JPS5643758A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5643758A JPS5643758A JP11901079A JP11901079A JPS5643758A JP S5643758 A JPS5643758 A JP S5643758A JP 11901079 A JP11901079 A JP 11901079A JP 11901079 A JP11901079 A JP 11901079A JP S5643758 A JPS5643758 A JP S5643758A
- Authority
- JP
- Japan
- Prior art keywords
- heating elements
- elements
- thin
- film
- fusible body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 5
- 238000010438 heat treatment Methods 0.000 abstract 7
- 239000010409 thin film Substances 0.000 abstract 6
- 238000002844 melting Methods 0.000 abstract 2
- 230000008018 melting Effects 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- 239000010408 film Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 1
- 229910052814 silicon oxide Inorganic materials 0.000 abstract 1
- 239000011800 void material Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Read Only Memory (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
Abstract
PURPOSE:To cut a fusible body at a low temperature and with little currents by a method wherein two heating elements and the low melting point metallic thin-film fusible body between the elements are formed on a semiconductor substrate, and the fusible body is fused by the generation of heat of the heating elements. CONSTITUTION:The heating elements 3, 3' consisting of thin-films such as polycrystalline silicon thin-films are formed on the semiconductor substrate 1 through a silicon oxide film 2, holding a minute void. The fusible body 4 of low melting point metallic thin-film being composed of the thin-film such as an Al thin-film is made up between the heating elements 3, 3'. The heating elements are under conductive condition as they are, and when needing change-over currents greater than normal operation are flowed between the heating elements 3, 3', the soluble body 4 is fused and the elements are brought to opened conditions. This semiconductor device is used for an MOSRAM and a PROM which can be changed over with elements which faulty elements in the semiconductor device are excessively formed. Thus, the soluble body can be cut with little currents because the heating elements are built in.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11901079A JPS5643758A (en) | 1979-09-17 | 1979-09-17 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11901079A JPS5643758A (en) | 1979-09-17 | 1979-09-17 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5643758A true JPS5643758A (en) | 1981-04-22 |
Family
ID=14750748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11901079A Pending JPS5643758A (en) | 1979-09-17 | 1979-09-17 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5643758A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57139958A (en) * | 1981-02-23 | 1982-08-30 | Seiko Instr & Electronics Ltd | Fuse type non-volatile memory |
JPS58167A (en) * | 1981-06-25 | 1983-01-05 | Fujitsu Ltd | Semiconductor device |
JPS58158099A (en) * | 1982-03-15 | 1983-09-20 | Nippon Telegr & Teleph Corp <Ntt> | Programmable read-only memory |
JP2008060564A (en) * | 2006-08-17 | 2008-03-13 | Toshiba Corp | Electric fuse employing resistor materials of different thermal stabilities |
-
1979
- 1979-09-17 JP JP11901079A patent/JPS5643758A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57139958A (en) * | 1981-02-23 | 1982-08-30 | Seiko Instr & Electronics Ltd | Fuse type non-volatile memory |
JPS58167A (en) * | 1981-06-25 | 1983-01-05 | Fujitsu Ltd | Semiconductor device |
JPH0332229B2 (en) * | 1981-06-25 | 1991-05-10 | Fujitsu Ltd | |
JPS58158099A (en) * | 1982-03-15 | 1983-09-20 | Nippon Telegr & Teleph Corp <Ntt> | Programmable read-only memory |
JP2008060564A (en) * | 2006-08-17 | 2008-03-13 | Toshiba Corp | Electric fuse employing resistor materials of different thermal stabilities |
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