JPS5660432A - Photosolubilizing composition - Google Patents

Photosolubilizing composition

Info

Publication number
JPS5660432A
JPS5660432A JP13672879A JP13672879A JPS5660432A JP S5660432 A JPS5660432 A JP S5660432A JP 13672879 A JP13672879 A JP 13672879A JP 13672879 A JP13672879 A JP 13672879A JP S5660432 A JPS5660432 A JP S5660432A
Authority
JP
Japan
Prior art keywords
composition
amount
agent
photosolubilizing
fine particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13672879A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6223858B2 (enExample
Inventor
Akira Nagashima
Nobuyuki Kita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP13672879A priority Critical patent/JPS5660432A/ja
Priority to US06/199,123 priority patent/US4336319A/en
Priority to DE19803040050 priority patent/DE3040050A1/de
Publication of JPS5660432A publication Critical patent/JPS5660432A/ja
Publication of JPS6223858B2 publication Critical patent/JPS6223858B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP13672879A 1979-10-23 1979-10-23 Photosolubilizing composition Granted JPS5660432A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP13672879A JPS5660432A (en) 1979-10-23 1979-10-23 Photosolubilizing composition
US06/199,123 US4336319A (en) 1979-10-23 1980-10-22 Light-solubilizable composition
DE19803040050 DE3040050A1 (de) 1979-10-23 1980-10-23 Durch licht machbare massen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13672879A JPS5660432A (en) 1979-10-23 1979-10-23 Photosolubilizing composition

Publications (2)

Publication Number Publication Date
JPS5660432A true JPS5660432A (en) 1981-05-25
JPS6223858B2 JPS6223858B2 (enExample) 1987-05-26

Family

ID=15182106

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13672879A Granted JPS5660432A (en) 1979-10-23 1979-10-23 Photosolubilizing composition

Country Status (3)

Country Link
US (1) US4336319A (enExample)
JP (1) JPS5660432A (enExample)
DE (1) DE3040050A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5843451A (ja) * 1981-09-09 1983-03-14 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
WO2008123049A1 (ja) * 2007-03-30 2008-10-16 Jsr Corporation 被膜形成方法及びそれに用いる樹脂組成物、絶縁膜を有する構造体及びその製造方法並びに電子部品
JP2009133924A (ja) * 2007-11-28 2009-06-18 Jsr Corp 被膜形成方法及びそれに用いるポジ型感光性樹脂組成物

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
DE3237775A1 (de) * 1981-10-12 1983-04-28 Daishin Kagaku Kogyo K.K., Niiza, Saitama Material fuer eine plandruckplatte und verfahren zu dessen herstellung
DE3153069T1 (de) * 1981-12-21 1983-12-15 Institut chimii Akademii Nauk SSSR, Gor'kij Foto- und elektronenresist
JPS58162960A (ja) * 1982-03-24 1983-09-27 Fuji Photo Film Co Ltd 平版印刷版の製造方法および平版印刷版用感光材料
JPH06101301B2 (ja) * 1983-11-07 1994-12-12 株式会社日立製作所 粉体層の形成方法
DE3417645A1 (de) * 1984-05-12 1985-11-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches aufzeichnungsmaterial fuer die herstellung von flachdruckplatten
DE3430712A1 (de) * 1984-08-21 1986-03-06 Hoechst Ag, 6230 Frankfurt Verfahren zur reduzierung von unterstrahlungen bei der bestrahlung von reproduktionsschichten
US4885225A (en) * 1988-04-29 1989-12-05 Minnesota Mining And Manufacturing Company Color proof with non-blocking thermal adhesive layer with particulate polymer beads
US5633117A (en) * 1995-04-27 1997-05-27 Imation Corp. Providing imagewise variation in glossiness to a receptor
EP1096313A1 (en) * 1999-11-01 2001-05-02 Kansai Research Institute, Inc. Active particle, photosensitive resin composition, and process for forming pattern
US6783914B1 (en) * 2000-02-25 2004-08-31 Massachusetts Institute Of Technology Encapsulated inorganic resists
US7524606B2 (en) * 2005-04-11 2009-04-28 Az Electronic Materials Usa Corp. Nanocomposite photoresist composition for imaging thick films
US7247419B2 (en) * 2005-04-11 2007-07-24 Az Electronic Materials Usa Corp. Nanocomposite photosensitive composition and use thereof
WO2020120402A1 (en) 2018-12-10 2020-06-18 Agfa Nv On-press processing of a uv or violet-sensitized lithographic printing plate

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3010390A (en) * 1954-06-29 1961-11-28 Buskes Willem Marie Planographic printing plates
BE603930A (enExample) * 1960-05-19
US3891443A (en) * 1973-02-01 1975-06-24 Polychrome Corp Mat finish photosensitive relief plates
US4168979A (en) * 1974-03-19 1979-09-25 Fuji Photo Film Co., Ltd. Light-sensitive printing plate with matt overlayer
US3997344A (en) * 1974-07-05 1976-12-14 American Can Company Dry positive photopolymer imaging process involving heating and application of toner
JPS5280022A (en) * 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
JPS5522763A (en) * 1978-08-08 1980-02-18 Dainippon Printing Co Ltd Image recording material

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5843451A (ja) * 1981-09-09 1983-03-14 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
WO2008123049A1 (ja) * 2007-03-30 2008-10-16 Jsr Corporation 被膜形成方法及びそれに用いる樹脂組成物、絶縁膜を有する構造体及びその製造方法並びに電子部品
JP2009133924A (ja) * 2007-11-28 2009-06-18 Jsr Corp 被膜形成方法及びそれに用いるポジ型感光性樹脂組成物

Also Published As

Publication number Publication date
JPS6223858B2 (enExample) 1987-05-26
DE3040050A1 (de) 1981-05-07
US4336319A (en) 1982-06-22

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