JPS5619856A - Electron-ray device - Google Patents

Electron-ray device

Info

Publication number
JPS5619856A
JPS5619856A JP9373779A JP9373779A JPS5619856A JP S5619856 A JPS5619856 A JP S5619856A JP 9373779 A JP9373779 A JP 9373779A JP 9373779 A JP9373779 A JP 9373779A JP S5619856 A JPS5619856 A JP S5619856A
Authority
JP
Japan
Prior art keywords
electron rays
diaphragm
electron
diaphragms
interrupted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9373779A
Other languages
Japanese (ja)
Other versions
JPS5935501B2 (en
Inventor
Genya Matsuoka
Akira Yanagisawa
Susumu Ozasa
Tsutomu Komoda
Shigeru Moriya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP9373779A priority Critical patent/JPS5935501B2/en
Publication of JPS5619856A publication Critical patent/JPS5619856A/en
Publication of JPS5935501B2 publication Critical patent/JPS5935501B2/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To prevent the change in the position of electron rays due to charge by confining electron rays interrupted into between two diaphragms. CONSTITUTION:Electron rays interrupted and reflected at the diaphragm 10 by the diaphragm 11 is confined into a very small space between the diaphragms 10 and 11, and an area to be stained by electron rays is narrowed by irradiating electron rays to only a few part of the inner wall 9 of the pathway of electron rays; that is, the electron rays 4 pass through the diaphragm 10 and irradiate onto the sample 8 when the voltage of the electrode 6 is OV. When applying a voltage to the electrode 6, the electron rays are interrupted by the diaphragm 10 and then confined into between the diaphragms 10 and 11.
JP9373779A 1979-07-25 1979-07-25 electron beam equipment Expired JPS5935501B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9373779A JPS5935501B2 (en) 1979-07-25 1979-07-25 electron beam equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9373779A JPS5935501B2 (en) 1979-07-25 1979-07-25 electron beam equipment

Publications (2)

Publication Number Publication Date
JPS5619856A true JPS5619856A (en) 1981-02-24
JPS5935501B2 JPS5935501B2 (en) 1984-08-29

Family

ID=14090714

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9373779A Expired JPS5935501B2 (en) 1979-07-25 1979-07-25 electron beam equipment

Country Status (1)

Country Link
JP (1) JPS5935501B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57152128A (en) * 1981-03-13 1982-09-20 Hitachi Ltd Electron beam drawing device
JPH01100919A (en) * 1987-10-14 1989-04-19 Mitsubishi Electric Corp Electron beam lithography apparatus
WO2000016370A1 (en) * 1998-09-16 2000-03-23 Leica Microsystems Lithography Ltd. Electron beam aperture element with beam shielding
JP2006210457A (en) * 2005-01-26 2006-08-10 Canon Inc Charged beam exposure device
JP2017135046A (en) * 2016-01-29 2017-08-03 株式会社荏原製作所 Inspection apparatus
WO2021180496A1 (en) * 2020-03-09 2021-09-16 Asml Netherlands B.V. Aperture body, flood column and charged particle tool

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57152128A (en) * 1981-03-13 1982-09-20 Hitachi Ltd Electron beam drawing device
JPH01100919A (en) * 1987-10-14 1989-04-19 Mitsubishi Electric Corp Electron beam lithography apparatus
WO2000016370A1 (en) * 1998-09-16 2000-03-23 Leica Microsystems Lithography Ltd. Electron beam aperture element with beam shielding
JP2002525800A (en) * 1998-09-16 2002-08-13 ライカ マイクロシステムズ リトグラフィー リミテッド Electron beam aperture element with beam shield
JP2006210457A (en) * 2005-01-26 2006-08-10 Canon Inc Charged beam exposure device
JP4634161B2 (en) * 2005-01-26 2011-02-16 キヤノン株式会社 Charged beam exposure apparatus and device manufacturing method
JP2017135046A (en) * 2016-01-29 2017-08-03 株式会社荏原製作所 Inspection apparatus
WO2021180496A1 (en) * 2020-03-09 2021-09-16 Asml Netherlands B.V. Aperture body, flood column and charged particle tool

Also Published As

Publication number Publication date
JPS5935501B2 (en) 1984-08-29

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