JPS53100979A - Sputtering apparatus - Google Patents

Sputtering apparatus

Info

Publication number
JPS53100979A
JPS53100979A JP1643877A JP1643877A JPS53100979A JP S53100979 A JPS53100979 A JP S53100979A JP 1643877 A JP1643877 A JP 1643877A JP 1643877 A JP1643877 A JP 1643877A JP S53100979 A JPS53100979 A JP S53100979A
Authority
JP
Japan
Prior art keywords
sputtering apparatus
cylinder
sputtering
electrode material
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1643877A
Other languages
Japanese (ja)
Inventor
Juichi Abe
Tadashi Karaki
Shuji Ueda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Sumitomo Seika Chemicals Co Ltd
Original Assignee
Seitetsu Kagaku Co Ltd
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seitetsu Kagaku Co Ltd, Anelva Corp filed Critical Seitetsu Kagaku Co Ltd
Priority to JP1643877A priority Critical patent/JPS53100979A/en
Publication of JPS53100979A publication Critical patent/JPS53100979A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/046Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:Sputtering apparatus, being able to coat the film of what kind of material composed of inorganic or organic substances, by inserting cylindrical electrode into gas cylinder and sputtering the electrode material by generating glow discharge in the cylinder and then, coating the electrode material on the inner wall of the cylinder.
JP1643877A 1977-02-16 1977-02-16 Sputtering apparatus Pending JPS53100979A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1643877A JPS53100979A (en) 1977-02-16 1977-02-16 Sputtering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1643877A JPS53100979A (en) 1977-02-16 1977-02-16 Sputtering apparatus

Publications (1)

Publication Number Publication Date
JPS53100979A true JPS53100979A (en) 1978-09-02

Family

ID=11916226

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1643877A Pending JPS53100979A (en) 1977-02-16 1977-02-16 Sputtering apparatus

Country Status (1)

Country Link
JP (1) JPS53100979A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003008664A3 (en) * 2001-07-17 2003-06-05 Air Liquide Method of making a passivated surface
US8500973B2 (en) * 2004-08-20 2013-08-06 Jds Uniphase Corporation Anode for sputter coating

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003008664A3 (en) * 2001-07-17 2003-06-05 Air Liquide Method of making a passivated surface
US8500973B2 (en) * 2004-08-20 2013-08-06 Jds Uniphase Corporation Anode for sputter coating

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