JPS5654440A - Photosensitive lithographic material and plate making method - Google Patents

Photosensitive lithographic material and plate making method

Info

Publication number
JPS5654440A
JPS5654440A JP13104179A JP13104179A JPS5654440A JP S5654440 A JPS5654440 A JP S5654440A JP 13104179 A JP13104179 A JP 13104179A JP 13104179 A JP13104179 A JP 13104179A JP S5654440 A JPS5654440 A JP S5654440A
Authority
JP
Japan
Prior art keywords
layer
substrate
silver salt
lithographic plate
silver
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13104179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6158032B2 (enrdf_load_stackoverflow
Inventor
Satoshi Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP13104179A priority Critical patent/JPS5654440A/ja
Publication of JPS5654440A publication Critical patent/JPS5654440A/ja
Publication of JPS6158032B2 publication Critical patent/JPS6158032B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/06—Silver salts

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP13104179A 1979-10-11 1979-10-11 Photosensitive lithographic material and plate making method Granted JPS5654440A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13104179A JPS5654440A (en) 1979-10-11 1979-10-11 Photosensitive lithographic material and plate making method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13104179A JPS5654440A (en) 1979-10-11 1979-10-11 Photosensitive lithographic material and plate making method

Publications (2)

Publication Number Publication Date
JPS5654440A true JPS5654440A (en) 1981-05-14
JPS6158032B2 JPS6158032B2 (enrdf_load_stackoverflow) 1986-12-09

Family

ID=15048631

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13104179A Granted JPS5654440A (en) 1979-10-11 1979-10-11 Photosensitive lithographic material and plate making method

Country Status (1)

Country Link
JP (1) JPS5654440A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01315927A (ja) * 1988-03-29 1989-12-20 Toshiba Corp シャドウマスクのパターン焼付け版及びその製造方法
JPH0274022A (ja) * 1988-09-09 1990-03-14 Matsushita Electric Ind Co Ltd 露光装置およびパターン形成方法
JP2001105763A (ja) * 1999-08-31 2001-04-17 Agfa Gevaert Nv 平版印刷マスターの消去方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5185723A (enrdf_load_stackoverflow) * 1975-01-27 1976-07-27 Fuji Photo Film Co Ltd
JPS5287034A (en) * 1976-01-16 1977-07-20 Fuji Photo Film Co Ltd Image formation
JPS5427804A (en) * 1977-07-29 1979-03-02 Riso Kagaku Corp Method and material for photoengraving

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5185723A (enrdf_load_stackoverflow) * 1975-01-27 1976-07-27 Fuji Photo Film Co Ltd
JPS5287034A (en) * 1976-01-16 1977-07-20 Fuji Photo Film Co Ltd Image formation
JPS5427804A (en) * 1977-07-29 1979-03-02 Riso Kagaku Corp Method and material for photoengraving

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01315927A (ja) * 1988-03-29 1989-12-20 Toshiba Corp シャドウマスクのパターン焼付け版及びその製造方法
JPH0274022A (ja) * 1988-09-09 1990-03-14 Matsushita Electric Ind Co Ltd 露光装置およびパターン形成方法
JP2001105763A (ja) * 1999-08-31 2001-04-17 Agfa Gevaert Nv 平版印刷マスターの消去方法

Also Published As

Publication number Publication date
JPS6158032B2 (enrdf_load_stackoverflow) 1986-12-09

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