JPS5638820A - Dry etching device - Google Patents

Dry etching device

Info

Publication number
JPS5638820A
JPS5638820A JP11500179A JP11500179A JPS5638820A JP S5638820 A JPS5638820 A JP S5638820A JP 11500179 A JP11500179 A JP 11500179A JP 11500179 A JP11500179 A JP 11500179A JP S5638820 A JPS5638820 A JP S5638820A
Authority
JP
Japan
Prior art keywords
cathode
anode
sample
dry etching
etching device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11500179A
Other languages
Japanese (ja)
Inventor
Tetsuya Ogawa
Gensuke Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11500179A priority Critical patent/JPS5638820A/en
Publication of JPS5638820A publication Critical patent/JPS5638820A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To obtain a high etching speed of a parallel flat plate type dry etching device without damaging a sample by a method wherein an intermediate pole body having a magnetic field generating mechanism being insulated electrically is arranged between the cathode and the anode. CONSTITUTION:An intermediate electrode 8 having a magnetic field generating mechanism is arranged between the cathode and the anode of a parallel flat plate type dry etching device consisting of a cathode 2 being put on with a sample 4, an anode 3 and a bell jar 1. By this way, as plasma is confined between the intermediate electrode 8 and the cathode 2, and as the high frequency electric power can be enlarged keeping the self bias of the cathode 2 at small that the etching can be performed in a high etching speed without damaging the surface of sample. In the bell jar, an active gas (CF4, C2F6, etc.) or an inert gas (Ar, Xe, etc.) is sealed.
JP11500179A 1979-09-07 1979-09-07 Dry etching device Pending JPS5638820A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11500179A JPS5638820A (en) 1979-09-07 1979-09-07 Dry etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11500179A JPS5638820A (en) 1979-09-07 1979-09-07 Dry etching device

Publications (1)

Publication Number Publication Date
JPS5638820A true JPS5638820A (en) 1981-04-14

Family

ID=14651833

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11500179A Pending JPS5638820A (en) 1979-09-07 1979-09-07 Dry etching device

Country Status (1)

Country Link
JP (1) JPS5638820A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59139627A (en) * 1983-01-31 1984-08-10 Hitachi Ltd Dry etching device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59139627A (en) * 1983-01-31 1984-08-10 Hitachi Ltd Dry etching device

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