JPS5642205A - Focus detecting method - Google Patents

Focus detecting method

Info

Publication number
JPS5642205A
JPS5642205A JP11784479A JP11784479A JPS5642205A JP S5642205 A JPS5642205 A JP S5642205A JP 11784479 A JP11784479 A JP 11784479A JP 11784479 A JP11784479 A JP 11784479A JP S5642205 A JPS5642205 A JP S5642205A
Authority
JP
Japan
Prior art keywords
light
slit
detected
image
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11784479A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0141962B2 (cs
Inventor
Toshio Matsuura
Kyoichi Suwa
Shoichi Tanimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd, Nippon Kogaku KK filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP11784479A priority Critical patent/JPS5642205A/ja
Publication of JPS5642205A publication Critical patent/JPS5642205A/ja
Publication of JPH0141962B2 publication Critical patent/JPH0141962B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Automatic Focus Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11784479A 1979-09-17 1979-09-17 Focus detecting method Granted JPS5642205A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11784479A JPS5642205A (en) 1979-09-17 1979-09-17 Focus detecting method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11784479A JPS5642205A (en) 1979-09-17 1979-09-17 Focus detecting method

Publications (2)

Publication Number Publication Date
JPS5642205A true JPS5642205A (en) 1981-04-20
JPH0141962B2 JPH0141962B2 (cs) 1989-09-08

Family

ID=14721663

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11784479A Granted JPS5642205A (en) 1979-09-17 1979-09-17 Focus detecting method

Country Status (1)

Country Link
JP (1) JPS5642205A (cs)

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4650983A (en) * 1983-11-07 1987-03-17 Nippon Kogaku K. K. Focusing apparatus for projection optical system
US4687322A (en) * 1985-02-12 1987-08-18 Nippon Kogaku K. K. Projection optical apparatus
US4701606A (en) * 1984-11-01 1987-10-20 Nippon Kogaku K.K. Projection optical apparatus
JPS62299716A (ja) * 1986-06-19 1987-12-26 Nikon Corp 表面変位検出装置
US4748333A (en) * 1986-03-31 1988-05-31 Nippon Kogaku K. K. Surface displacement sensor with opening angle control
US4849901A (en) * 1985-06-14 1989-07-18 Nikon Corporation Substrate exposure apparatus with flatness detection and alarm
US4864123A (en) * 1987-05-08 1989-09-05 Nikon Corporation Apparatus for detecting the level of an object surface
JPH04196515A (ja) * 1990-11-28 1992-07-16 Matsushita Electric Ind Co Ltd 合焦装置
US5162642A (en) * 1985-11-18 1992-11-10 Canon Kabushiki Kaisha Device for detecting the position of a surface
US5488230A (en) * 1992-07-15 1996-01-30 Nikon Corporation Double-beam light source apparatus, position detecting apparatus and aligning apparatus
US5559582A (en) * 1992-08-28 1996-09-24 Nikon Corporation Exposure apparatus
US5587794A (en) * 1990-12-13 1996-12-24 Nikon Corporation Surface position detection apparatus
US5602399A (en) * 1993-06-23 1997-02-11 Nikon Corporation Surface position detecting apparatus and method
US6034780A (en) * 1997-03-28 2000-03-07 Nikon Corporation Surface position detection apparatus and method
JP2002194302A (ja) * 2000-12-27 2002-07-10 Nitto Denko Corp 粘着剤式鑑識用シート
US6768124B2 (en) 1999-10-19 2004-07-27 Nikon Corporation Reticle-focus detector, and charged-particle-beam microlithography apparatus and methods comprising same
US6897462B2 (en) 2000-04-12 2005-05-24 Nikon Corporation Surface position detection device and exposure apparatus and exposure method achieved by utilizing detection device
JP2007181599A (ja) * 2006-01-10 2007-07-19 Nitto Denko Corp 鑑識用粘着シート
JP2007181526A (ja) * 2006-01-05 2007-07-19 Nitto Denko Corp 鑑識用粘着シートおよびその製造方法、ならびに痕跡採取方法
CN103365099A (zh) * 2012-03-31 2013-10-23 上海微电子装备有限公司 一种调焦调平信号处理方法
CN109426093A (zh) * 2017-08-31 2019-03-05 上海微电子装备（集团）股份有限公司 一种调焦调平检测装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51131648A (en) * 1975-05-13 1976-11-16 Seiko Instr & Electronics Ltd Optical height measuring apparatus
JPS522547A (en) * 1975-06-24 1977-01-10 Toshiba Corp Optical method to measure displacement of plane
JPS5232324A (en) * 1975-09-08 1977-03-11 Nippon Kogaku Kk <Nikon> Photoelectric detecting device for in or out of focus in the optical s ystem
JPS5267323A (en) * 1975-12-02 1977-06-03 Nippon Chemical Ind Device for photoelectrically detecting propriety of focus in optical system
JPS5347181A (en) * 1976-10-12 1978-04-27 Borisobuichi Aizenberug Yurian Illuminating device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51131648A (en) * 1975-05-13 1976-11-16 Seiko Instr & Electronics Ltd Optical height measuring apparatus
JPS522547A (en) * 1975-06-24 1977-01-10 Toshiba Corp Optical method to measure displacement of plane
JPS5232324A (en) * 1975-09-08 1977-03-11 Nippon Kogaku Kk <Nikon> Photoelectric detecting device for in or out of focus in the optical s ystem
JPS5267323A (en) * 1975-12-02 1977-06-03 Nippon Chemical Ind Device for photoelectrically detecting propriety of focus in optical system
JPS5347181A (en) * 1976-10-12 1978-04-27 Borisobuichi Aizenberug Yurian Illuminating device

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4650983A (en) * 1983-11-07 1987-03-17 Nippon Kogaku K. K. Focusing apparatus for projection optical system
US4701606A (en) * 1984-11-01 1987-10-20 Nippon Kogaku K.K. Projection optical apparatus
US4687322A (en) * 1985-02-12 1987-08-18 Nippon Kogaku K. K. Projection optical apparatus
US4849901A (en) * 1985-06-14 1989-07-18 Nikon Corporation Substrate exposure apparatus with flatness detection and alarm
US5162642A (en) * 1985-11-18 1992-11-10 Canon Kabushiki Kaisha Device for detecting the position of a surface
US4748333A (en) * 1986-03-31 1988-05-31 Nippon Kogaku K. K. Surface displacement sensor with opening angle control
JPS62299716A (ja) * 1986-06-19 1987-12-26 Nikon Corp 表面変位検出装置
US4864123A (en) * 1987-05-08 1989-09-05 Nikon Corporation Apparatus for detecting the level of an object surface
JPH04196515A (ja) * 1990-11-28 1992-07-16 Matsushita Electric Ind Co Ltd 合焦装置
US5801835A (en) * 1990-12-13 1998-09-01 Nikon Corporation Surface position detection apparatus and method
US5587794A (en) * 1990-12-13 1996-12-24 Nikon Corporation Surface position detection apparatus
US5488230A (en) * 1992-07-15 1996-01-30 Nikon Corporation Double-beam light source apparatus, position detecting apparatus and aligning apparatus
US5559582A (en) * 1992-08-28 1996-09-24 Nikon Corporation Exposure apparatus
US5602399A (en) * 1993-06-23 1997-02-11 Nikon Corporation Surface position detecting apparatus and method
US6034780A (en) * 1997-03-28 2000-03-07 Nikon Corporation Surface position detection apparatus and method
US6768124B2 (en) 1999-10-19 2004-07-27 Nikon Corporation Reticle-focus detector, and charged-particle-beam microlithography apparatus and methods comprising same
US6897462B2 (en) 2000-04-12 2005-05-24 Nikon Corporation Surface position detection device and exposure apparatus and exposure method achieved by utilizing detection device
JP2002194302A (ja) * 2000-12-27 2002-07-10 Nitto Denko Corp 粘着剤式鑑識用シート
JP2007181526A (ja) * 2006-01-05 2007-07-19 Nitto Denko Corp 鑑識用粘着シートおよびその製造方法、ならびに痕跡採取方法
JP2007181599A (ja) * 2006-01-10 2007-07-19 Nitto Denko Corp 鑑識用粘着シート
CN103365099A (zh) * 2012-03-31 2013-10-23 上海微电子装备有限公司 一种调焦调平信号处理方法
CN109426093A (zh) * 2017-08-31 2019-03-05 上海微电子装备（集团）股份有限公司 一种调焦调平检测装置

Also Published As

Publication number Publication date
JPH0141962B2 (cs) 1989-09-08

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