 8. At the same time, the chuck 13 is also clamped by the cylinder 134°134 of the clamp mechanism 127.
5,135 cradle 135a, 135a is the outer peripheral mask 9
At the same time, the side portions 135b, 135b enter the grooves formed at both ends of the outer circumferential mask 9 and clamp the outer circumferential mask 9 so as not to shift.

After that, the hand frame 124 is raised by the cylinder 129, and the chuck mechanism 128 is raised by the cylinder 130.
rises. When the chuck mechanism 128 rises, a presser pin 136 (see FIG. 30) provided on the hand frame 124 presses the head of the center mask 8 by the elastic force of the spring 136a.

When the center mask 8 and the outer peripheral mask 9 are raised by the hand frame 124, the cylinder 13 of the slide mechanism 125
7, the hand frame 124 is slid onto one of the mounting portions 4a on which the disc 1 is mounted. After this,
The reband frame 124 is lowered by the cylinder 129, the outer mask 9 is placed in the outer mask stand 48, the guide pin 55 of the outer mask 9 is fitted into the positioning hole 53 of the disk base 7, and the magnet 57 moves the outer mask 9 to the disk. 1 and press down on the periphery of disc base 7.
fixed on top. In addition, the center mask 8 is
It is attached to the holding part 60 by pressing down the center part. At this time, the center mask 8 is pressed against the disk 1 by the elastic force of the spring 131b.

When the center mask 8 and the outer peripheral mask 9 are attached to the disk base 7 in this way, the chuck part 133 releases the chuck of the center mask 8 by the cylinder 132, and the chucks 135, 13 by the cylinders 134, 134 release the chuck.
5 releases the clamp of the outer peripheral mask 9. Next, the hand frame 124 is raised by the cylinder 129, and then the hand frame 124 is returned to its original position by the cylinder 137.

When the hand frame 124 returns, the pallet positioning mechanism 32 is unlocked and the pallet 4 is transferred to the electrostatic blower.

FIG. 31 and FIG. 32 show an electrostatic blow device 17 installed in an electrostatic blower. The electrostatic blow device 17 is
An electrostatic blower is constructed by combining a plurality of (four in the drawings) electrostatic blow nozzles 138 that blow ionized air onto the disk 1, etc., and an exhaust duct 139 that sucks and removes the air etc. blown from the electrostatic blow nozzles 138. An electric blow unit 140 and a linear drive mechanism 14 that reciprocates the electrostatic blow unit 140 in the length direction of the pallet 4.
1 and 1, the other mounting section 4 on which the mask unit 6 is mounted
b and a shutter 142 that covers the electrostatic blow unit 140.
It is composed of.

Note that a notch 139a is formed at the center of the lower end of the exhaust duct 139 to serve as a center mask cutout.

When the pallet 4 is transferred to the electrostatic blower, the electrostatic blower unit 140 is moved by the loftless cylinder 143 of the linear drive mechanism 141 over the mask unit 6 on which the disk 1 before vapor deposition is mounted.

The air blown onto the mask unit 6 from the electrostatic blow nozzle 138 and the dust blown up by the air are immediately suctioned and removed by the exhaust duct 139 running together with the electrostatic blow nozzle 138. In this way, if the exhaust duct 139 is moved together with the electrostatic blow nozzle 138, there is no need to use a large exhaust duct.

During electrostatic blowing, the shutter 142 prevents dirt, dust, etc. from entering from the outside.

When the electrostatic blowing is completed, the pallet 4 is transferred to the mask unit transfer section.

33 and 34 show the transfer device 18 installed in the mask unit transfer section E. FIG. The transfer device 18 includes a hand frame 144 and a clamp mechanism 14 that is installed on the hand frame 144 and clamps the mask unit 6.
5, and a lifting mechanism 146 that lifts and lowers the hand frame 144.
and a slide mechanism 147 that reciprocates the hand frame 144 between one mounting section 4a and the other mounting section 4b of the pallet 4.

When the pallet 4 is transferred to the mask unit transfer section E and is positioned and locked by the pallet positioning mechanism 32,
The hand frame 144 is lowered by the cylinder 148 of the elevating mechanism 146, and the presser pin 149 provided on the hand frame 144 presses the outer peripheral mask 9 with the elastic force of the spring 149a, and the presser pin 150 presses the outer mask 9 with the spring 150a.
The head of the center mask 8 is pressed down by the repulsive force of. Next, the chucks 152 and 152 clamp the mask unit 6 by the cylinders 151 and 151 of the clamp mechanism 145 . At this time, the pedestal 152a of the chuck 152 enters the lower part of the disk base 7, and the side portions 152b enter the grooves formed at both ends of the outer peripheral mask 9, thereby preventing the mask unit 6 from shifting.

When the mask unit 6 is clamped, the cylinder 148
As a result, the hand frame 144 is raised, and the mask unit 6 is separated from one of the mounting portions 4a of the pallet 4. Next, the hand frame 144 is slid by the cylinder 153 of the slide mechanism 147, and the mask unit 6 is moved onto the other mounting section 4b. After this, cylinder 14
8, the hand frame 144 is lowered and the mask unit 6 is transferred to the other mounting section 4b.

When the mask unit 6 is transferred, the cylinder 151.1
The clamps of the chucks 152, 152 are released by the cylinder 148, and then the hand frame 1 is released by the cylinder 148.
44 is raised, and then returned to its original position by the cylinder 153. When the transfer of the mask unit 6 is completed in this manner, the pallet positioning mechanism 32 is unlocked.

FIG. 35 shows the entire CD stand supply/take-out device 23. As shown in FIG. The CD stand supply/take-out device 23 is mounted on a pedestal 154.
A supply stock part 24 provided at one lengthwise end (left side in the drawing), a takeout stock part 25 provided at the other lengthwise end (right side in the drawing), and these supply stock part 24 and takeout stock part 25. A supply stand positioning section 155 and an ejection stand positioning section 156 provided between the disk supply section A1 and the disk ejection section and facing the disk ejection section, and a stand transfer section provided from one end in the length direction to the other end. 157.

The supply stock section 24 is provided with a plate 158 that serves as a stand receiver for transporting the stand 14 on which a plurality of disks 1 before vapor deposition are stacked to the stand transfer section 157 . This stand holder has a plurality of U-shaped grooves 159 (three in the drawing) formed in the plate 158 that open on the side of the stand transfer section 157, and there are two locations on the opening side and the back side of the U-shaped grooves 159. (6 locations in total in the drawing) to receive the stand 14. Each U
A stand support plate 160 that temporarily supports the stand 14 is provided at a lower position on the opening side of the groove 159.

36 and 37 show the above-mentioned supply stock section 24 in detail. A loftless cylinder 161 is connected to the plate 158, and the stand receiver is moved by the loftless cylinder 161 to transfer the stand 14 to the stand transfer section 157.

The stand support plate 160 moves up and down while being guided by guide shafts 163, 163 by a cylinder 162.
When the plate 158 advances and the stand 14 on the opening side of the U-shaped groove 159 is transferred to the stand transfer section 157, the stand holder is used to transfer the stand 14 on the back side of the U-shaped groove 159 (this stand 14 is then moved to the stand support plate). When the plate 158 retreats and returns to its original position, the stand holder returns the supported stand 14 onto the plate 158. The returned stand 14 is located on the opening side of the U-shaped groove 159, and then the stand receiver is transferred to the stand transfer section 157 when the plate 158 moves forward.

The take-out stock part 25 has a stand holder plate 164,
It includes a stand support plate 165 and has the same structure as the supply stocker section 24 .

When the stand 14 loaded with the deposited disks 1 is transferred by the stand transfer unit 157, the stand 14 that has been stocked on the opening side of the U-shaped groove 166 of the plate 164 is temporarily moved by the stand support plate 165. The stand holder is then supported by plate 1.
64 moves forward to remove the stand 14 from the stand transfer section 157.
At the same time, the stand support plate 165 is lowered to receive the stand 14 which was temporarily supported by the stand support plate 165, and then the stand support returns to its original position as the plate 164 retreats.

As a result, the stand 14 that was stocked on the opening side of the U-shaped groove 166 is moved to the back side and waits to be sent to the protective film coating process, which is the next process after the vapor deposition process.

As shown in FIG. 35, the supply stand positioning section 155 has a pair of positioning plates 16 facing each other.
7.167 is provided. These positioning plates 167
．． 167 are brought close to each other by cylinders 168 and 168, and a plurality of concave holding portions 167a (three in the drawing) for holding and fixing the base 14b of the stand 14 are arranged on the inner surface thereof.

Although not shown, the supply stand positioning unit 155 lifts the stack of disks 1 each time a disk 1 before vapor deposition is transferred from the stand 14 to the disk supply unit A, and places it on the top of the stack. A disk set-up mechanism is provided that always positions a certain disk 1 at the same height.

Similarly, the cylinder 16 is also attached to the take-out stand positioning part 156.
A pair of positioning plates 17 approaching each other by 9,169
0,170 is provided, and the positioning plate 170,1
A plurality of concave holding portions 170a are arranged on the inner surface of 70.

As shown in FIG. 35, the stand transfer section 157 is equipped with a transfer bar 173, on which mounting sections 172a and 172c of the stand 14 are disposed, so as to be movable in the longitudinal direction of the pedestal 154. This transfer bar 173 is connected to the supply stock section 2
The stand 14 transferred from 4 is transferred to the supply stand positioning section 155, and the empty stand 14 is transferred to the supply stand positioning section 155.
6, and the operation of transferring the stand 14 loaded with a predetermined number of vapor-deposited disks 1 by the take-out stand positioning unit 156 to a position opposite to the take-out stock unit 25 is repeated.

FIG. 38 shows the cylinder 17 that reciprocates the transfer bar 173.
4 is shown. This cylinder 174 is connected to the roller 175
, 175 to a table 176 that movably supports the transfer bar 173.

39 and 40 show a lifting mechanism 177 that lifts and lowers the transfer bar 173. This elevating mechanism 177 includes a link mechanism 178 and a cylinder 179 that operates the link mechanism 178, and a table 176 is connected to the link mechanism 178 via a pin 180. Piston rod 17 of cylinder 179
When the piston loft 9a moves forward, the link mechanism 178 lowers the table 176 and the transfer bar 173 descends, and when the piston loft 179a retreats, the table 176 is raised and the transfer bar 1
73 rises.

Next, the overall operation of the CD stand supply/take-out device 23 will be explained. First, in the first step, the plate 158 of the stand holder on the supply side moves forward, and the clamping fixation of the positioning plates 169 and 170 is released. Next, in the second step, the transfer bar 173 rises, and the stand support plate 1 on the supply side
60 rises. Next, in the third step, the supply side stand support plate 158 is moved back. Then, in the fourth step, the transfer bar 173 is moved to the right side in FIG. 35, and the supply side stand support plate 160 is lowered. , the stand support plate 165 on the extraction side rises. Next, in the fifth step, the plate 164 moves forward on the stand receiver on the extraction side. Next, in the sixth step, the transfer bar 173 is lowered, and the stand support plate 165 on the extraction side is also lowered. After this, in the seventh step, the transfer bar 173 moves to the left side in FIG.
64 retreats, and the positioning plates 167 and 170 are clamped and fixed.

After this seventh step, the undeposited disks 1 are removed from the stand 14 locked by the supply stand positioning section 155, and a predetermined number of deposited disks 1 are loaded onto the stand 14 locked by the takeout stand positioning section 156. After that, the process is repeated again from the first step.

〔Effect of the invention〕

As explained above, the square circulation type base machine of the present invention can be made smaller and takes up less space than the talent type base machine, making it ideal as equipment for a CD manufacturing system that requires a clean room. It is.

Furthermore, it is easy to change the dimensions of the pedestal base, the number of pallets to be circulated, and the positioning positions of the pallets, providing a high degree of freedom in design and also making it possible to easily adapt to changes in the CD manufacturing system.

[Brief explanation of the drawing]

Fig. 1 is an explanatory diagram showing a CD manufacturing system equipped with the square circulation base machine of the present invention, Fig. 2 is a perspective view showing a device implementing the system, Fig. 3 is a side view of the stand, Fig. 4 5 is a perspective view showing an embodiment of the circulating base machine of the present invention; FIG. 6 is a perspective view showing a partially cut away corner of the circulating base machine; Figure 7 is a plan view of the pallet, Figures 8 and 9.
The figure is a side view of the same pallet, Figure 10 is a partially cutaway side view with the mask unit placed on the pallet, and Figure 11 is a partially cutaway side view with the center mask set on the center mask stand of the pallet. , FIG. 12 is an exploded perspective view of the mask unit, FIG. 13 is a perspective view of the vapor deposition holder, and FIG.
Figure 4 is a partially enlarged sectional view of the mask unit set in the evaporation holder, Figure 15 is a side view of the evaporation holder, Figure 16 is the sectional view, Figure 17 is the top view, and Figure 18 is the outer periphery. A front view of the mask removal device, Fig. 19 is the same plan view, Fig. 2
Figure 0 is a front view of the electrostatic blowing device, Figure 21 is a side view of the same,
Fig. 22 is a front view of the center mask removal device, Fig. 23 is a side view of the same, Fig. 24 is a plan view of the same, Fig. 25 is a plan view of the disc ejecting hand and disc supply hand, and Fig. 26 is a plan view of the disc ejecting hand. FIG. 27 is a side view of the disk supply hand, FIG. 28 is a front view of the mask attachment device, and FIG. 27 is a side view of the hand.
9 is a plan view of the same, FIG. 30 is a partial side view of the chuck mechanism of the device, FIG. 31 is a side view of the electrostatic blowing device, and FIG. 32 is a side view of the electrostatic blowing device.
33 is a front view of the transfer device, FIG. 34 is a plan view of the same, FIG. 35 is a plan view of the CD stand supply and take-out device, and FIG. 36 is a side view of the supply stocker section. FIG. 37 is a front view of the same, FIG. 38 is a front view of a cylinder for moving the transfer bar of the same apparatus, FIG. 39 is a front view of the elevating mechanism of the transfer bar, and FIG. 40 is a side view of the same. 3... Square circulation base machine, 27... Frame base, 30... Guide groove, 31... Pallet moving device, 32... Pallet positioning mechanism. Patent Applicant Toshiba EMI Corporation Toshiba Corporation Figure 9 Figure 11 Figure 13 Figure 14, 70 Rattan 2 o Cause ■ Figure 28 Figure 30 Figure 34 However, Procedural Amendment WF Reporter Shiga Gakudon 1 , Indication of the case: 1981 Sasaku No. 251501 2, Name of the invention: Square circulation type base machine 3, Person making the amendment: Biting with Hanyu Patent applicant address: 2-2-17 Akasaka, Minato-ku, Tokyo Name: Toshiba EM i Co., Ltd. and 1 other person 4, Agent name (6069) Patent attorney Hideo Richi 5, Date of contest order April 30, 1985 6, Number of inventions increased by amendment Contents of amendment (Special (Application No. 59-251501) Regarding this application, the omission of "Diagram" in the "Brief Description of Drawings" in the specification will be corrected as follows. Note 1, page 47, line 1, "No. 28" has been corrected to "Figure 28." Patent applicant: Toshiba EM Corporation and 1 other person

Claims (1)

[Claims] A rectangular frame-shaped guide groove for circulating a rectangular pallet is formed on a gantry base, the guide groove is divided into a plurality of work stages, and the pallet is intermittently moved to each work stage on the gantry base. A square circulating base machine characterized by being equipped with a pallet moving device and a pallet positioning mechanism that positions and fixes the pallet on a required work stage.