JPS53100979A - Sputtering apparatus - Google Patents
Sputtering apparatusInfo
- Publication number
- JPS53100979A JPS53100979A JP1643877A JP1643877A JPS53100979A JP S53100979 A JPS53100979 A JP S53100979A JP 1643877 A JP1643877 A JP 1643877A JP 1643877 A JP1643877 A JP 1643877A JP S53100979 A JPS53100979 A JP S53100979A
- Authority
- JP
- Japan
- Prior art keywords
- sputtering apparatus
- cylinder
- sputtering
- electrode material
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/046—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:Sputtering apparatus, being able to coat the film of what kind of material composed of inorganic or organic substances, by inserting cylindrical electrode into gas cylinder and sputtering the electrode material by generating glow discharge in the cylinder and then, coating the electrode material on the inner wall of the cylinder.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1643877A JPS53100979A (en) | 1977-02-16 | 1977-02-16 | Sputtering apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1643877A JPS53100979A (en) | 1977-02-16 | 1977-02-16 | Sputtering apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53100979A true JPS53100979A (en) | 1978-09-02 |
Family
ID=11916226
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1643877A Pending JPS53100979A (en) | 1977-02-16 | 1977-02-16 | Sputtering apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53100979A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003008664A3 (en) * | 2001-07-17 | 2003-06-05 | Air Liquide | Method of making a passivated surface |
US8500973B2 (en) * | 2004-08-20 | 2013-08-06 | Jds Uniphase Corporation | Anode for sputter coating |
-
1977
- 1977-02-16 JP JP1643877A patent/JPS53100979A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003008664A3 (en) * | 2001-07-17 | 2003-06-05 | Air Liquide | Method of making a passivated surface |
US8500973B2 (en) * | 2004-08-20 | 2013-08-06 | Jds Uniphase Corporation | Anode for sputter coating |
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