JPS5667852A - Photomask for projecting exposure - Google Patents

Photomask for projecting exposure

Info

Publication number
JPS5667852A
JPS5667852A JP14469179A JP14469179A JPS5667852A JP S5667852 A JPS5667852 A JP S5667852A JP 14469179 A JP14469179 A JP 14469179A JP 14469179 A JP14469179 A JP 14469179A JP S5667852 A JPS5667852 A JP S5667852A
Authority
JP
Japan
Prior art keywords
photomask
pattern
patterns
projecting exposure
active
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14469179A
Other languages
Japanese (ja)
Inventor
Keizo Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP14469179A priority Critical patent/JPS5667852A/en
Publication of JPS5667852A publication Critical patent/JPS5667852A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To make adhesive work easy and the quality of a photomask for projecting exposure high by forming a pattern for sticking on the outer side of the active patterns of said photomask and adhering a transparent plate on that part. CONSTITUTION:Active patterns 11 which are respective elements of semiconductor devices are formed on the surface of a transparent glass substrate 10 of about 2mm. thick, and a pattern 12 for sticking of about 500-3,000Angstrom in thickness (t) and about 0.1-1mm. in width (l) is formed on the outer side of the patterns 11. A transparent plate 6 is fixed by way of an adhesive agent 7 in the part of the pattern 12 and the parts 13 where there are the patterns 11 are made hollow. Since this causes the active pattern parts to be shut off from the outside air, staining owing to the entry of moisture etc. does not occur and the photomask for projecting exposure of good quality is obtained.
JP14469179A 1979-11-08 1979-11-08 Photomask for projecting exposure Pending JPS5667852A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14469179A JPS5667852A (en) 1979-11-08 1979-11-08 Photomask for projecting exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14469179A JPS5667852A (en) 1979-11-08 1979-11-08 Photomask for projecting exposure

Publications (1)

Publication Number Publication Date
JPS5667852A true JPS5667852A (en) 1981-06-08

Family

ID=15368014

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14469179A Pending JPS5667852A (en) 1979-11-08 1979-11-08 Photomask for projecting exposure

Country Status (1)

Country Link
JP (1) JPS5667852A (en)

Similar Documents

Publication Publication Date Title
JPS5667852A (en) Photomask for projecting exposure
JPS5680133A (en) Formation of pattern
JPS56140626A (en) Manufacture of semiconductor device
JPS6488546A (en) Method for exposing thick film resist
JPS5555528A (en) Mask aligner
JPS57155539A (en) Mask
JPS55147628A (en) Mask base material
JPS57167659A (en) Manufacture of semiconductor device
JPS53147531A (en) Forming method for thin film pattern
JPS5610930A (en) Manufacture of semiconductor device
JPS5689741A (en) Dryplate for photomasking
JPS5621327A (en) Manufacture of semiconductor device
JPS57112025A (en) Formation of pattern
JPS53139982A (en) Exposure apparatus of semiconductor substrates
JPS55129349A (en) Photomask
JPS55158635A (en) Mask
JPS5616126A (en) Exposing method
JPS57176041A (en) Photomask for printing circuit and exposure method using this
JPS647042A (en) Photomask
JPS56167329A (en) Piling joint setting mark to be used in fine processing exposure technology
JPS57101837A (en) Photomask
JPS6472163A (en) Formation of thin film pattern
JPS55158652A (en) Fitting structure for element
JPS56116624A (en) Manufacture of semiconductor device
JPS6450423A (en) Formation of resist-pattern