JPS5637636A - Semiconductor device with bump - Google Patents
Semiconductor device with bumpInfo
- Publication number
- JPS5637636A JPS5637636A JP11392479A JP11392479A JPS5637636A JP S5637636 A JPS5637636 A JP S5637636A JP 11392479 A JP11392479 A JP 11392479A JP 11392479 A JP11392479 A JP 11392479A JP S5637636 A JPS5637636 A JP S5637636A
- Authority
- JP
- Japan
- Prior art keywords
- bump
- protection film
- semiconductor device
- oxide films
- positive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Formation Of Insulating Films (AREA)
Abstract
PURPOSE:To include a protection film and to surely protect an internal wiring by coating all the parts except a bump section with positive oxide films. CONSTITUTION:An Al wiring 14a on an Si substrate 12 is covered with a protection film 16 and a window is opened. Ta 20 and Cu 22 are stacked on the protection film 16 and an Au bump 26 is formed by Au plating after applying resist masks 24 to the Cu 22. Next, the resists 24 are removed and after removing the Cu 22 by etching, positive formation is made to the exposed surface of the Ta 20 by using an aqueous solution of oxidalic acid and oxide films 20a are made. In this composition, a high reliability semiconductor device with a bump will be obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11392479A JPS5637636A (en) | 1979-09-05 | 1979-09-05 | Semiconductor device with bump |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11392479A JPS5637636A (en) | 1979-09-05 | 1979-09-05 | Semiconductor device with bump |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5637636A true JPS5637636A (en) | 1981-04-11 |
Family
ID=14624595
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11392479A Pending JPS5637636A (en) | 1979-09-05 | 1979-09-05 | Semiconductor device with bump |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5637636A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5266519A (en) * | 1991-11-12 | 1993-11-30 | Nec Corporation | Method for forming a metal conductor in semiconductor device |
-
1979
- 1979-09-05 JP JP11392479A patent/JPS5637636A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5266519A (en) * | 1991-11-12 | 1993-11-30 | Nec Corporation | Method for forming a metal conductor in semiconductor device |
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