JPS561570A - Semiconductor switching device - Google Patents

Semiconductor switching device

Info

Publication number
JPS561570A
JPS561570A JP7598479A JP7598479A JPS561570A JP S561570 A JPS561570 A JP S561570A JP 7598479 A JP7598479 A JP 7598479A JP 7598479 A JP7598479 A JP 7598479A JP S561570 A JPS561570 A JP S561570A
Authority
JP
Japan
Prior art keywords
gate electrode
electrodes
forming
switching device
groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7598479A
Other languages
Japanese (ja)
Inventor
Takeshi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP7598479A priority Critical patent/JPS561570A/en
Publication of JPS561570A publication Critical patent/JPS561570A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/24Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only semiconductor materials not provided for in groups H01L29/16, H01L29/18, H01L29/20, H01L29/22
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78681Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising AIIIBV or AIIBVI or AIVBVI semiconductor materials, or Se or Te

Abstract

PURPOSE:To provide a semiconductor switching device which has a switching function with a simple construction by forming a compound semiconductor layer made of metals of the Groups V and VI in the Periodic Table on an insulating substrate, forming source and drain electrodes thereon, and forming a gate electrode through an insulating layer in the intermediate therebetween. CONSTITUTION:A compound semiconductor layer 32 made of Sb2S3 represented by the metal of the Groups V2 and VI3 in the Periodic Table is formed on an insulating substrate 31, and aluminum source and drain electrodes 34 and 35 are ohmically coated at predetermined interval on the surface 33. Then, an SiO2 insulating layer 36 is formed over from between the electrodes 34 and 35 to partial surface of the electrode, and a gate electrode 37 made of aluminum is mounted thereon. In this manner, a voltage is applied to the gate electrode 37 to produce switching function between the other electrodes 34 and 35 for memory operation to be adapted for a semiconductor logic circuit or a memory circuit or the like.
JP7598479A 1979-06-15 1979-06-15 Semiconductor switching device Pending JPS561570A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7598479A JPS561570A (en) 1979-06-15 1979-06-15 Semiconductor switching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7598479A JPS561570A (en) 1979-06-15 1979-06-15 Semiconductor switching device

Publications (1)

Publication Number Publication Date
JPS561570A true JPS561570A (en) 1981-01-09

Family

ID=13592028

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7598479A Pending JPS561570A (en) 1979-06-15 1979-06-15 Semiconductor switching device

Country Status (1)

Country Link
JP (1) JPS561570A (en)

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