JPS5637643A - Manufacturing of semiconductor integrated circuit - Google Patents

Manufacturing of semiconductor integrated circuit

Info

Publication number
JPS5637643A
JPS5637643A JP11279079A JP11279079A JPS5637643A JP S5637643 A JPS5637643 A JP S5637643A JP 11279079 A JP11279079 A JP 11279079A JP 11279079 A JP11279079 A JP 11279079A JP S5637643 A JPS5637643 A JP S5637643A
Authority
JP
Japan
Prior art keywords
layer
sio2
si3n4
psg
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11279079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6257108B2 (enrdf_load_stackoverflow
Inventor
Koji Kozuka
Hisayuki Higuchi
Masao Kawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11279079A priority Critical patent/JPS5637643A/ja
Publication of JPS5637643A publication Critical patent/JPS5637643A/ja
Publication of JPS6257108B2 publication Critical patent/JPS6257108B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/762Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)
  • Local Oxidation Of Silicon (AREA)
JP11279079A 1979-09-05 1979-09-05 Manufacturing of semiconductor integrated circuit Granted JPS5637643A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11279079A JPS5637643A (en) 1979-09-05 1979-09-05 Manufacturing of semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11279079A JPS5637643A (en) 1979-09-05 1979-09-05 Manufacturing of semiconductor integrated circuit

Publications (2)

Publication Number Publication Date
JPS5637643A true JPS5637643A (en) 1981-04-11
JPS6257108B2 JPS6257108B2 (enrdf_load_stackoverflow) 1987-11-30

Family

ID=14595574

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11279079A Granted JPS5637643A (en) 1979-09-05 1979-09-05 Manufacturing of semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPS5637643A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5843572A (ja) * 1981-09-09 1983-03-14 Nec Corp 半導体装置の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5843572A (ja) * 1981-09-09 1983-03-14 Nec Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS6257108B2 (enrdf_load_stackoverflow) 1987-11-30

Similar Documents

Publication Publication Date Title
US3685140A (en) Short channel field-effect transistors
JPS5637643A (en) Manufacturing of semiconductor integrated circuit
JPS5642367A (en) Manufacture of bipolar integrated circuit
JPS54154967A (en) Semiconductor electronic device
JPS56129337A (en) Insulative separation structure for semiconductor monolithic integrated circuit
JPS5799752A (en) Manufacture of semiconductor integrated circuit device
JPS55165649A (en) Manufacture of semiconductor device
JPS5447493A (en) Semiconductor integrated circuit device and production of the same
JPS54123878A (en) Manufacture for semiconductor device
JPS5678139A (en) Manufacture of semiconductor integrated circuit
JPS553686A (en) Preparation of semiconductor device
JPS55108772A (en) Semiconductor integrated circuit device
JPS55125645A (en) Production of semiconductor device
JPS57176769A (en) Semiconductor device and manufacture thereof
JPS5637646A (en) Manufacturing of semiconductor device
JPS572545A (en) Manufacture of semiconductor device
JPS5779641A (en) Manufacture of semiconductor device
JPS5562750A (en) Semiconductor integrated circuit device
JPS56129342A (en) Semiconductor integrated circuit device
JPS54137983A (en) Manufacture of mos semiconductor device
JPS567447A (en) Manufacture of semiconductor device
JPS5619669A (en) Semiconductor device and manufacture thereof
JPS5760855A (en) Manufacture of semiconductor device
JPS5693316A (en) Manufacture of semiconductor device
JPS5799781A (en) Manufacture of semiconductor device