JPS5647117A - Surface elastic wave filter element - Google Patents

Surface elastic wave filter element

Info

Publication number
JPS5647117A
JPS5647117A JP12315079A JP12315079A JPS5647117A JP S5647117 A JPS5647117 A JP S5647117A JP 12315079 A JP12315079 A JP 12315079A JP 12315079 A JP12315079 A JP 12315079A JP S5647117 A JPS5647117 A JP S5647117A
Authority
JP
Japan
Prior art keywords
sio2 film
electrode
filter element
wave filter
elastic wave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12315079A
Other languages
Japanese (ja)
Inventor
Takuji Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP12315079A priority Critical patent/JPS5647117A/en
Publication of JPS5647117A publication Critical patent/JPS5647117A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves

Abstract

PURPOSE:To prevent electrodes from becomining narrow due to overetching, etc., by forming an SiO2 film at a part on a piezoelectric substrate other than parts where an input electrode and output electrode are formed. CONSTITUTION:On piezoelectric chip 11, SiO2 film 12 is formed to a thickness of 1,000-10,000Angstrom . Next, it is etched to remove the SiO2 film on the chip where an input electrode and output electrode are to be formed while leaving SiO2 film 13 that corresponds to the other part. On this chip, aluminum 14 is vapor-deposited and then etched to remove the part other than input electrode 15 and output electrode 16, forming input and output electrodes.
JP12315079A 1979-09-27 1979-09-27 Surface elastic wave filter element Pending JPS5647117A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12315079A JPS5647117A (en) 1979-09-27 1979-09-27 Surface elastic wave filter element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12315079A JPS5647117A (en) 1979-09-27 1979-09-27 Surface elastic wave filter element

Publications (1)

Publication Number Publication Date
JPS5647117A true JPS5647117A (en) 1981-04-28

Family

ID=14853416

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12315079A Pending JPS5647117A (en) 1979-09-27 1979-09-27 Surface elastic wave filter element

Country Status (1)

Country Link
JP (1) JPS5647117A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60144287A (en) * 1983-12-28 1985-07-30 株式会社コシハラ Overload controller for elevator
JPH01285593A (en) * 1988-05-13 1989-11-16 Kato Works Co Ltd Operating device with display means of safety degree for crane or the like
US5645181A (en) * 1992-02-12 1997-07-08 Kato Works Co., Ltd. Method for detecting a crane hook lifting distance
US5730305A (en) * 1988-12-27 1998-03-24 Kato Works Co., Ltd. Crane safety apparatus
WO2010100967A1 (en) * 2009-03-02 2010-09-10 株式会社村田製作所 Surface acoustic wave device
JP2014192676A (en) * 2013-03-27 2014-10-06 Panasonic Corp Acoustic wave element

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60144287A (en) * 1983-12-28 1985-07-30 株式会社コシハラ Overload controller for elevator
JPH01285593A (en) * 1988-05-13 1989-11-16 Kato Works Co Ltd Operating device with display means of safety degree for crane or the like
US5730305A (en) * 1988-12-27 1998-03-24 Kato Works Co., Ltd. Crane safety apparatus
US5645181A (en) * 1992-02-12 1997-07-08 Kato Works Co., Ltd. Method for detecting a crane hook lifting distance
WO2010100967A1 (en) * 2009-03-02 2010-09-10 株式会社村田製作所 Surface acoustic wave device
JP5321678B2 (en) * 2009-03-02 2013-10-23 株式会社村田製作所 Surface acoustic wave device
JP2014192676A (en) * 2013-03-27 2014-10-06 Panasonic Corp Acoustic wave element

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