JPS5643639A - Photographic etching method - Google Patents
Photographic etching methodInfo
- Publication number
- JPS5643639A JPS5643639A JP11968179A JP11968179A JPS5643639A JP S5643639 A JPS5643639 A JP S5643639A JP 11968179 A JP11968179 A JP 11968179A JP 11968179 A JP11968179 A JP 11968179A JP S5643639 A JPS5643639 A JP S5643639A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- pattern
- postbaking
- width
- photosensitive resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11968179A JPS5643639A (en) | 1979-09-17 | 1979-09-17 | Photographic etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11968179A JPS5643639A (en) | 1979-09-17 | 1979-09-17 | Photographic etching method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5643639A true JPS5643639A (en) | 1981-04-22 |
Family
ID=14767407
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11968179A Pending JPS5643639A (en) | 1979-09-17 | 1979-09-17 | Photographic etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5643639A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7799515B2 (en) | 2002-04-04 | 2010-09-21 | Semiconductor Energy Laboratory Co., Ltd. | Method of fabricating semiconductor device, and developing apparatus using the method |
-
1979
- 1979-09-17 JP JP11968179A patent/JPS5643639A/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7799515B2 (en) | 2002-04-04 | 2010-09-21 | Semiconductor Energy Laboratory Co., Ltd. | Method of fabricating semiconductor device, and developing apparatus using the method |
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