JPS552720A - Rotary coating unit for resist - Google Patents

Abstract

PURPOSE: To form uniform resist coating having no coating unevenness independently of the shape of a substrate, by forming a recess of a shape similar to that of the substrate, which is to be fitted into the recess, of a size a little larger than that of the substrate, of a thickness nearly equal to that of the substrate.

CONSTITUTION: A glass substrate is fitted to a square recess 12 of the body 11, adhered to the body 11 by evacuating through a suction hole 19 the hollow portion made by the substrate and an exhausting groove 18. Then a predetermined amount of a resist solution is dropped on the substrate, and the body 11 is rotated at a high speed by means of a rotating shaft 21 axially engaged to the body 11. The resist solution is flow cast to plates 16a,---16d, which constitute the recess 12, to form a circular resist coating because the recess is similar in shape to the substrate, a little larger in area than the substrate, and is equal in thickness to the substrate. Uniform concentration distribution of the resist solvent contained in the atmosphere surrounding the substrate permits the substrate to be coated with uniform film without causing unevenness.

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