JPS5617093A - Semiconductor laser - Google Patents
Semiconductor laserInfo
- Publication number
- JPS5617093A JPS5617093A JP9295479A JP9295479A JPS5617093A JP S5617093 A JPS5617093 A JP S5617093A JP 9295479 A JP9295479 A JP 9295479A JP 9295479 A JP9295479 A JP 9295479A JP S5617093 A JPS5617093 A JP S5617093A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- carrier
- active layer
- refractive index
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2004—Confining in the direction perpendicular to the layer structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
Abstract
PURPOSE:To facilitate the oscillation of a fundamental mode and to turn out a high power by performing a mesa etching to the depth penetrating an active layer of a four-layer structure section having a light guiding layer and a carrier confinement layer. CONSTITUTION:A positive current is applied to a P-type electrode, a negative current is applied to an N-type electrode, a carrier is injected into an active layer 14 and a luminescence is obtained by recombination. The injected carrier is confined by the semiconductor layers 13 and 15 located in the vicinity of the active layer. When a gain surpasses a loss with a sufficient application of current, a laser beam is generated from the active layer 14. This beam oozes out to a beam guide layer 13 and is guided by a beam confinement layer 12 having a low refractive index and a beam- carrier confinement layer 15. As the thickness of a central part 20 of a guide layer 13 differs from that of its outside, the lateral refractive index distribution becomes larger as compared with the central part. In other words, it means that a beam waveguide mechanism is fabricated in a luminous region and the fundamental mode confined within said region is oscillated to the lateral direction, too. The fact that the lateral direction of the active layer has a mesa etching in a striped form shows that the diffusion of the carrier is limited within the mesa-type protruded section only.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9295479A JPS5617093A (en) | 1979-07-20 | 1979-07-20 | Semiconductor laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9295479A JPS5617093A (en) | 1979-07-20 | 1979-07-20 | Semiconductor laser |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5617093A true JPS5617093A (en) | 1981-02-18 |
JPS6154279B2 JPS6154279B2 (en) | 1986-11-21 |
Family
ID=14068843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9295479A Granted JPS5617093A (en) | 1979-07-20 | 1979-07-20 | Semiconductor laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5617093A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61236189A (en) * | 1985-04-11 | 1986-10-21 | Sharp Corp | Semiconductor laser element |
EP0209372A2 (en) * | 1985-07-17 | 1987-01-21 | Sharp Kabushiki Kaisha | A semiconductor laser device |
JPH01175738U (en) * | 1988-05-30 | 1989-12-14 |
-
1979
- 1979-07-20 JP JP9295479A patent/JPS5617093A/en active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61236189A (en) * | 1985-04-11 | 1986-10-21 | Sharp Corp | Semiconductor laser element |
EP0198656A2 (en) * | 1985-04-11 | 1986-10-22 | Sharp Kabushiki Kaisha | A semiconductor laser device |
US4754462A (en) * | 1985-04-11 | 1988-06-28 | Sharp Kabushiki Kaisha | Semiconductor laser device with a V-channel and a mesa |
EP0209372A2 (en) * | 1985-07-17 | 1987-01-21 | Sharp Kabushiki Kaisha | A semiconductor laser device |
JPH01175738U (en) * | 1988-05-30 | 1989-12-14 | ||
JPH0440600Y2 (en) * | 1988-05-30 | 1992-09-24 |
Also Published As
Publication number | Publication date |
---|---|
JPS6154279B2 (en) | 1986-11-21 |
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