JPS5648238A - Plasma reaction device - Google Patents

Plasma reaction device

Info

Publication number
JPS5648238A
JPS5648238A JP12509179A JP12509179A JPS5648238A JP S5648238 A JPS5648238 A JP S5648238A JP 12509179 A JP12509179 A JP 12509179A JP 12509179 A JP12509179 A JP 12509179A JP S5648238 A JPS5648238 A JP S5648238A
Authority
JP
Japan
Prior art keywords
plasma
tank
electrodes
frequency
magnetic field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12509179A
Other languages
Japanese (ja)
Other versions
JPS5927213B2 (en
Inventor
Haruhiko Abe
Hiroji Harada
Masahiro Yoneda
Natsuo Tsubouchi
Yoshikazu Obayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP54125091A priority Critical patent/JPS5927213B2/en
Publication of JPS5648238A publication Critical patent/JPS5648238A/en
Publication of JPS5927213B2 publication Critical patent/JPS5927213B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To secure the stabilization for the plasma state between the opposing parallel flat plate type high-frequency electrodes within a vaccum tank by the effect of application of the magnetic field, by incorporating the magnetic field generating component to the above-mentioned electrodes.
CONSTITUTION: The permanent magnet 9 is buried into the area corresponding to the material 5 to be etched in the opposing metal electrodes 1 and 2 within the vaccum tank 3. The evacuation is given to the inside the tank 3 to secure a prescribed level of evacuation by actuating the evacuation system 8, and then a prescribed level of pressure is kept inside the tank 3 by introducing the gas coinciding with the material 5 such as the C3F6 gas in the case of the silicon oxide film. After this, the high-frequency power source 4 is actuated, and the high-frequency electric power of a prescribed frequency is applied between the electrodes 1 and 2 to produce the plasma 6. As the static magnetic field 10 exists owing to the magnet 9 and in the vertical direction to the surface of electrode, the discharge starting voltage is reduced relatively in case when the inter-electrode discharge is produced. Thus the generation of plasma can be facilitated. Furthermore, the direction of motion is controlled for the electron or the ion in the plasma by magnetic line of force, thus ensuring the stabilization of the plasma state.
COPYRIGHT: (C)1981,JPO&Japio
JP54125091A 1979-09-27 1979-09-27 plasma reactor Expired JPS5927213B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54125091A JPS5927213B2 (en) 1979-09-27 1979-09-27 plasma reactor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54125091A JPS5927213B2 (en) 1979-09-27 1979-09-27 plasma reactor

Publications (2)

Publication Number Publication Date
JPS5648238A true JPS5648238A (en) 1981-05-01
JPS5927213B2 JPS5927213B2 (en) 1984-07-04

Family

ID=14901614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54125091A Expired JPS5927213B2 (en) 1979-09-27 1979-09-27 plasma reactor

Country Status (1)

Country Link
JP (1) JPS5927213B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5756036A (en) * 1980-09-20 1982-04-03 Mitsubishi Electric Corp Plasma chemical vapor phase reactor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5756036A (en) * 1980-09-20 1982-04-03 Mitsubishi Electric Corp Plasma chemical vapor phase reactor
JPS6329583B2 (en) * 1980-09-20 1988-06-14 Mitsubishi Electric Corp

Also Published As

Publication number Publication date
JPS5927213B2 (en) 1984-07-04

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