JPS5648238A - Plasma reaction device - Google Patents
Plasma reaction deviceInfo
- Publication number
- JPS5648238A JPS5648238A JP12509179A JP12509179A JPS5648238A JP S5648238 A JPS5648238 A JP S5648238A JP 12509179 A JP12509179 A JP 12509179A JP 12509179 A JP12509179 A JP 12509179A JP S5648238 A JPS5648238 A JP S5648238A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- tank
- electrodes
- frequency
- magnetic field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To secure the stabilization for the plasma state between the opposing parallel flat plate type high-frequency electrodes within a vaccum tank by the effect of application of the magnetic field, by incorporating the magnetic field generating component to the above-mentioned electrodes.
CONSTITUTION: The permanent magnet 9 is buried into the area corresponding to the material 5 to be etched in the opposing metal electrodes 1 and 2 within the vaccum tank 3. The evacuation is given to the inside the tank 3 to secure a prescribed level of evacuation by actuating the evacuation system 8, and then a prescribed level of pressure is kept inside the tank 3 by introducing the gas coinciding with the material 5 such as the C3F6 gas in the case of the silicon oxide film. After this, the high-frequency power source 4 is actuated, and the high-frequency electric power of a prescribed frequency is applied between the electrodes 1 and 2 to produce the plasma 6. As the static magnetic field 10 exists owing to the magnet 9 and in the vertical direction to the surface of electrode, the discharge starting voltage is reduced relatively in case when the inter-electrode discharge is produced. Thus the generation of plasma can be facilitated. Furthermore, the direction of motion is controlled for the electron or the ion in the plasma by magnetic line of force, thus ensuring the stabilization of the plasma state.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54125091A JPS5927213B2 (en) | 1979-09-27 | 1979-09-27 | plasma reactor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54125091A JPS5927213B2 (en) | 1979-09-27 | 1979-09-27 | plasma reactor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5648238A true JPS5648238A (en) | 1981-05-01 |
JPS5927213B2 JPS5927213B2 (en) | 1984-07-04 |
Family
ID=14901614
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP54125091A Expired JPS5927213B2 (en) | 1979-09-27 | 1979-09-27 | plasma reactor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5927213B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5756036A (en) * | 1980-09-20 | 1982-04-03 | Mitsubishi Electric Corp | Plasma chemical vapor phase reactor |
-
1979
- 1979-09-27 JP JP54125091A patent/JPS5927213B2/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5756036A (en) * | 1980-09-20 | 1982-04-03 | Mitsubishi Electric Corp | Plasma chemical vapor phase reactor |
JPS6329583B2 (en) * | 1980-09-20 | 1988-06-14 | Mitsubishi Electric Corp |
Also Published As
Publication number | Publication date |
---|---|
JPS5927213B2 (en) | 1984-07-04 |
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