JPS5652745A - Method and apparatus for applying photosensitive resin - Google Patents
Method and apparatus for applying photosensitive resinInfo
- Publication number
- JPS5652745A JPS5652745A JP12929679A JP12929679A JPS5652745A JP S5652745 A JPS5652745 A JP S5652745A JP 12929679 A JP12929679 A JP 12929679A JP 12929679 A JP12929679 A JP 12929679A JP S5652745 A JPS5652745 A JP S5652745A
- Authority
- JP
- Japan
- Prior art keywords
- cover
- solvent
- spinner
- humidity
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12929679A JPS5652745A (en) | 1979-10-05 | 1979-10-05 | Method and apparatus for applying photosensitive resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12929679A JPS5652745A (en) | 1979-10-05 | 1979-10-05 | Method and apparatus for applying photosensitive resin |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5652745A true JPS5652745A (en) | 1981-05-12 |
Family
ID=15006055
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12929679A Pending JPS5652745A (en) | 1979-10-05 | 1979-10-05 | Method and apparatus for applying photosensitive resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5652745A (ja) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58190027A (ja) * | 1982-04-30 | 1983-11-05 | Nec Kyushu Ltd | 半導体基板有機処理装置 |
JPS58180020U (ja) * | 1982-05-22 | 1983-12-01 | ヤマハ株式会社 | ピアノ用複合構造体のシール構造 |
JPS5950438U (ja) * | 1982-09-24 | 1984-04-03 | 富士通株式会社 | レジスト塗布装置 |
JPS5995629U (ja) * | 1982-12-20 | 1984-06-28 | 株式会社東芝 | レジスト塗布装置 |
JPS6156414A (ja) * | 1984-08-28 | 1986-03-22 | Fujitsu Ltd | スピンコ−ト方法 |
JPS63136523A (ja) * | 1986-11-27 | 1988-06-08 | Nec Yamagata Ltd | 半導体製造装置 |
JPH01156776U (ja) * | 1988-04-20 | 1989-10-27 | ||
JPH07169680A (ja) * | 1993-08-30 | 1995-07-04 | Semiconductor Syst Inc | ウエハ等のスピンコーティング装置及び方法 |
JP2015216168A (ja) * | 2014-05-08 | 2015-12-03 | 東京エレクトロン株式会社 | 塗布膜形成装置、塗布膜形成方法、記憶媒体 |
-
1979
- 1979-10-05 JP JP12929679A patent/JPS5652745A/ja active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58190027A (ja) * | 1982-04-30 | 1983-11-05 | Nec Kyushu Ltd | 半導体基板有機処理装置 |
JPS58180020U (ja) * | 1982-05-22 | 1983-12-01 | ヤマハ株式会社 | ピアノ用複合構造体のシール構造 |
JPH0413134Y2 (ja) * | 1982-05-22 | 1992-03-27 | ||
JPS5950438U (ja) * | 1982-09-24 | 1984-04-03 | 富士通株式会社 | レジスト塗布装置 |
JPS5995629U (ja) * | 1982-12-20 | 1984-06-28 | 株式会社東芝 | レジスト塗布装置 |
JPS6156414A (ja) * | 1984-08-28 | 1986-03-22 | Fujitsu Ltd | スピンコ−ト方法 |
JPS63136523A (ja) * | 1986-11-27 | 1988-06-08 | Nec Yamagata Ltd | 半導体製造装置 |
JPH01156776U (ja) * | 1988-04-20 | 1989-10-27 | ||
JPH07169680A (ja) * | 1993-08-30 | 1995-07-04 | Semiconductor Syst Inc | ウエハ等のスピンコーティング装置及び方法 |
JP2015216168A (ja) * | 2014-05-08 | 2015-12-03 | 東京エレクトロン株式会社 | 塗布膜形成装置、塗布膜形成方法、記憶媒体 |
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