JPS5660064A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5660064A JPS5660064A JP13684579A JP13684579A JPS5660064A JP S5660064 A JPS5660064 A JP S5660064A JP 13684579 A JP13684579 A JP 13684579A JP 13684579 A JP13684579 A JP 13684579A JP S5660064 A JPS5660064 A JP S5660064A
- Authority
- JP
- Japan
- Prior art keywords
- gate
- window
- implanted
- film
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8236—Combination of enhancement and depletion transistors
Abstract
PURPOSE:To simplify the steps of manufacturing the semiconductor device by conducting the introduction of impurity by a special method, thereby raising the withstand voltage at a part of enhancement type and depletion type transistor and forming them on the same semiconductor substrate. CONSTITUTION:A field oxide film 4 for isolating respective transistors is formed on the surface of a P type silicon semiconductor substrate 2, the surface of the substrate 2 is oxidized, a gate oxide film 6 is formed thereon, and boron ion is implanted to the whole surface through the film 6. Then, a resist 10 is coated on the film 6, with a mask it is patterned by a photographic process, and there are formed the window 30 for D-Tr gate, the window 32 for off-set gate of high withstand E-Tr and window 34 for control and off-set gate of the high withstand voltage D-Tr. Then, phosphorus ion is implanted through the respective windows, surface layers 36, 38, 40 are thus formed, and drain current controlling and off-setting gate impurities are simultaneously implanted.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13684579A JPS5660064A (en) | 1979-10-23 | 1979-10-23 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13684579A JPS5660064A (en) | 1979-10-23 | 1979-10-23 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5660064A true JPS5660064A (en) | 1981-05-23 |
Family
ID=15184841
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13684579A Pending JPS5660064A (en) | 1979-10-23 | 1979-10-23 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5660064A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6251248A (en) * | 1985-08-30 | 1987-03-05 | Toshiba Corp | Manufacture of semiconductor device |
JPS62123763A (en) * | 1985-11-22 | 1987-06-05 | Nec Corp | Manufacture of semiconductor device |
JP2007158105A (en) * | 2005-12-06 | 2007-06-21 | Matsushita Electric Ind Co Ltd | Integrated circuit and manufacturing method therefor |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5347278A (en) * | 1976-10-12 | 1978-04-27 | Toshiba Corp | Insulated gate type field effect transistor |
JPS53121583A (en) * | 1977-03-31 | 1978-10-24 | Toshiba Corp | Manufacture of semiconductor device |
-
1979
- 1979-10-23 JP JP13684579A patent/JPS5660064A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5347278A (en) * | 1976-10-12 | 1978-04-27 | Toshiba Corp | Insulated gate type field effect transistor |
JPS53121583A (en) * | 1977-03-31 | 1978-10-24 | Toshiba Corp | Manufacture of semiconductor device |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6251248A (en) * | 1985-08-30 | 1987-03-05 | Toshiba Corp | Manufacture of semiconductor device |
JPH0321100B2 (en) * | 1985-08-30 | 1991-03-20 | Tokyo Shibaura Electric Co | |
JPS62123763A (en) * | 1985-11-22 | 1987-06-05 | Nec Corp | Manufacture of semiconductor device |
JP2007158105A (en) * | 2005-12-06 | 2007-06-21 | Matsushita Electric Ind Co Ltd | Integrated circuit and manufacturing method therefor |
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