JPS5630630A - Foreign matter detector - Google Patents

Foreign matter detector

Info

Publication number
JPS5630630A
JPS5630630A JP10661079A JP10661079A JPS5630630A JP S5630630 A JPS5630630 A JP S5630630A JP 10661079 A JP10661079 A JP 10661079A JP 10661079 A JP10661079 A JP 10661079A JP S5630630 A JPS5630630 A JP S5630630A
Authority
JP
Japan
Prior art keywords
laser light
wafer
light
foreign matter
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10661079A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0228803B2 (enrdf_load_stackoverflow
Inventor
Nobuyuki Akiyama
Yoshimasa Oshima
Mitsuyoshi Koizumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10661079A priority Critical patent/JPS5630630A/ja
Publication of JPS5630630A publication Critical patent/JPS5630630A/ja
Publication of JPH0228803B2 publication Critical patent/JPH0228803B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP10661079A 1979-08-23 1979-08-23 Foreign matter detector Granted JPS5630630A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10661079A JPS5630630A (en) 1979-08-23 1979-08-23 Foreign matter detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10661079A JPS5630630A (en) 1979-08-23 1979-08-23 Foreign matter detector

Publications (2)

Publication Number Publication Date
JPS5630630A true JPS5630630A (en) 1981-03-27
JPH0228803B2 JPH0228803B2 (enrdf_load_stackoverflow) 1990-06-26

Family

ID=14437878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10661079A Granted JPS5630630A (en) 1979-08-23 1979-08-23 Foreign matter detector

Country Status (1)

Country Link
JP (1) JPS5630630A (enrdf_load_stackoverflow)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58130256U (ja) * 1982-02-25 1983-09-02 日本電気ホームエレクトロニクス株式会社 ペレツト外観検査装置
JPS61117433A (ja) * 1984-11-14 1986-06-04 Hitachi Ltd 半導体ウェハ異物検出方法及びその装置
JPS61162738A (ja) * 1985-01-11 1986-07-23 Hitachi Ltd 異物検査方法
JPS61253448A (ja) * 1985-05-07 1986-11-11 Hitachi Ltd 異物検査装置
JPS6269150A (ja) * 1985-09-24 1987-03-30 Hitachi Electronics Eng Co Ltd ウエハ異物検査装置
JPS6326559A (ja) * 1986-07-21 1988-02-04 Hitachi Ltd 異物検査方法
JPS63241343A (ja) * 1988-02-24 1988-10-06 Nikon Corp 欠陥検査装置
US5134962A (en) * 1989-09-29 1992-08-04 Hitachi, Ltd. Spin coating apparatus
JPH0650903A (ja) * 1992-06-11 1994-02-25 Internatl Business Mach Corp <Ibm> 表面粒子検出装置及び方法
JP2001512237A (ja) * 1997-08-01 2001-08-21 ケーエルエー−テンカー コーポレイション 表面の異常および／または特徴を検出するためのシステム
US6366690B1 (en) 1998-07-07 2002-04-02 Applied Materials, Inc. Pixel based machine for patterned wafers
JP2012533756A (ja) * 2009-07-22 2012-12-27 ケーエルエー−テンカー・コーポレーション リング状照射を備える暗視野検査システム

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50137784A (enrdf_load_stackoverflow) * 1974-04-20 1975-11-01

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50137784A (enrdf_load_stackoverflow) * 1974-04-20 1975-11-01

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58130256U (ja) * 1982-02-25 1983-09-02 日本電気ホームエレクトロニクス株式会社 ペレツト外観検査装置
JPS61117433A (ja) * 1984-11-14 1986-06-04 Hitachi Ltd 半導体ウェハ異物検出方法及びその装置
JPS61162738A (ja) * 1985-01-11 1986-07-23 Hitachi Ltd 異物検査方法
JPS61253448A (ja) * 1985-05-07 1986-11-11 Hitachi Ltd 異物検査装置
JPS6269150A (ja) * 1985-09-24 1987-03-30 Hitachi Electronics Eng Co Ltd ウエハ異物検査装置
JPS6326559A (ja) * 1986-07-21 1988-02-04 Hitachi Ltd 異物検査方法
JPS63241343A (ja) * 1988-02-24 1988-10-06 Nikon Corp 欠陥検査装置
US5134962A (en) * 1989-09-29 1992-08-04 Hitachi, Ltd. Spin coating apparatus
JPH0650903A (ja) * 1992-06-11 1994-02-25 Internatl Business Mach Corp <Ibm> 表面粒子検出装置及び方法
JP2001512237A (ja) * 1997-08-01 2001-08-21 ケーエルエー−テンカー コーポレイション 表面の異常および／または特徴を検出するためのシステム
US7869023B2 (en) 1997-08-01 2011-01-11 Kla-Tencor Corporation System for detecting anomalies and/or features of a surface
US6366690B1 (en) 1998-07-07 2002-04-02 Applied Materials, Inc. Pixel based machine for patterned wafers
US6810139B2 (en) 1998-07-07 2004-10-26 Applied Materials, Inc. Pixel based machine for patterned wafers
US7016526B2 (en) 1998-07-07 2006-03-21 Applied Materials, Inc. Pixel based machine for patterned wafers
US7454052B2 (en) 1998-07-07 2008-11-18 Applied Materials, Inc. Pixel based machine for patterned wafers
JP2012533756A (ja) * 2009-07-22 2012-12-27 ケーエルエー−テンカー・コーポレーション リング状照射を備える暗視野検査システム
US9176072B2 (en) 2009-07-22 2015-11-03 Kla-Tencor Corporation Dark field inspection system with ring illumination

Also Published As

Publication number Publication date
JPH0228803B2 (enrdf_load_stackoverflow) 1990-06-26

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